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Dohi, Tokyo
Hiroshi Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20120131862 | DOUBLE FLOOR STRUCTURE AND SUPPORT LEG FOR DOUBLE FLOOR STRUCTURE - A double floor structure capable of being adapted to the conditions of construction and the needs of users at low cost. A double floor structure (K) provided with support legs ( | 05-31-2012 |
Koichiro Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100187467 | Aqueous solution for formation of clathrate hydrate, heat storage agent, method for producing clathrate hydrate or its slurry, heat accumulating and radiating method and method for preparing aqueous solution to produce latent heat storage agent or its major component - A heat-storage agent which can store a large quantity of cold heat in the temperature range of 3-5° C., is highly effective in preventing supercooling, and can retain the supercooling-preventing effect even when hydrate solidification/melting is frequently repeated. Also provided are an aqueous solution which enables the formation of a clathrate hydrate serving as a major component of the heat-storage agent, and a process for producing the clathrate hydrate. The aqueous solution contains at least one of tetra-n-butylammonium bromide and tri-n-butyl-n-pentylammonium bromide as a solute and contains tetraisopentylammonium bromide as a supercooling inhibitor, the weight proportion of the tetraisopentylammonium bromide to the tetra-n-butylammonium bromide and/or tri-n-butyl-n-pentylammonium bromide being in a given range. This aqueous solution is cooled to or below a hydrate formation temperature to thereby produce a clathrate hydrate. The heat-storage agent contains this clathrate hydrate as a major component. | 07-29-2010 |
Koji Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20110048552 | CONTROL APPARATUS FOR AUTOMATIC TRANSMISSION - A control apparatus for an automatic transmission including a hydraulic pressure control means for controlling supply of hydraulic pressure to a first friction engagement element and a second friction engagement element and discharge of hydraulic pressure from the first friction engagement element and the second friction engagement, and a discharge rate changeover control means for increasing a discharge rate value of the hydraulic pressure which is discharged from the first friction engagement element in a case where when shifting from one of operating ranges to the other thereof is selected, changeover to the other operating range is carried out before completing release of the first friction engagement element, so as to become larger than a discharge rate value of the hydraulic pressure which is discharged from the first friction engagement element before the changeover to the other operating range is carried out. | 03-03-2011 |
| 20110054747 | AUTOMATIC TRANSMISSION CONTROL APPARATUS - An automatic transmission control apparatus includes: a frictional engagement element; a hydraulic pressure supplying section configured to supply a hydraulic pressure to the frictional engagement element; a progression state judging section configured to judge a progression state of the engagement of the frictional engagement element; a rotational speed change rate control section configured to control the hydraulic pressure so that a change rate of a rotational speed of an input shaft of the automatic transmission becomes equal to a target change rate, from when the engagement of the frictional engagement element is started; and a rotational speed feedback control section configured to perform a feedback control of the hydraulic pressure so that the rotational speed of the input shaft of the automatic transmission becomes equal to a target rotational speed, from when the progression state judging section judges a predetermined progression state. | 03-03-2011 |
Manabu Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090010303 | Heat Detector and Method of Manufacturing Heat Detecting Element - [Object] To provide a heat detector in which thermal responsiveness of a heat detecting unit such as a ceramic element is improved. | 01-08-2009 |
| 20090028215 | Heat Detector - An object is to build a protective structure which can protect a ferroelectric material from a surrounding environment when the ferroelectric material is used as a heat detecting element of a heat detector, thereby enhancing the reliability of the heat detector. | 01-29-2009 |
Masahiko Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100047206 | POWDERY COMPOSITION FOR NASAL ADMINISTRATION - A powdery composition for nasal administration, where (1) the composition contains (i) a drug, (ii) a water-absorbing and gel-forming base material such as hydroxypropyl cellulose or hydroxypropylmethyl cellulose and (iii) a water-absorbing and water-insoluble base material such as crystalline cellulose or α-cellulose, (2) wherein the amount of the water-absorbing and gel-forming base material is about 5-40 wt % based on the total of the water-absorbing and gel-forming base material and the water-absorbing and water-insoluble base material, and (3) wherein the drug is unevenly dispersed more on/in the water-absorbing and water-insoluble base material than on/in the water-absorbing and gel-forming base material. | 02-25-2010 |
Masahito Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100271696 | ILLUMINATION APPARATUS AND MICROSCOPE HAVING THE SAME - An illumination apparatus includes a light source and a collimator optical system converting light emitted from the light source to approximately-parallel light. The collimator optical system includes, in an order of proximity to the light source, a first lens having a positive power and including an approximately-flat surface and an aspheric surface, and a second lens having a positive power. | 10-28-2010 |
| 20100328765 | ILLUMINATION OPTICAL SYSTEM AND FLUORESCENT MICROSCOPE - An illumination optical system which irradiates a sample surface with light through an illuminating lens includes: a light source; a condensing optical system receiving the light emitted from the light source; and a lens array optical system including a first lens array surface and a second lens array surface each formed by a plurality of lens elements. The first lens array surface has a conjugate relation with a back focal position of the illuminating lens. The second lens array surface is placed at a back focal position of the lens array optical system, has a conjugate relation with a pupil position of the illuminating lens, and the light source and the condensing optical system are arranged to form an image of the light source on the first lens array surface. | 12-30-2010 |
| 20110235171 | MICROSCOPE ADAPTER UNIT - A microscope adapter unit disposed on an optical path of illumination light between a light source unit including a light source and a sample surface includes a first lens group having at least one lens and a second lens group having at least one lens. The first lens group converts the illumination light into roughly parallel luminous fluxes, and makes the illumination light enter the second lens group. | 09-29-2011 |
Takayuki Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090314210 | Epitaxial growth susceptor - A susceptor for use in an epitaxial growth apparatus and method where a plurality of circular through-holes are formed in the bottom wall of a pocket in an outer peripheral region a distance of up to about ½ the radius toward the center of the circular bottom wall. The total opening surface area of these through-holes is 0.05 to 55% of the surface area of the bottom wall. The opening surface area of each of the through-holes provided at this outer peripheral region is 0.2 to 3.2 mm | 12-24-2009 |
| 20110239931 | EPITAXIAL SILICON WAFER AND FABRICATION METHOD THEREOF - An epitaxial silicon wafer is provided in which an epitaxial layer is grown on a silicon wafer having a plane inclined from a {110} plane of a silicon single crystal as a main surface. In the silicon wafer for growing the epitaxial layer thereon, an inclination angle azimuth of the {110} plane is in the range of 0 to 45 degrees as measured from a <100> orientation parallel to the {110} plane toward a <100> direction. With such an arrangement, LPDs of 100 nm or less can be measured from a {110} wafer that has a carrier mobility (including the hole and electron mobilities) higher than that of a {100} wafer. Also, surface roughness degradation in the {110} wafer can be suppressed. Also, the surface state of the {110} wafer can be measured. Further, a quality evaluation can be performed on the {110} wafer. | 10-06-2011 |
Takeyoshi Dohi, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100324370 | Flexibility/Rigidity Adjustable Apparatus - There is provided a flexibility/rigidity adjustable apparatus which can change over its state between a flexible state in which such apparatus is freely bendable and a rigid state in which such bending is restricted when in use. A flexible closing cover | 12-23-2010 |