| Patent application number | Description | Published |
| 20080213179 | Differentially Expressed Nucleic Acids in the Blood-Brain Barrier Under Inflammatory Conditions - The present invention relates to nucleic acids and polypeptides encoded thereby, whose expression is modulated in brain microvascular endothelial cells undergoing early dynamic inflammation-induced changes in blood-brain barrier functionality. Such polypeptides are referred to as lipopolysaccharide-sensitive (LPSS) polypeptides herein. These nucleic acids and polypeptides may be useful in methods for controlling blood-brain barrier properties in mammals in need of such biological effects. This includes the diagnosis and treatment of disturbances in the blood-brain/retina barrier, brain (including the eye) disorders, as well as peripheral vascular disorders. Additionally, the invention relates to the use of anti-LPSS polypeptide antibodies or ligands as diagnostic probes, as blood-brain barrier targeting agents or as therapeutic agents as well as the use of ligands or modulators of expression, activation or bioactivity of LPSS polypeptides as diagnostic probes, therapeutic agents or drug delivery enhancers. | 09-04-2008 |
| 20110274749 | METHODS AND COMPOSITIONS FOR TARGETING AGENTS INTO AND ACROSS THE BLOOD-BRAIN BARRIER AND OTHER ENDOTHELIAL CELL MICROVASCULAR BARRIERS - The present invention relates to nucleic acids and polypeptides encoded thereby, whose expression is modulated in brain microvascular endothelial cells undergoing early dynamic inflammation-induced changes in blood-brain bather functionality. Such polypeptides are referred to as lipopolysaccharide-sensitive (LPSS) polypeptides. These nucleic acids and polypeptides may be useful in methods for controlling blood-brain bather properties in mammals in need of such biological effects. This includes the diagnosis and treatment of disturbances in the blood-brain/retina barrier, brain (including the eye) disorders, as well as peripheral vascular disorders. Additionally, the invention relates to the use of anti-LPSS polypeptide antibodies or ligands as diagnostic probes, as blood-brain barrier targeting agents or as therapeutic agents as well as the use of ligands or modulators of expression, activation or bioactivity of LPSS polypeptides as diagnostic probes, therapeutic agents or drug delivery enhancers. | 11-10-2011 |
| Patent application number | Description | Published |
| 20080220971 | Novel method to increase pathogen resistance in plants - The invention provides a method for enhancing resistance in plants by providing these plants with a gene construct comprising a DNA sequence coding for a receptor for a systemic signal compound, wherein such a systemic signal compound is one or more of the group consisting of salicylic acid, jasmonic acid and brassinosteroids. The resistance can the be induced by contacting said plants with said signal compound. Preferably, the receptor is an RKS receptor, salicylic acid receptor or jasmonic acid receptor. Also combinations and/or chimaeric receptors can be applied. | 09-11-2008 |
| 20080307544 | Method to Prime Plants in Order to Increase Their Pathogen Resistance - The invention provides a method for priming plants, thereby achieving an enhancing resistance by providing these plants with a gene construct comprising a DNA sequence coding for an RKS receptor. The resistance can then be induced by contacting said plants with the pathogen or with a signal compound. | 12-11-2008 |
| 20090029439 | Regeneration - The invention relates to the filed of regeneration of cells, self-renewal of (micro-organisms), and the vegetative propagation of plant parts such as plant tissues or organs. | 01-29-2009 |
| 20090126041 | Regeneration - The invention relates to the field of regeneration of cells and the vegetative propagation of (micro)-organisms or specific parts such as tissues or organs thereof, for example of those cells grown in tissue or organ culture, and more in particular to the seedless propagation of plants. The invention provides a culture method for propagation of a plant from plant starting material wherein during regeneration of said starting material, especially in the phase of the development of the shoot-root body plan, root or shoot initiation is stimulated by a recombinant gene product or functional fragment thereof, for example derived from a gene involved in the regulation of plant development allowing reducing or omitting exogenous phytohormone addition to said culture. | 05-14-2009 |
| 20100146664 | Resistance to Abiotic Stress in Plants - The invention relates to a method for conferring tolerance to abiotic stress to plants or plant cells. This is done by introducing a gene coding for an RKS protein, especially a gene coding for an RKS subgroup II protein, more specifically RKS1, RKS4 or truncated RKS4, or a gene from RKS subgroup III, more preferably RKS12. The effect of overexpression of the RKS gene may be enhanced by additionally treating the plant with a brassinosteroid compound. | 06-10-2010 |
| 20100273155 | DETERMINATION OF QUALITY FEATURES IN AGRICULTURAL AND HORTICULTURAL CROPS - The present invention relates to a method for predicting the expected value of the quality features in agricultural and horticultural product and a method for predicting the expected optimal time of harvest by comparing expression parameters at the moment prior to harvest or during the postharvest path of genes and/or proteins related to such quality features for that agricultural and horticultural product, with (a) predetermined calibration line(s). The invention also comprises the markers M8, GAST and GDSL motif lipase and the uses thereof, as well as antibodies against them. | 10-28-2010 |
