| Patent application number | Description | Published |
|---|
| 20080305260 | Organometallic compounds - Heteroleptic organometallic compounds containing at least one formamidinate ligand are provided. These heteroleptic organometallic compounds have improved properties over conventional vapor deposition precursors. Such compounds are suitable for use as vapor deposition precursors including direct liquid injection. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds or their solutions in organic solvents. | 12-11-2008 |
| 20090017208 | Precursor compositions and methods - Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition. | 01-15-2009 |
| 20090020010 | Purification process using microchannel devices - This invention relates to methods of removing impurities from compounds having similar volatilities to form ultra high purity compounds. | 01-22-2009 |
| 20090023940 | Method of preparing organometallic compounds - A method of preparing an ultra-pure organometallic compound comprising using a microchannel device for synthesis in reacting a metal halide with an alkylating agent to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition. | 01-22-2009 |
| 20090156852 | Organometallic compounds - Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices. | 06-18-2009 |
| 20100185002 | Method of Preparing Organometallic Compounds - A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition. | 07-22-2010 |
| 20100185003 | Method of Preparing Organometallic Compounds - A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition. | 07-22-2010 |
| 20100300361 | DELIVERY DEVICE - Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors. | 12-02-2010 |
| 20110003463 | DOPING METHOD - Methods of doping a III-V compound semiconductor film are disclosed. | 01-06-2011 |
| 20110064879 | ORGANOMETALLIC COMPOUNDS - Methods of vapor depositing metal-containing films using certain organometallic compounds containing a carbonyl-containing ligand are disclosed. | 03-17-2011 |
