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Dichtl

Alexander Dichtl, Lorrach DE

Patent application numberDescriptionPublished
20100249401Process for the preparation of sterically hindered nitroxyl ethers - The present invention relates to a novel process for the preparation of a sterically hindered nitroxyl ether from the corresponding sterically hindered nitroxyl radical by reacting it with a carbonyl compound and a hydroperoxide. The compounds prepared by this process are effective stabilizers for polymers against harmful effects of light, oxygen and/or heat, as flame-retardants for polymers and as polymerization regulators.09-30-2010

Gottfried Dichtl, Nieder-Olm DE

Patent application numberDescriptionPublished
20100233069METHOD AND SYSTEM FOR CONCENTRATING WASTE SULPHURIC ACIDS FROM NITRATION PROCESSES - Disclosed is a method for recovering diluted waste sulfuric acid containing impurities from nitration processes, a highly concentrated nitric acid required in the nitration process being produced in association with the nitration process by means of extractive rectification with concentrated sulfuric acid which is re-concentrated in order to be reutilized. According to the inventive method, the waste sulfuric acid from the nitration process is fed to the top of a first, indirectly heated stripping column, optionally together with another waste sulfuric acid in the form of a DNT washing acid, and is divided into an overhead product containing nitric acid and nitro-organic compounds as well as a prepurified sulfuric acid in the bottom product. The prepurified sulfuric acid withdrawn from the bottom of the first stripping column is fed to the top of a second, serially connected additional indirectly heated stripping column, into the bottom zone of which another waste sulfuric acid is fed in the form of a diluted sulfuric acid recovered from the nitric acid concentration system such that the prepurified sulfuric acid from the first stripping column is further purified in the second stripping column and is preconcentrated along with the diluted sulfuric acid recovered from the extractive rectification of nitric acid.09-16-2010

Jürgen Dichtl, Augsburg DE

Patent application numberDescriptionPublished
20090284154Low-Pressure Gas Discharge Lamp With a Reduced Argon Proportion In the Gas Filling - The invention relates to novel gas fillings of low-pressure gas discharge lamps for reducing the starting and arc drop voltages at low Hg vapor pressures. In favor of a mixture consisting of Ne and Kr, the Ar portion of the gas filling is considerably reduced.11-19-2009
20100002427Illuminating Device Comprising a Lamp and a Reflector - A lighting device with at least one lamp and at least one reflector, wherein at least regions of a reflective surface of the reflector are in the form of an involute of a circle of a partial element of the lamp.01-07-2010

Jürgen Dichtl, Augsburg DE

Patent application numberDescriptionPublished
20090284154Low-Pressure Gas Discharge Lamp With a Reduced Argon Proportion In the Gas Filling - The invention relates to novel gas fillings of low-pressure gas discharge lamps for reducing the starting and arc drop voltages at low Hg vapor pressures. In favor of a mixture consisting of Ne and Kr, the Ar portion of the gas filling is considerably reduced.11-19-2009
20100002427Illuminating Device Comprising a Lamp and a Reflector - A lighting device with at least one lamp and at least one reflector, wherein at least regions of a reflective surface of the reflector are in the form of an involute of a circle of a partial element of the lamp.01-07-2010

Marius Dichtl, München DE

Patent application numberDescriptionPublished
20090322071Security Element - The present invention relates to a security element for security papers, value documents and the like, having a micro-optical moiré magnification arrangement having 12-31-2009

Marius Dichtl, Muenchen DE

Patent application numberDescriptionPublished
20080197295Device And Method For Producing Resist Profiled Elements - The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.08-21-2008

Matthias Dichtl, Eurasburg DE

Patent application numberDescriptionPublished
20090058147ROOF MODULE FOR A VEHICLE AND INSTALLATION METHOD THEREFOR - The invention relates to a roof module for a vehicle with an outer skin (03-05-2009
20090217608ROOF MODULE WITH A VENTILATION DUCT - The invention relates to a roof module with at least one ventilation duct, the ventilation duct (09-03-2009

Patent applications by Matthias Dichtl, Eurasburg DE