| 20110105338 | EXPRESSION-LINKED GENE DISCOVERY - The invention relates to a method for analyzing a genomic region of an organism, comprising four major parts. The first part involves the isolation of mRNA from a selected organism that is used for the preparation of small single stranded DNA fragments with one adaptor containing an affinity label. These DNA fragments are used in part three. In the second part, genomic DNA from the same or a related organism is isolated. This genomic DNA is fragmented and ligated to adaptor molecules. In the third part, these genomic fragments are hybridized with single stranded DNA fragments from part one, and the hybrids formed in this process are used for synthesis of DNA fragments. These fragments will be used in part four which involves sequencing of these fragments using one of the available high throughput sequencing methods. | 05-05-2011 |
| Patent application number | Description | Published |
| 20100062531 | RGD Containing Recombinant Gelatin - The invention concerns recombinant gelatins with unevenly distributed RGD motifs that are of particular use in several applications involving cell attachment such as in cell culture work and applications involving cell cultures of anchor dependent cells and also in a variety of medical applications. | 03-11-2010 |
| 20100075902 | Recombinant XRGD-Enriched Gelatins Having High Stability - The invention concerns recombinant gelatin monomers and recombinant gelatins comprising or consisting of multimers of the monomers. The recombinant gelatins are of particular use in several applications involving cell attachment such as in cell culture work and applications involving cell cultures of anchor dependent cells and also in a variety of medical applications. | 03-25-2010 |
| 20100105618 | Non-Natural Recombinant Gelatins with Enhanced Functionality - The invention concerns recombinant gelatin monomers and recombinant gelatins comprising or consisting of multimers of the monomers. The recombinant gelatins can be produced with enhanced stability. | 04-29-2010 |
| 20100119574 | Recombinant Gelatins - The invention concerns a recombinant CBE gelatin and recombinant gelatins having multimers of the CBE monomer sequence that are of particular use in several applications involving cell attachment such as in cell culture work and applications involving cell cultures of anchor dependent cells and also in a variety of medical applications. | 05-13-2010 |
| 20100273215 | Secretion Yield of a Protein of Interest by in vivo Proteolytic Processing of a Multimeric Precursor - The invention relates to a nucleic acid molecule encoding a multimeric precursor which after transcription is specifically cleaved in vivo to form multiple copies of a protein of interest. The invention further relates to a cell comprising this nucleic acid molecule and a method for producing a protein of interest using this cell. | 10-28-2010 |
| 20110256222 | Recombinant Protein Enriched in a Heparin Binding Site and/or in a Heparan Sulfate Binding Site - The invention relates to a recombinant protein enriched in a heparin binding site and/or a heparan sulfate binding site. Such recombinant protein is used as an in vivo controlled release system of a protein of interest. | 10-20-2011 |
| Patent application number | Description | Published |
| 20100044578 | Charged Particle Beam Lithography System and Target Positioning Device - The invention relates to a charged particle beam lithography system comprising:
| 02-25-2010 |
| 20100270299 | CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER - A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space. | 10-28-2010 |
| 20110042579 | CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER - The invention relates to a charged particle lithography apparatus with a charged particle source for creating one or more charged particle beams, a charged particle projector for projecting the beams onto a wafer; and a moveable wafer stage for carrying the wafer. The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door. | 02-24-2011 |
| 20110049393 | Lithography Machine and Substrate Handling Arrangement - An arrangement comprising a plurality of charged particle lithography apparatuses, each charged particle lithography apparatus having a vacuum chamber. The arrangement further comprises a common robot for conveying wafers to the plurality of lithography apparatuses, and a wafer load unit for each charged particle lithography apparatus arranged at a front side of each respective vacuum chamber. The plurality of lithography apparatuses are arranged in a row with the front side of the lithography apparatuses facing an aisle accommodating passage of the common robot for conveying wafers to each apparatus, and the rear side of each lithography apparatus faces an access corridor, and the back wall of each vacuum chamber is provided with an access door for access to the respective lithography apparatus. | 03-03-2011 |
| 20110193573 | INTEGRATED SENSOR SYSTEM - An integrated sensor system for a lithography machine, the system comprising a projection lens system ( | 08-11-2011 |
