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Di Wu
Di Wu, New York, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110101111 | CUSTOMIZABLE TRANSACTION CARD - A financial transaction device is disclosed. The device includes a first surface and a second surface. The first surface comprises a writable field enabling a writing instrument and/or a printing device to write on the first writable field. The writable field allows transaction device purchasers to include a custom note, picture, design, logo, pattern and/or any other indicia on the device. The writable field creates an added element of thoughtfulness to make the gift exchange more special. | 05-05-2011 |
Di Wu, Danbury, CT US
| Patent application number | Description | Published |
|---|---|---|
| 20100273781 | CXCR3 RECEPTOR ANTAGONISTS - The present invention relates to compounds of formula (I): | 10-28-2010 |
| 20100280028 | CXCR3 RECEPTOR ANTAGONISTS - The present invention relates to compounds of formula (I): | 11-04-2010 |
Di Wu, Lund SE
| Patent application number | Description | Published |
|---|---|---|
| 20100246665 | PARALLELIZATION OF HIGH-PERFORMANCE VIDEO ENCODING ON A SINGLE-CHIP MULTIPROCESSOR - High-quality video encoding may be implemented using a single-chip multiprocessor system. Video encoding may be parallelized to take advantage of multiple processing elements available on a single-chip multiprocessor system. Task level parallelism may comprise parallelizing encoding tasks, such as motion estimation, compensation, transformation, quantization, deblocking filtering, and the like across multiple processing elements. Data level parallelism may comprise segmenting video frame data into macroblock partitions and slabs adapted to provide data independence between parallel processing elements. Data communications and synchronization features of the single-chip system may be leveraged to provide for data sharing and synchronism between processing elements. | 09-30-2010 |
Di Wu, Round Rock, TX US
| Patent application number | Description | Published |
|---|---|---|
| 20100194232 | SMALL AIR GAP AIR CORE STATOR - Stator for use in an electrical machine. A non-magnetic support frame section and a non-magnetic axial coil support are used to provide an air gap stator configuration. The present stators provide an air gap winding configuration that facilitates the fixing of stator coils in the air gap. The stator coils are located near the surface of the magnetic back iron and are separated from adjacent coils by non-magnetic structure. | 08-05-2010 |
| 20100194233 | AIR CORE STATOR INSTALLATION - Stator for use in an electrical machine. A non-magnetic support frame section and a non-magnetic coil support are used to provide an air gap stator configuration. The present stators provide an air gap winding configuration that facilitates the fixing of stator coils in the air gap, spaced apart from the magnetic back iron. | 08-05-2010 |
Di Wu, Beijing CN
| Patent application number | Description | Published |
|---|---|---|
| 20100126213 | Liquid-Vapor Separating Method and a Liquid-Vapor Separating Type Evaporator - A liquid-vapor separating method and a liquid-vapor separating type evaporator, the method includes the following steps: (i) provide a partition device ( | 05-27-2010 |
| 20110158507 | METHOD FOR VISION FIELD COMPUTING - A method for vision field computing may comprise the following steps of: forming a sampling system for a multi-view dynamic scene; controlling cameras in the sampling system for the multi-view dynamic scene to perform spatial interleaved sampling, temporal interleaved exposure sampling and exposure-variant sampling; performing spatial intersection to the sampling information in the view subspace of the dynamic scene and temporal intersection to the sampling information in the time subspace of the dynamic scene to reconstruct a dynamic scene geometry model; performing silhouette back projection based on the dynamic scene geometry model to obtain silhouette motion constraints for the view angles of the cameras; performing temporal decoupling for motion de-blurring with the silhouette motion constraints; and reconstructing a dynamic scene 3D model with a resolution larger than nominal resolution of each camera by a 3D reconstructing algorithm. | 06-30-2011 |
Di Wu, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080248160 | XYLANASES, NUCLEIC ACIDS ENCODING THEM AND METHODS FOR MAKING AND USING THEM - The invention relates to xylanases and to polynucleotides encoding the xylanases. In addition, methods of designing new xylanases and methods of use thereof are also provided. The xylanases have increased activity and stability at increased pH and temperature. | 10-09-2008 |
| 20090221051 | XYLANASES, NUCLEIC ACIDS ENCODING THEM AND METHODS FOR MAKING AND USING THEM - The invention relates to xylanases and to polynucleotides encoding the xylanases. In addition, methods of designing new xylanases and methods of use thereof are also provided. The xylanases have increased activity and stability at increased pH and temperature. | 09-03-2009 |
Di Wu, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20090104347 | Hydrophobic Coating - Hydrophobic film or coating, comprising primary particles, secondary particles, adhering to the surface of the primary particles and having an average diameter that is smaller than the average diameter of the primary particles, and a hydrophobic layer covering at least partly the surface of the secondary particles and adhering to that surface, characterized in that the secondary particles are adhering to the surface of the primary particles by covalent chemical bonds. | 04-23-2009 |
Di Wu, Newark, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080210377 | UNIFORM ETCH SYSTEM - Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, where the outer zone surrounds the inner zone and the first gas is different than the second gas. Plasmas are simultaneously generated from the first gas and second gas. The layer is etched, where the layer is etched by the plasmas from the first gas and second gas. | 09-04-2008 |