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Dorf
Erik Dorf, Breckenridge, CO US
| Patent application number | Description | Published |
|---|---|---|
| 20110223290 | Ice Cream Cone Stabilizer and Method - A stabilizer for ice cream cones is a generally flat elongated body with a tapered tip at one end and a rounded or novelty decoration at the other end. The center of the stabilizer may be flared to increase the surface area of the stabilizer. In use, the stabilizer is inserted into the ice cream within the cone so that the tapered end approaches the base of the inside of the cone, while the other end extends above the top of the ice cream. The stabilizer acts to prevent sideways movement of the ice cream that is above the top edge of the cone, and thus reduces the risk of the ice cream falling off the cone. | 09-15-2011 |
| 20110270253 | Cerclage Device - A cerclage device includes a base member, a cerclage member, and a drive member. The base member has a length sufficient to allow for manual holding by a user, an interior space extending from a distal end toward a proximal end, and a slot extending from the distal end toward the proximal end and connecting the interior space to the exterior. The cerclage member has a long side with a proximal end and a distal end and a curvature in one direction about its long side at least at the distal end. The cerclage member has means for attaching a suture and fits within and is straightened by the base member within the interior space when in a retracted position. In an extended curved position the distal end of the sheet is extended out of the interior space at the distal end of the base member. The drive member is attached or attachable to the cerclage member and is slidable within the slot and has an engagement portion that is disposed at least partially through the slot. When the drive member is attached to the cerclage member movement of the engagement portion in the slot pushes and pulls the cerclage member to/from the straightened position from/to the extended curved position. | 11-03-2011 |
Jason H. Dorf, Plainview, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100205789 | Buckle attachment device - A buckle attachment device is provided for removably securing a buckle and a strap to form a unified strap object, such as a belt. The buckle attachment device enables a user to select one of a wide variety of buckles to be coupled with one of a wide variety of straps that may be custom cut to a desired length. The selected buckle and strap are then removably secured by the user to the buckle attachment device without the need for specialized tools or additional binding components. | 08-19-2010 |
Leonid Dorf, Santa Clara, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100136793 | EFFICIENT AND ACCURATE METHOD FOR REAL-TIME PREDICTION OF THE SELF-BIAS VOLTAGE OF A WAFER AND FEEDBACK CONTROL OF ESC VOLTAGE IN PLASMA PROCESSING CHAMBER - In a plasma reactor having an electrostatic chuck, wafer voltage may be determined from RF measurements at the bias input using previously determined constants based upon transmission line properties of the bias input, and this wafer voltage may be used to accurately control the DC wafer clamping voltage. | 06-03-2010 |
Leonid Dorf, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20120043023 | SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR - The disclosure pertains to a capactively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a folded structure and symmetrical power distribution. | 02-23-2012 |
Leonid A. Dorf, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100327873 | MULTI-DIAGNOSTIC APPARATUS FOR SUBSTRATE-LEVEL MEASUREMENTS - Described herein is a method and apparatus for diagnosing processing equipment with a multi-diagnostic device. In one embodiment, a multi-diagnostic device is located in a plasma processing environment and includes an electronic circuitry. The device includes a first array of sensors and a second array of sensors. The circuitry is used to simultaneously (or nearly simultaneously) measure the distributions of ion saturation current and the potential at the device using the first array of sensors and to measure resistances of the second array of sensors to determine the distribution of the temperature at the surface of the device. | 12-30-2010 |