| 20110193574 | CAPACITIVE SENSING SYSTEM - A capacitive sensing system, comprising a sensor having thin film structure, the thin film structure comprising a sensor having a first insulating layer and a first conductive film comprising a sensing electrode formed on a first surface of the first insulating layer and a second conductive film comprising a back guard electrode. The back guard electrode is formed in a single plane and comprises a peripheral portion in the same plane, and is disposed on a second surface of the first insulating layer and a first surface of a second insulating layer or protective layer. The peripheral portion of the back guard electrode extends beyond the sensing electrode to form a side guard electrode which substantially or completely surrounds the sensing electrode. | 08-11-2011 |
| 20110254565 | CAPACITIVE SENSING SYSTEM WITH DIFFERENTIAL PAIRS - A capacitive sensing system comprising two or more capacitive sensors, one or more AC power sources for energizing the capacitive sensors, and a signal processing circuit for processing signals from the sensors. The sensors are arranged in pairs, wherein the one or more AC power sources are arranged to energize a first sensor of a pair of the sensors with an alternating current or voltage 180 degrees out of phase to a current or voltage for a second sensor of the pair of sensors, and wherein a pair of the sensors provides a measuring unit for a single measured distance value, the signal processing circuit receiving an output signal from each sensor of the pair and generating a measured value related to the average distance between the sensors of the pair and the target. | 10-20-2011 |
| 20110261344 | EXPOSURE METHOD - A method for exposing a surface of a target in a system comprising a set of sensors ( | 10-27-2011 |
| 20120056100 | CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE - The invention relates to a charged particle beam lithography system comprising: | 03-08-2012 |
| Patent application number | Description | Published |
| 20090077676 | PREMATURELY AGEING MOUSE MODELS FOR THE ROLE OF DNA DAMAGE IN AGEING AND INTERVENTION IN AGEING-RELATED PATHOLOGY - The current invention pertains to a method for screening and discovery of compounds capable of inhibiting, preventing, delaying or reducing genome maintenance disorders and consequences thereof, in particular ageing related symptoms and disorders. The current invention provides a method for screening and discovery of compounds that are capable of inhibiting, preventing, delaying or reducing genome maintenance disorders and consequences thereof. The invention exploits animal models that comprise deficiencies in their genome maintenance systems, such as DNA repair systems, and display premature, enhanced, accelerated or segmental ageing phenotypes. These animal models can be advantageously applied to screen compounds and thereby develop schemes of intervention to treat, delay, inhibit, prevent or cure ageing related symptoms. The current invention thus provides a new and powerful tool to screen aid/or discover therapeutically active compounds to treat ageing related symptoms and diseases. On the same basis it permits screening and discovery of compounds that influence ischemia, reperfusion damage in organ/tissue transplantation, chemotherapy and stem cell transplantation. | 03-19-2009 |
| 20110009282 | HIGH THROUGHPUT SCREENING METHOD AND APPARATUS FOR ANALYSING INTERACTIONS BETWEEN SURFACES WITH DIFFERENT TOPOGRAPHY AND THE ENVIRONMENT - The invention is directed to a high throughput screening method for analyzing and interaction between a surface of a material and an environment. The screening method of the invention comprises: providing a micro-array comprising said material and having a multitude of units at least part of which have different topography; contacting at least part of said multitude of units with said environment; and screening said micro-array for an interaction between one or more of said units and said environment. | 01-13-2011 |
| Patent application number | Description | Published |
| 20090059360 | SYSTEM AND METHOD FOR SELF-INTERFERENCE FLUORESCENCE MICROSCOPY, AND COMPUTER-ACCESSIBLE MEDIUM ASSOCIATED THEREWITH - Exemplary apparatus and/or method can be provided using which, it is possible to provide information associated with at least one portion of a sample. For example, at least one electro-magnetic radiation received from the at least one portion of the sample can be separated into a plurality of first radiations, one of the first radiations having a phase delay that is different from a phase delay of another of the first radiations. In addition, at least one of the first radiations can be received and separated into second radiations according to wavelengths of the received at least one of the first radiations. Further, it is possible to detect the second radiations and generate information regarding a position of the at least one portion of the sample as a function of at least one characteristic of at least one interference of the first radiations. According to another exemplary embodiment, it is possible to provide system, method and computer accessible medium, in which data associated with first radiations can be obtained, and the information regarding a position of the at least one portion of the sample may be generated. Such information can be generated based on the data by separating second radiations associated with the portion(s) of the sample according to wavelengths of at least one of the second radiations. For example, one of the second radiations can have a phase delay that is different from a phase delay of another one of the second radiations, and the second radiations may be interfering. | 03-05-2009 |
