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Donald Wayne

Donald Wayne Berrian, Topsfield, MA US

Patent application number	Description	Published
20090090876	IMPLANT BEAM UTILIZATION IN AN ION IMPLANTER - To select a scan distance to be used in scanning a wafer with an implant beam, a dose distribution along a first direction is calculated based on size or intensity of the implant beam and a scan distance. The scan distance is the distance measured in the first direction between a first path and a final path of the implant beam scanning the wafer along a second direction in multiple paths. A relative velocity profile along the second direction is determined based on the dose distribution. Dose uniformity on the wafer is calculated based on the wafer being scanned using the relative velocity profile and the determined dose distribution. The scan distance is adjusted and the preceding steps are repeated until the calculated dose uniformity meets one or more uniformity criteria.	04-09-2009

Donald Wayne Raboud, Edmonton CA

Patent application number	Description	Published
20110259076	APPARATUS AND METHOD FOR ASSESSING PERCUTANEOUS IMPLANT INTEGRITY - Provided is an apparatus for assessing interface integrity between a medium and an implant. A first signal is translated from a motion of an impact body during impact with an abutment connected to the implant. In some embodiments, the first signal is filtered using a zero phase shift filter and then used for assessing the interface integrity. Since no phase shift is introduced, the interface integrity is accurately assessed. In another embodiment, the apparatus maintains a system model for impacting the impact body against the abutment. The apparatus analytically determines an interface property by applying a system property that has been determined to the system model. An accurate system model allows for an accurate assessment. According to another broad aspect, there is provided a method of conducting the impact test. According to the method, a person ensures that the impact body impacts against a consistent portion of the abutment.	10-27-2011

Donald Wayne Whisenhunt, Jr., Niskayuna, NY US

Patent application number	Description	Published
20090075813	CATALYST AND METHOD OF MANUFACTURE - Disclosed herein is a catalytic composition comprising a first catalyst composition portion that comprises a zeolite; and a second catalyst composition portion that comprises a catalytic metal disposed upon a porous inorganic substrate; the first catalyst composition portion and the second catalyst composition portion being in an intimate mixture. Disclosed herein is a method, comprising mixing a first catalyst composition portion with the second catalyst composition portion to form a catalytic composition; the first catalyst composition portion comprising a zeolite and the second catalyst composition portion comprising a metal disposed upon a porous substrate.	03-19-2009
20090263297	CATALYST AND METHOD OF MANUFACTURE - Disclosed herein is a catalytic composition comprising a first catalyst composition portion that comprises a zeolite; and a second catalyst composition portion that comprises a catalytic metal disposed upon a porous inorganic substrate; the first catalyst composition portion and the second catalyst composition portion being in an intimate mixture.	10-22-2009
20100105852	PHOSPHORESCENT IRIDIUM COMPLEXES - Metal complexes of formula I and IA and polymers derived from the complexes are useful in optoelectronic devices	04-29-2010
20100111757	METHODS FOR INHIBITING CORROSION IN AQUEOUS MEDIA - Methods are provided to inhibit corrosion of metals in contact with aqueous systems such as cooling water systems. In accordance with the methods, a hydroxyacid compound and orthophosphates are used to treat the system. Additionally, an adjuvant including poly(epoxysuccinic acids), an additional hydroxy acid, and a polycarboxylic acid, may be added to the system water.	05-06-2010
20110047995	CATALYST AND METHOD OF MANUFACTURE - A catalyst system comprising a first catalytic composition comprising, (i) a first component comprising a zeolite, and (ii) a second component comprising a homogeneous solid mixture containing at least one catalytic metal and at least one metal inorganic network; wherein the pores of the solid mixture have an average diameter in a range of about 1 nanometer to about 15 nanometers; wherein the first component and the second component form an intimate mixture. The catalyst system may further comprise a second catalytic composition and a third catalytic composition. The catalyst system may further comprise a delivery system configured to deliver a reductant and optionally a co-reductant. An exhaust system comprising the catalyst systems described herein is also provided.	03-03-2011
20110203928	SILICA REMEDIATION IN WATER - Water treatment methods for reducing silica concentration in water containing at least 100 ppm dissolved or suspended silica include contacting the water with particles comprising mesoporous alumina having surface area ranging from about 250 m2/g to about 600 m	08-25-2011