Patent application number | Description | Published |
20120030102 | FACILITATING A NETWORK COMMUNICATION SERVICE FOR A SUBSCRIBER LINKED TO A PLURALITY OF ACCOUNTS - There is provided a method that includes (a) receiving a notification of an event concerning a network communication service involving a subscriber, in which the subscriber is linked to a first account having first account terms, and a second account having second account terms, (b) making a decision of whether to handle the network communication service in accordance with the subscriber being linked to the first account or in accordance with the subscriber being linked to the second account, and (c) issuing a communication to a device to facilitate the network communication service, pursuant to the decision. There is also provided a system that performs the method, and a storage medium that contains instructions for controlling a processor to perform the method. | 02-02-2012 |
20120041853 | FACILITATION OF A NETWORK COMMUNICATION SERVICE FOR WHICH PAYMENT MAY BE MADE BY ANY OF A PLURALITY OF PAYMENT MODES - There is provided a method that includes (i) receiving a notification of an event concerning a network communication service, (ii) querying a database, in response to the notification, to obtain a payment mode for the service, in which the payment mode is selectable from a set that includes (a) pre-payment and (b) post-payment, (iii) determining, in accordance with the payment mode, whether a balance to fund the service satisfies a balance criterion, and (iv) issuing, in accordance with whether the balance to fund the service satisfies the balance criterion, a communication to a device to affect a provision of the service. There is also provided a system that employs the method, and a storage medium that contains instructions for controlling a processor to perform the method. | 02-16-2012 |
Patent application number | Description | Published |
20100006142 | Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus - Deposition apparatus for uniformly forming material on a substrate in accordance with an exemplary embodiment is provided. The deposition apparatus includes an energy source, an electrode in a facing, spaced relationship with respect to the substrate, and interface structure joined to the electrode. The interface structure is configured to electrically couple energy from the energy source through and about the interface structure to the electrode for formation of a substantially uniform electric field between the electrode and a predetermined area of the substrate when the interface structure is supplied with energy from the energy source. | 01-14-2010 |
20100071766 | Semiconductor device having a multi-layer substrate and a method of forming the semiconductor device - A semiconductor device is provided in accordance with an exemplary embodiment. The semiconductor device includes a semiconductive layer disposed over a multi-layer substrate. The multi-layer substrate includes a plurality of dissimilar regions, one of which is an inner magnetic region and the remainder of the multi-layer substrate is thermally symmetrical about the inner magnetic region. | 03-25-2010 |
20100252605 | WEB SUPPORT ASSEMBLY - A web support assembly for a moving web of substrate material includes a base having a primary support arm pivotally mounted thereto so as to be displaceable from a first position to a second position. The web support assembly includes a first biasing member in mechanical communication with the primary support arm. The first biasing member operates to impart a first biasing force to the primary support arm so as to move it from its first position to its second position. The system includes a dancer arm which is pivotally mounted to the primary support arm so as to be displaceable from a first position to a second position relative primary support arm. The web support assembly further includes a second biasing member in mechanical communication with the dancer arm. The second biasing member operates to impart a second biasing force to the dancer arm so as to move it from its first position to its second position. A roller is rotatably supported on the dancer arm. The roller is configured to engage a portion of the web. The web support assembly operates to maintain continuous contact between the roller and the moving web of substrate material as it passes through a multi-station processing system. | 10-07-2010 |
20100252606 | ROLL-TO-ROLL DEPOSITION APPARATUS WITH IMPROVED WEB TRANSPORT SYSTEM - A system for the continuous deposition of a semiconductor material onto one or more webs of substrate material which are advanced therethrough includes a web transport system having a plurality of web support assemblies. Each web support assembly includes a base having a primary support arm pivotally mounted thereto so as to be displaceable from a first position to a second position. The support includes a first biasing member in mechanical communication with the primary support arm. The first biasing member operates to impart a first biasing force to the primary support arm so as to move it from its first position to its second position. The support includes a dancer arm which is pivotally mounted to the primary support arm so as to be displaceable from a first position to a second position relative to the primary support arm. The system further includes a second biasing member in mechanical communication with the dancer arm. The second biasing member operates to impart a second biasing force to the dancer arm so as to move it from its first position to its second position. A roller is rotatably supported on the dancer arm. The roller is configured to engage a portion of the web. The web support assembly operates to maintain continuous contact between the roller and the moving web of substrate material as it passes through the deposition system. | 10-07-2010 |
20110281378 | ULTRASONIC SYSTEM FOR MEASURING GAS VELOCITY - A system and method for measuring the velocity of gas flow between multiple plasma deposition chambers is provided. A passage atmospherically linking two plasma processing chambers conducts a gas flow therebetween due to differential pressures within the respective chambers. The gas flow velocity is measured by a linear or non-linear ultrasonic energy acoustic path between two transducers located exteriorly to the chambers using the difference in transit time in a forward and reverse direction due to the velocity of gas in the passage. The pressure of process gas in one or more chambers is adjustable based on the measured velocity of gas flow in the passage. | 11-17-2011 |
20130055818 | PRESSURE CONTROL IN CONTINUOUS PLASMA DEPOSITION PROCESSES - Processes of identifying small pressure irregularities in a system used for continuous plasma deposition are provided. Sensitive light scattering is used to detect the presence of nucleated particles in a detection area that is outside the plasma region of high electric field whereby the presence of the particles indicates a pressure abnormality in the plasma deposition chamber. The pressure of the plasma deposition chamber is then adjusted to reduce or eliminate the presence of particles within the detection area and to optimize deposition of material on a substrate. | 03-07-2013 |