| 20090122302 | SYSTEM AND METHOD FOR CLADDING MODE DETECTION - According to an exemplary embodiment, systems and methods can be provided for compensating for, reducing and/or eliminating data associated with at least one aberration provided within a sample. For example, using such exemplary systems and methods, it may be possible to transmit at least one first electromagnetic radiation to the sample via an optical fiber. At least one second electromagnetic radiation can be received from the sample, and the first and second radiations may be associated with one another At least one first intensity of at least one portion of the second radiation within a core of the optical fiber and at least one portion of at least one second intensity of the second radiation within a cladding of the optical fiber at least partially surrounding to the core can be detected. Further, the first radiation and/or the second radiation can be modified as a function of the first and second intensities so as to compensate for, reduce and/or eliminate the data associated with the aberration. | 05-14-2009 |
| 20090196477 | Process, System And Software Arrangement For A Chromatic Dispersion Compensation Using Reflective Layers In Optical Coherence Tomography (OCT) Imaging - A system, process and software arrangement are provided to compensate for a dispersion in at least one portion of an image. In particular, information associated with the portion of the image is obtained. The portion of the image can be associated with an interference signal that includes a first electromagnetic radiation received from a sample and a second electromagnetic radiation received from a reference. The dispersion in the at least one portion of the image can be compensated by controlling a phase of at least one spectral component of the interference signal. | 08-06-2009 |
| 20090219544 | SYSTEMS, METHODS AND COMPUTER-ACCESSIBLE MEDIUM FOR PROVIDING SPECTRAL-DOMAIN OPTICAL COHERENCE PHASE MICROSCOPY FOR CELL AND DEEP TISSUE IMAGING - Exemplary arrangement, apparatus, method and computer accessible can be provided. For example, using the exemplary arrangement, apparatus and method, it is possible to configured to propagate at least one electro-magnetic radiation. Indeed, it is possible to receive, using at least one first arrangement, a first portion of the at least one electro-magnetic radiation directed to a sample and a second portion of the least one electro-magnetic radiation directed to a reference, the first arrangement can be structured to at least partially reflect and at least partially allow to transmit the first and second portions. In addition, it is possible to receive, using a second arrangement, (i) a third portion of the electro-magnetic radiation associated with at least one of the transmitted first portion or the reflected first portion from the sample and (ii) a fourth portion of the electro-magnetic radiation associated with at least one of the second transmitted portion of the least one electro-magnetic radiation or the reflected second portion from the reference. The third and fourth portions can travel at least partially along substantially the same path toward the second arrangement, Further, the second arrangement can be configured to receive the reflected first and second portion(s) which interfere with one another, and generate at least one signal which includes information associated with at least one fluctuation in an uncommon path of the first and second portions prior to a receipt thereof by the at least one first arrangement. In addition or alternatively, the second arrangement can be configured to determine information regarding a spectrally resolved interference associated with the third and fourth portions. | 09-03-2009 |
| 20120002686 | PROCESS AND APPARATUS FOR A WAVELENGTH TUNING SOURCE - An apparatus and source arrangement for filtering an electromagnetic radiation can be provided which may include at least one spectral separating arrangement configured to physically separate one or more components of the electromagnetic radiation based on a frequency of the electromagnetic radiation. The apparatus and source arrangement may also have at least one continuously rotating optical arrangement which is configured to receive at least one signal that is associated with the one or more components. Further, the apparatus and source arrangement can include at least one beam selecting arrangement configured to receive the signal. | 01-05-2012 |
| Patent application number | Description | Published |
| 20090027689 | METHOD AND APPARATUS FOR PERFORMING OPTICAL IMAGING USING FREQUENCY-DOMAIN INTERFEROMETRY - An apparatus and method are provided. In particular, at least one first electro-magnetic radiation may be provided to a sample and at least one second electro-magnetic radiation can be provided to a non-reflective reference. A frequency of the first and/or second radiations varies over time. An interference is detected between at least one third radiation associated with the first radiation and at least one fourth radiation associated with the second radiation. Alternatively, the first electro-magnetic radiation and/or second electro-magnetic radiation have a spectrum which changes over time. The spectrum may contain multiple frequencies at a particular time. In addition, it is possible to detect the interference signal between the third radiation and the fourth radiation in a first polarization state. Further, it may be preferable to detect a further interference signal between the third and fourth radiations in a second polarization state which is different from the first polarization state. The first and/or second electro-magnetic radiations may have a spectrum whose mean frequency changes substantially continuously over time at a tuning speed that is greater than 100 Tera Hertz per millisecond. | 01-29-2009 |
