Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Derksen

Alexander Derksen, Nussbaumen CH

Patent application numberDescriptionPublished
20110214430ACCELERATED COOLING OF A GAS TURBINE - In a method for the fast cooling down of a gas turbine (09-08-2011

Andreas Derksen, Leimen DE

Patent application numberDescriptionPublished
20090172183MANAGEMENT OF NETWORKED RESOURCES ON DIFFERENT PLATFORMS WITH A COMMON INTERFACE - A system and method to manage networked resources from a central management node. The management node is exposed to a common web services interface for a plurality of managed nodes having different system stacks. The management node and the managed nodes employ a schema to encode arbitrary data corresponding to management requests and responses into web services messages.07-02-2009

Andries Johannes Derksen, Nijmegen NL

Patent application numberDescriptionPublished
20100076153PROCESS FOR THE PREPARATION OF DISPERSIONS OF CROSS-LINKING AGENTS IN WATER - A process for the preparation of stable aqueous polycarbodiimide dispersions to be used as cross-linking agents, in which initially an isocyanate functional polycarbodiimide is prepared from a polyisocyanate and a mono- or polyisocyanate which contains a hydrophobic group. Thereafter the polycarbodiimide chain is capped and/or extended by reaction of the isocyanate functions or a part thereof with a hydrophilic amine- or hydroxy functional compound and of the remaining isocyanate functions with an amine- or hydroxy functional compound which contains hydrophobic groups, after which the obtained product is dispersed in water and the pH is adjusted to 9-14. The hydrophobic groups are hydrocarbons with 4-25 carbon atoms, fluorinated hydrocarbons, silicone functional hydrocarbons or polysilicones. Further, the invention relates to a coating mixture in which the polycarbodiimide dispersion is used as cross-linking agent and to the cured material obtained with the coating mixture.03-25-2010

Antonius Theodorus Derksen, Eindhoven NL

Patent application numberDescriptionPublished
20090002652Lithographic apparatus and device manufacturing method - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.01-01-2009

Antonius Theodorus Anna Maria Derksen, Eindhoven NL

Patent application numberDescriptionPublished
20080218717Lithographic apparatus and device manufacturing method - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.09-11-2008
20080218726Lithographic apparatus and device manufacturing method - Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.09-11-2008
20100302519LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.12-02-2010
20110122376LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.05-26-2011
20110181859LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.07-28-2011
20110228241LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.09-22-2011
20110273676IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES - A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.11-10-2011
20110273680IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES - A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.11-10-2011
20110273683LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.11-10-2011
20110279795LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.11-17-2011
20120044468LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.02-23-2012

Patent applications by Antonius Theodorus Anna Maria Derksen, Eindhoven NL

Daniel Derksen, The Hague NL

Patent application numberDescriptionPublished
20110258346Method and System for Link Aggregation - The present invention relates to a method and system for link aggregation, in particular, a method for providing Link Aggregation Control between a plurality of systems adapted for Link Aggregation. A method for providing Link Aggregation Control between a plurality of systems adapted for Link Aggregation is provided. The plurality of systems includes a primary system, a first secondary system, and a second secondary system. The primary system comprises first primary ports being linked to first ports of the first secondary system by first links. Further, the primary system comprises second primary ports being linked to second ports of the second secondary system by second links. The method comprises forming a link aggregation group, wherein the link aggregation group includes at least one first link and at least one second link. A preferred system among the secondary systems having links within the link aggregation group is selected and further, the method comprises setting the status of the primary ports according to the selection of the preferred system.10-20-2011

Johann Derksen, Brakel DE

Patent application numberDescriptionPublished
20090104814T-shaped shielded bus connector - The invention describes a T-shaped bus connector comprising a holding device for mechanically retaining the T-shaped bus connector on a mounting device on which the T-shaped bus connector is to be arranged, and further comprises a first and a second connecting unit for respectively producing an electrical connection to a complementary connecting unit of a device arranged adjacent to the bus connector, wherein the first and second connecting units face in substantially opposing directions and are constructed complementarily to one another, as well as a third connecting unit, oriented substantially perpendicular to the first and second connecting units, for producing an electrical connection to a connecting unit, complementary to the third connecting unit, of an electrical or electronic module, wherein data and/or power bus lines are run between all three connecting units, and all three connecting units are covered at least in part with a shielding material.04-23-2009
20090157937Modular Data Transmission System with Separate Energy Supply for Each Connected Module - The invention pertains to a modular data transmission system (06-18-2009

Sander Derksen, Raamsoonksveer NL

Patent application numberDescriptionPublished
20090267580DC-DC CONVERTER WITH SWITCHABLE ESTIMATORS - A DC-DC converter is provided with a first estimator unit (RAE, RLPF, RHPF) for performing an accurate control signal estimation and a second estimator unit (FEU, ΔVEU) for performing a fast control signal estimation. In addition, a switching unit (SU) is provided for switching to an output of the first estimator unit (RAE, RLPF, RHPF) during almost constant control signal conditions and for switching to an output of the second estimator unit (FEU, ΔVEU) during changing control signal conditions to provide an estimation on the required control signal.10-29-2009

Sjaak Derksen, Nieuwegein NL

Patent application numberDescriptionPublished
20120115483Method for Transferring a Communication Session in a Telecommunications Network From a First Connection to a Second Connection - The invention relates to an application server in a telecommunications network for transferring a communication session from a first connection between a first client and a remote client to a second connection between a second client and the remote client. The communication session comprises a media path and a signalling path. The application server being arranged to a) receive a transfer request, b) send a set-up request to the second client, for setting up the second connection, c1) transfer the signalling path, c2) transfer the media path, d) send an update message towards the remote party, the update message comprising an indication that the transfer has been executed, and e) send a termination message to the first client to terminate the first connection.05-10-2012

Sven Derksen, Villach AT

Patent application numberDescriptionPublished
20090011734Power Detector Radio Frequency Multiplexer - Implementations related to systems and devices that make use of a power detector multiplexer are presented herein.01-08-2009
20090067351Power Detector Radio Frequency Multiplexer - Implementations related to systems and devices that make use of a power detector multiplexer are presented herein.03-12-2009