| Patent application number | Description | Published |
| 20080218718 | Lithographic apparatus and device manufacturing method - A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation. | 09-11-2008 |
| 20080291417 | Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control - A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned. | 11-27-2008 |
| 20090213353 | Lithographic Apparatus and Device Manufacturing Method - Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation. | 08-27-2009 |
| 20090219519 | APPARATUS AND METHOD FOR INSPECTING CIRCUIT STRUCTURES - An apparatus is described for scanning a circuit structure. The apparatus has a linear sensor ( | 09-03-2009 |
| 20090284720 | Lithographic Apparatus and Device Manufacturing Method - A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam. | 11-19-2009 |