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Dormans

Guido Dormans, Bemmel NL

Patent application numberDescriptionPublished
20100181568INTEGRATED CIRCUITS ON A WAFER AND METHODS FOR MANUFACTURING INTEGRATED CIRCUITS - Integrated circuits (07-22-2010

Guido J. M. Dormans, Bemmel NL

Patent application numberDescriptionPublished
20090296447FLASH- AND ROM- MEMORY - Method for conversion of a Flash memory cell on a first semiconductor device to a ROM memory cell in a second semiconductor device, the first and second semiconductor device each being arranged on a semiconductor substrate and each comprising an identical device portion and an identical wiring scheme for wiring the device portion to the Flash memory cell and to the ROM memory cell, respectively; the Flash memory cell being made in non-volatile memory technology and comprising an access transistor and a floating transistor, the floating transistor comprising a floating gate and a control gate; the ROM memory cell being made in a baseline technology and comprising a single gate transistor, which method includes manipulating a layout of at least one baseline mask as used in the baseline technology; the manipulation including: incorporating into the layout of the at least one baseline mask a layout of the Flash memory cell, and converting the layout of the Flash memory cell to a layout of one ROM memory cell by eliminating, from the at least one baseline mask, a layout for the floating transistor from the layout of the Flash memory cell and designating the layout of the access transistor of the Flash memory cell as a layout of the single gate transistor of the ROM memory cell.12-03-2009

Guido Jozef Maria Dormans, Bemmel NL

Patent application numberDescriptionPublished
20080283899CONDUCTIVE SPACERS EXTENDED FLOATING GATES - A method for manufacturing on a substrate (11-20-2008

Guido Jozef Maria Dormans, Nijmegen NL

Patent application numberDescriptionPublished
20090087976Conductive Spacers Extended Floating Gates - A method for manufacturing on a substrate a semiconductor device with a floating-gate and a control-gate. The method includes the steps of first forming an isolation zone in the substrate, and thereafter forming the floating gate on the substrate. The method further includes extending the floating gate using spacers, and then forming the control gate over the floating gate and the spacers.04-02-2009