| 20100309477 | METHOD AND APPARATUS FOR PERFORMING OPTICAL IMAGING USING FREQUENCY-DOMAIN INTERFEROMETRY - An apparatus and method are provided. In particular, at least one first electro-magnetic radiation may be provided to a sample and at least one second electro-magnetic radiation can be provided to a non-reflective reference. A frequency of the first and/or second radiations varies over time. An interference is detected between at least one third radiation associated with the first radiation and at least one fourth radiation associated with the second radiation. Alternatively, the first electro-magnetic radiation and/or second electro-magnetic radiation have a spectrum which changes over time. The spectrum may contain multiple frequencies at a particular time. In addition, it is possible to detect the interference signal between the third radiation and the fourth radiation in a first polarization state. Further, it may be preferable to detect a further interference signal between the third and fourth radiations in a second polarization state which is different from the first polarization state. The first and/or second electro-magnetic radiations may have a spectrum whose mean frequency changes substantially continuously over time at a tuning speed that is greater than 100 Tera Hertz per millisecond. | 12-09-2010 |
| 20110299091 | METHOD AND APPARATUS FOR PERFORMING OPTICAL IMAGING USING FREQUENCY-DOMAIN INTERFEROMETRY - An apparatus and method are provided. In particular, at least one first electro-magnetic radiation may be provided to a sample and at least one second electro-magnetic radiation can be provided to a non-reflective reference. A frequency of the first and/or second radiations varies over time. An interference is detected between at least one third radiation associated with the first radiation and at least one fourth radiation associated with the second radiation. Alternatively, the first electro-magnetic radiation and/or second electro-magnetic radiation have a spectrum which changes over time. The spectrum may contain multiple frequencies at a particular time. In addition, it is possible to detect the interference signal between the third radiation and the fourth radiation in a first polarization state. Further, it may be preferable to detect a further interference signal between the third and fourth radiations in a second polarization state which is different from the first polarization state. The first and/or second electro-magnetic radiations may have a spectrum whose mean frequency changes substantially continuously over time at a tuning speed that is greater than 100 Tera Hertz per millisecond. | 12-08-2011 |
| Patent application number | Description | Published |
| 20100106105 | Microneedle Structure And Production Method Therefor - A method for processing a wafer to form a plurality of hollow microneedles projecting from a substrate includes forming, by use of a dry etching process, a number of groups of recessed features, each including at least one slot deployed to form an open shape having an included area and at least one hole located within the included area. The internal surfaces of the holes and the slots are then coated with a protective layer. An anisotropic wet etching process is then performed in such a manner as to remove material from outside the included areas while leaving a projecting feature within each of the included areas. The protective layer is then removed to reveal the microneedles. | 04-29-2010 |
| 20100224590 | METHOD FOR PRODUCING MICRONEEDLE STRUCTURES EMPLOYING ONE-SIDED PROCESSING - A method for forming a hollow microneedle structure includes processing the front side of a wafer to form at least one microneedle projecting from a substrate and a through-bore passing through the microneedle and through a thickness of the substrate. An entire length of the through-bore is formed by a dry etching process performed from the front side of the wafer. Most preferably, upright surfaces of the microneedle structure and the through bore of the structure are formed by dry etching performed via a single mask with differing depths obtained by harnessing aspect ratio limitations of the dry etching process. | 09-09-2010 |
| 20110073560 | Microneedle Structure And Production Method Therefor - A method for processing a wafer to form a plurality of hollow microneedles projecting from a substrate includes forming, by use of a dry etching process, a number of groups of recessed features, each including at least one slot deployed to form an open shape having an included area and at least one hole located within the included area. The internal surfaces of the holes and the slots are then coated with a protective layer. An anisotropic wet etching process is then performed in such a manner as to remove material from outside the included areas while leaving a projecting feature within each of the included areas. The protective layer is then removed to reveal the microneedles. | 03-31-2011 |