Patent application number | Description | Published |
20120156877 | Showerhead for Processing Chamber - A top assembly for a processing chamber having a back plate and a hub is provided. The back plate has a first portion and a second portion. The first portion is connected to the second portion through a central region of the back plate, wherein a gap is defined between opposing surfaces of the first and second portions outside the central region. The first portion includes an embedded heating element. The hub is affixed to a top surface of the second portion of the back plate over the central region. The hub has a top surface with a plurality of channel openings defined within a central region of the hub and a bottom surface having a central extension with a plurality of channels defined therethrough. The bottom surface includes an annular extension spaced apart from the central extension. | 06-21-2012 |
20120289057 | APPARATUS AND METHOD FOR MULTIPLE SYMMETRICAL DIVISIONAL GAS DISTRIBUTION - An apparatus and method for multiple symmetrical divisional gas distribution providing a mounting plate, a plurality of manifolds coupled to the mounting plate, a center purge block coupled to the mounting plate and the plurality of manifolds, a plurality of reactant distribution blocks, wherein each reactant distribution block is stacked atop each other to form a reactant distribution block stack, wherein the reactant distribution block stack sits atop the center purge block, a coupling mechanism to secure the plurality of reactant distribution blocks of the reactant distribution block stack together; and a top cap coupled to the reactant distribution block stack and the coupling mechanism. | 11-15-2012 |
20130145988 | Substrate Processing Bubbler Assembly - Embodiments provided herein describe bubbler assemblies for substrate processing systems. The substrate processing bubbler assemblies include an inner shell, an outer shell, and a thermoelectric device. The inner shell is configured to hold a liquid. The outer shell at least partially surrounds the inner shell. The inner shell and the outer shell are sized and shaped such that a gap is formed between the inner shell and the outer shell. The thermoelectric device interconnects the inner shell and the outer shell. The thermoelectric device has a first side adjacent to the inner shell and a second side adjacent to the outer shell and is configured to transfer heat between the first side and the second side thereof. | 06-13-2013 |
20140174910 | Sputter Gun Shield - A shielding component and a sputter gun are described. The sputter gun has a housing. The housing has a region configured to expose a target surface. The shielding component extends around an inward facing periphery of the region. The shielding component comprises metal foam. The shielding component is configured to provide a fluid proximate to the target surface. An annular channel may be arranged to provide a gas through pores of the metal foam of the shielding component, to the region proximate to the target. | 06-26-2014 |
20140273309 | Controlling Radical Lifetimes in a Remote Plasma Chamber - Remote-plasma treatments of surfaces, for example in semiconductor manufacture, can be improved by preferentially exposing the surface to only a selected subset of the plasma species generated by the plasma source. The probability that a selected species reaches the surface, or that an unselected species is quenched or otherwise converted or diverted before reaching the surface, can be manipulated by introducing additional gases with selected properties either at the plasma source or in the process chamber, varying chamber pressure or flow rate to increase or decrease collisions, or changing the dimensions or geometry of the injection ports, conduits and other passages traversed by the species. Some example processes treat surfaces preferentially with relatively low-energy radicals, vary the concentration of radicals at the surface in real time, or clean and passivate in the same unit process. | 09-18-2014 |