| Patent application number | Description | Published |
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| 20100224066 | Drying substances, preparation and use thereof - There is provided herein a dryer polymer substance including a hetero-phase polymer composition including two or more polymers wherein at least one of the two or more polymers include sulfonic groups, wherein the substance is adapted to pervaporate a fluid. The fluid may include water, water vapor or both. There is also provided herein a process for the preparation of a dryer polymer substance adapted to pervaporate a fluid (such as water, water vapor or both) the process includes mixing two or more polymers, wherein at least one of the two or more polymers may include groups which are adapted to be sulfonated, to produce a hetero-phase polymer composition and processing the polymer blend into a desired form. | 09-09-2010 |
| 20100226824 | Drying substances, preparation and use thereof - There is provided herein a dryer polymer substance comprising a polymer grafted with a compound having sulfonic groups, wherein the substance is adapted to pervaporate a fluid such as water, water vapor or both. There is further provided a process for the preparation of a dryer polymer substance adapted to pervaporate a fluid, the process includes processing a polymer into a desired form, activating at least a portion of the polymer, and grafting the activated portion of the polymer with a compound having groups adapted to be sulfonated. | 09-09-2010 |
| Patent application number | Description | Published |
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| 20090231558 | MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGRAPHICALLY PROCESSING SUBSTRATES - Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station. | 09-17-2009 |
| 20110037957 | MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGRAPHICALLY PROCESSING SUBSTRATES - Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station. | 02-17-2011 |
| 20110097550 | LIGHT INDUCED PATTERNING - A method of depositing a material on a receiving substrate, the method comprising: providing a source substrate having a back surface and a front surface, the back surface carrying at least one piece of coating material; providing a receiving substrate positioned adjacent to the source substrate and facing the coating material; and radiating light towards the front surface of the source substrate, to remove at least one piece of the coating material from the source substrate and deposit said removed at least one piece onto the receiving substrate as a whole. | 04-28-2011 |
