Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Dosaka
Junya Dosaka, Hamura-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100171553 | POWER CIRCUIT - A power circuit used for an amplifier, which includes an amplifier provided with a linear amplifier serving as a voltage source, a DC/DC converter serving as a current source, a hysteresis comparator controlling the DC/DC converter, and a current detector detecting output current from the linear amplifier to output the detected output current to the hysteresis comparator; and a switching restricting means for restricting a switching interval in the DC/DC converter such that the switching interval is not equal to or less than a constant time or is not shorter than the constant time. | 07-08-2010 |
Junya Dosaka, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090015326 | DISTORTION COMPENSATION APPARATUS - A distortion compensation apparatus includes distortion generating means for generating distortions to compensate for a distortion generated in an amplifier | 01-15-2009 |
| 20100156648 | Wireless communications device - A wireless communications device for performing wireless communications includes a notifying unit for notifying a user of a status of the corresponding wireless communications device when a dedicated user interface is manipulated, a display unit and a detector for detecting failure in the display unit. The notifying unit notifies the user of the status of the corresponding wireless communications device when a failure in the display unit is detected by the detector and prevents the status of the corresponding wireless communications device from being notified when the failure in the display unit is not detected by the detector. | 06-24-2010 |
Junya Dosaka, Hamura JP
| Patent application number | Description | Published |
|---|---|---|
| 20100117726 | AMPLIFIER APPARATUS - An amplifier capable of lowering an electrical current flowing in a peak amplifier before a carrier amplifier becomes saturated to thereby improve the efficiency of an entirety of the amplifier is provided. The amplifier includes a carrier amplifier circuit having an amplifying element operable in class-AB or class-B, and a plurality of peak amplifier circuits which have amplifying elements operating in class-B or class-C and which are arranged to start an operation in stages in response to an input level. An output of the carrier amplifier circuit and outputs of the peak amplifier circuits are combined together for signal output. One of the peak amplifier circuits which is rendered operative at the lowest input level is smaller in saturation output than the carrier amplifier circuit. | 05-13-2010 |
Kenji Dosaka, Wako-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090049821 | EXHAUST GAS PURIFIER - An exhaust gas purer ( | 02-26-2009 |
Shinichi Dosaka, Tsukui-Gun JP
| Patent application number | Description | Published |
|---|---|---|
| 20090316143 | VISUAL INSPECTION APPARATUS, VISUAL INSPECTION METHOD, AND PERIPHERAL EDGE INSPECTION UNIT THAT CAN BE MOUNTED ON VISUAL INSPECTION APPARATUS. - This visual inspection apparatus has a macro-inspection section and a micro-inspection section. In the micro-inspection section, a inspection stage and a microscope are loaded into a loading plate. The inspection stage can be moved in any directions of the X, Y, and Z directions, and can also be rotated in the θ direction. Moreover, a peripheral edge inspection section that acquires an enlarged image of a peripheral edge of wafer W is fixed to the loading plate. The peripheral edge inspection section is arranged so as to image the peripheral edge of wafer W held by the inspection stage. | 12-24-2009 |
Shinichi Dosaka, Sagamihara-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090086211 | Optical measurement apparatus - In optical measurement utilizing total reflection, various types of measurement are selectively performed. The invention provides an optical measurement apparatus using total reflection, including a light source, a measurement optical system, and a light detector. The measurement optical system is an infinity-corrected positive lens formed of an optical member having a planar surface orthogonal to an optical axis of the measurement optical system at a front focal position. One side of the optical axis of the measurement optical system is used as a projection optical system for radiating measurement light onto a specimen, and another side is used as a photometric optical system for acquiring reflected light from the specimen. The light source is disposed at an entrance pupil position on the projection optical system side or at a position conjugate to the entrance pupil position and moves in an entrance pupil plane or in a plane conjugate to the entrance pupil position, along a straight line orthogonal to the optical axis, while a distance from the optical axis is detected. The light detector is disposed at an exit pupil position on the photometric optical system side or at a position conjugate to the exit pupil position. The optical-measurement apparatus comprises a light-source changing unit configured to change the position or shape of the light source. | 04-02-2009 |
| 20090195788 | Apparatus for profile irregularity measurement and surface imperfection observation; method of profile irregularity measurement and surface imperfection observation; and inspection method of profile irregularity and surface imperfection - An apparatus for performing surface measurement of an inspection-object surface and profile irregularity measurement and surface defect observation of an inspection-object lens using a Fizeau interferometric optical system. The apparatus is provided with a beam control device that has a first beam control plate configured to allow for confirmation of a position of the inspection-object lens in a positional adjustment of the inspection-object lens, a second beam control plate having an aperture region at a center thereof and a shading region around the aperture region, and a third beam control plate having a shading region at a center thereof and an aperture region around the shading region, and that is configured so that a desired one of these beam control plates is insertable and removable on an imaginary plane in which a light convergence point of reflected light from the reference surface of the interferometric optical system lies and which is perpendicular to an optical axis of the interferometric optical system. | 08-06-2009 |
