Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Dong-Gyun
Dong-Gyun Hong, Icheon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20080242044 | Method for Fabricating Nonvolatile Memory Device - A method for fabricating a nonvolatile memory device includes forming a gate insulation layer, a first gate conductive layer, a first sacrificial layer, and a second sacrificial layer over a substrate, etching the first and second sacrificial layers, the first gate conductive layer, the gate insulation layer, and the substrate to form trenches, forming a first insulation layer to fill the trenches, polishing the first insulation layer using the etched second sacrificial layer as a polish stop layer, removing the second sacrificial layer, recessing the first insulation layer inside the trenches, forming a second insulation layer to fill a space produced inside the trenches by the recessing of the first insulation layer, and polishing the second insulation layer using the etched first sacrificial layer as a polish stop layer. | 10-02-2008 |
Dong-Gyun Hong, Ochon-Shi KR
| Patent application number | Description | Published |
|---|---|---|
| 20080242073 | METHOD FOR FABRICATING A NONVOLATILE MEMORY DEVICE - A method for fabricating a nonvolatile memory device includes forming a gate insulation layer and a gate conductive layer for forming a floating gate over a substrate. A portion of the gate conductive layer, the gate insulation layer, and the substrate is etched to form a trench. An isolation structure is formed by filling in the trench. The isolation structure is recessed to a certain depth in the trench. A buffer layer is formed over the substrate structure. Spacers are formed over sidewalls of the buffer layer corresponding to inner sidewalls of the trench. A portion of the recessed isolation structure is etched to form a depression in the isolation structure using the spacers. The spacers are removed followed by removal of the buffer layer. A dielectric layer is formed over the substrate structure, and a control gate is formed over the dielectric layer. | 10-02-2008 |
Dong-Gyun Kim, Seoul KR
| Patent application number | Description | Published |
|---|---|---|
| 20090067503 | METHOD AND APPARATUS FOR VIDEO DATA ENCODING AND DECODING - Video data encoding and decoding methods and apparatuses are provided. In the video data encoding and decoding methods, codes books are provided to an encoder and a decoder. In the encoder, an index corresponding to a vector that is most similar to a current vector of an input moving picture among the vectors of the code book is encoded. In the decoder, the index is decoded. Accordingly, it is possible to increase compression ratio and reduce calculation complexity. | 03-12-2009 |
| 20090238488 | APPARATUS AND METHOD FOR IMAGE INTERPOLATION BASED ON LOW PASS FILTERING - An apparatus and method for image interpolation based on low pass filtering are provided. The apparatus includes an edge direction detector detecting an edge direction for a pixel nearest to a to-be-interpolated pixel among pixels and determining the edge direction of the to-be-interpolated pixel as the detected edge direction, a pixel value calculator calculating pixel values of interpolation points located in a lattice filtering window having a predetermined size by using pixel values of pixels located adjacent to the interpolation points, and a filtering unit performing low pass filtering on the to-be-located pixel according to a low pass filter corresponding to the determined edge direction of the to-be-interpolated pixel, the low pass filter being one of low pass filters corresponding to predetermined vertical, horizontal, left diagonal and right diagonal directions respectively. Accordingly, a process of calculating the pixel value of the to-be-interpolated pixel can be simplified and a processing speed can be increased. Furthermore, it is possible to obtain a high-quality image without having image deterioration such as blocking effect caused by an error in a pixel value even for a region with an uneven edge. | 09-24-2009 |