| Patent application number | Description | Published |
|---|
| 20090111701 | METHOD OF PREPARING A SUBSTRATE WITH A COMPOSITION INCLUDING AN ORGANOBORANE INITIATOR - A method of preparing a substrate with a composition comprising (i) an organoborane initiator and (ii) a radical curable component disposed thereon includes the step of depositing the composition onto the substrate wherein at least one of (i) the organoborane initiator and (ii) the radical curable component is deposited onto the substrate in the form of a gradient pattern. An article comprises the substrate and the gradient pattern formed on the substrate. The gradient pattern is formed from a developed composition comprising the reaction product of (i) the organoborane initiator and (ii) the radical curable component. By forming the gradient pattern on the substrate, combinatorial and high-throughput methods of generating and testing the developed composition are possible, which enable characterization of the developed composition for various physical and chemical properties. | 04-30-2009 |
| 20090306307 | Curable Organosilicon Composition - A curable organosilicon composition includes a radical curable organosilicon compound, an organoborane amine complex, a condensation curable organosilicon compound, a condensation cure catalyst, and a condensation-reactive cross-linking compound. The curable organosilicon composition may further include an amine-reactive compound. A method of forming the curable organosilicon composition introduces the organoborane-amine complex and the amine-reactive compound into separate reaction vessels. The curable organosilicon composition is used to form various articles. | 12-10-2009 |
| 20100221429 | Ambient Lithographic Method Using Organoborane Amine Complexes - A pattern is formed and developed on a surface with an ink system comprising (i) a free radical polymerizable monomer, oligomer or polymer, (ii) an organoborane amine complex, (iii) an amine reactive compound, and (iv) oxygen. Components (i)-(iv) are distributed between an ink and a developing medium. The ink formed on the surface in a pattern is developed by exposure of the ink to the developing medium. Component (iv) may be present as naturally occurring in the air. The method has the advantage of developing polymeric and polymer composite patterns rapidly in ambient air, without heating or irradiation. The ink system can be applied to inorganic and organic surfaces, and is particularly useful for polymeric surfaces such as low energy plastics. The composition can be applied to inorganic and organic surfaces, and is particularly useful for polymeric surfaces such as low energy plastics. | 09-02-2010 |
| 20110060092 | COMPOSITION HAVING IMPROVED ADHERENCE WITH AN ADDITION-CURABLE MATERIAL AND COMPOSITE ARTICLE INCORPORATING THE COMPOSITION - A composition and composite article have improved adherence with an addition-curable material. The composition and therefore the composite article, which includes at least one substrate formed from the composition, include a resin and an additive that is incorporated into the resin. The resin is organic and polymeric and free of ethylenically unsaturated and silicon hydride functional groups. The additive is selected from the group of a fluorine-substituted organopolysiloxane, an amino-functional organopolysiloxane, an unsaturated carboxylic acid or carboxylic acid salt, and combinations thereof. Further, the additive includes a hydrosilylation reactive group present at a surface of the substrate for reaction with the addition-curable material. This improves adherence of the substrate with the addition-curable material. The substrate and the addition-curable material bond together to make the composition article. | 03-10-2011 |
| 20110060099 | COMPOSITION HAVING IMPROVED ADHERENCE WITH AN ADDITION-CURABLE MATERIAL AND COMPOSITE ARTICLE INCORPORATING THE COMPOSITION - A composition and composite article have improved adherence with an addition-curable material. The composition and therefore the composite article, which includes at least one substrate formed from the composition, include a resin and an additive that is incorporated into the resin. The resin is organic and polymeric and free of ethylenically unsaturated and silicon hydride functional groups. The additive is selected from the group of a fluorine-substituted organopolysiloxane, an amino-functional organopolysiloxane, an unsaturated carboxylic acid or carboxylic acid salt, and combinations thereof. Further, the additive includes a hydrosilylation reactive group present at a surface of the substrate for reaction with the addition-curable material. This improves adherence of the substrate with the addition-curable material. The substrate and the addition-curable material bond together to make the composition article. | 03-10-2011 |
| 20110129683 | Radical Polymerizable Composition - A radical polymerizable composition includes a radical polymerizable compound and an organoborane-azole complex. The organoborane-azole complex includes an azole having at least two nitrogen atoms wherein at least one nitrogen atom is an sp | 06-02-2011 |
| 20110135923 | Composite Article - A composite article includes a substrate and a pressure sensitive adhesive (PSA) disposed on the substrate. The PSA includes a polymer formed from at least one radical curable organic compound polymerized in the presence of an organoborane initiator. The polymer has a polydispersity index of less than or equal to 5.0 and a temperature of softening less than a temperature of use. The composite article is formed by a method including the steps of polymerizing the at least one radical curable organic compound to form the polymer and applying the PSA to the substrate to form the composite article. The polymer is formed by a method including the steps of combining the at least one radical curable organic compound and the organoborane initiator and polymerizing the at least one radical curable organic compound. | 06-09-2011 |
| 20110294958 | Method Of Forming A Non-Random Copolymer - A non-random copolymer is formed, and its structure controlled, using a method including the step of combining a mixture of a first radical polymerizable compound and an organoborane initiator, a second radical polymerizable compound, and an organoborane decomplexing agent, at a rate sufficient to form the non-random copolymer. The non-random copolymer may be a silicon gradient polymer. To form the silicon gradient copolymer, the first and second radical polymerizable compounds are polymerized in the presence of the organoborane initiator and the organoborane decomplexing agent. The silicon gradient copolymer has a polymer backbone consisting of organic moieties and has at least one silicon containing pendent group. | 12-01-2011 |
