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Debruler, US
Jason L. Debruler, West Chester, OH US
| Patent application number | Description | Published |
|---|---|---|
| 20100305738 | SYSTEMS AND METHODS FOR CONTROLLING REGISTRATION OF ADVANCING SUBSTRATES IN ABSORBENT ARTICLE CONVERTING LINES - The present disclosure relates to systems and processes for controlling the registration of advancing substrates in absorbent article converting lines. The systems and methods may utilize feedback from technologies, such as vision systems, sensors, remote input and output stations, and controllers with synchronized embedded clocks to accurately correlate registration feature detections and substrate speed control on an absorbent article converting process. The systems and methods may accurately apply the use of precision clock synchronization for both instrumentation and control system devices on a non-deterministic communications network. In turn, the clock synchronized control and instrumentation network may be used to control the substrate speed. As such, the controller may be programmed to track registration features on substrates and components along the converting line without having to account for undeterminable delays. | 12-02-2010 |
| 20100305739 | SYSTEMS AND METHODS FOR CONTROLLING PHASING OF ADVANCING SUBSTRATES IN ABSORBENT ARTICLE CONVERTING LINES - The present disclosure relates to systems and processes for controlling the relative positions or phasing of advancing substrates and/or components in absorbent article converting lines. The systems and methods may utilize feedback from technologies, such as vision systems, sensors, remote input and output stations, and controllers with synchronized embedded clocks to accurately correlate component placement detections and placement control on an absorbent article converting process. The systems and methods may accurately apply the use of precision clock synchronization for both instrumentation and control system devices on a non-deterministic communications network. In turn, the clock synchronized control and instrumentation network may be used to control the substrate position. As such, the controller may be programmed to the relative positions of substrates and components along the converting line without having to account for undeterminable delays. | 12-02-2010 |
Jason Lee Debruler, West Chester, OH US
| Patent application number | Description | Published |
|---|---|---|
| 20100288428 | Label Applicator Having a Vacuum Box - The present invention is directed to an apparatus for labeling a container comprising (a) first winder capable of unwinding a heat transfer label from a heat transfer label roll, (b) first vacuum box capable of containing at least a portion of the heat transfer label unwound from the first winder, (c) vacuuming means, (d) heater plate, and (e) heat label applicator. The use of one or more vacuum boxes enables containers to be labeled at a greater speed. | 11-18-2010 |
| 20100288437 | Label Applicator Having a Heat Idler - The use of a heat idler moveable along a path provides speed and flexibility in the heat labeling of containers. | 11-18-2010 |
| 20110060447 | System and Methods For Registering A Controlled Web To A Pitched Unit Operation - Systems and methods for registering a web to an on-line pitched unit operation. | 03-10-2011 |
| 20110120642 | Label Applicator Having a Vacuum Box - The use of one or more vacuum boxes enables containers to be labeled at a greater speed. | 05-26-2011 |
Lee Debruler, Boise, ID US
| Patent application number | Description | Published |
|---|---|---|
| 20090166699 | Semiconductor Constructions - In some embodiments, an opening is formed through a first material, and sidewall topography of the opening is utilized to form a pair of separate anistropically etched spacers. The spacers are utilized to pattern lines in material underlying the spacers. Some embodiments include constructions having one or more openings which contain steep sidewalls joining to one another at shallow sidewall regions. The constructions may also contain lines along and directly against the steep sidewalls, and spaced from one another by gaps along the shallow sidewall regions. | 07-02-2009 |
| 20100295158 | Semiconductor Constructions - In some embodiments, an opening is formed through a first material, and sidewall topography of the opening is utilized to form a pair of separate anistropically etched spacers. The spacers are utilized to pattern lines in material underlying the spacers. Some embodiments include constructions having one or more openings which contain steep sidewalls joining to one another at shallow sidewall regions. The constructions may also contain lines along and directly against the steep sidewalls, and spaced from one another by gaps along the shallow sidewall regions. | 11-25-2010 |
Tedi-Lea Anne Debruler, West Chester, OH US
| Patent application number | Description | Published |
|---|---|---|
| 20090258190 | FIBROUS STRUCTURES COMPRISING A POLYMER STRUCTURE - Polymer structures and methods for making such polymer structures are provided. More particularly, polymer structures comprising a hydroxyl polymer structure, such as a fiber comprising a hydroxyl polymer are provided. Even more particularly, fibrous structures comprising a hydroxyl polymer structure, such as a fiber comprising a hydroxyl polymer, wherein the fibrous structure exhibits a CETM Factor of less than 20 and/or a CETM*L | 10-15-2009 |
| 20090260746 | PROCESS FOR MAKING FIBROUS STRUCTURES COMPRISING A POLYMER STRUCTURE - Polymer structures and methods for making such polymer structures are provided. More particularly, polymer structures comprising a hydroxyl polymer structure, such as a fiber comprising a hydroxyl polymer are provided. Even more particularly, fibrous structures comprising a hydroxyl polymer structure, such as a fiber comprising a hydroxyl polymer, wherein the fibrous structure exhibits a CETM Factor of less than 20 and/or a CETM*L | 10-22-2009 |