Patent application number | Description | Published |
20100039727 | E-BEAM WRITE FOR HIGH-PRECISION DOT PLACEMENT - A recording system for magnetic storage devices, including a beam column for generating a beam, a platform for moving a magnetic storage medium relative to the beam, and a signal generator for sequentially, or in a continuously alternating manner, deflecting the beam. In turn, the beam is directed according to displacement of dots on the extent of the magnetic storage medium such that dots of a plurality of dot groupings can be written to on the extent during a single pass of the beam column above the extent. | 02-18-2010 |
20100046118 | TIME-SHIFTED BITS FOR WRITE SYNCHRONIZATION CORRECTION - Systems and methods are provided for correcting write synchronization of a magnetic storage device with respect to magnetic storage media and its corresponding writable magnetic bits, or dots. In particular, these systems and methods involve using time-shifting principles to calibrate the magnetic storage devices to correct slow drifts of reader-writer timing. It is to be appreciated that time-shifting techniques can be applied in a variety of manners. For example, the very dots on the media can be positioned in time-shifted fashion. In another example, the writing to the dots can be time-shifted. | 02-25-2010 |
20100053809 | EMBEDDED SERVO ON TRACK FOR BIT-PATTERNED MEDIA (BPM) - A method of making a disc for a computer disc drive and a disc made in accordance with the same. The disc includes a deposited magnetic layer of a thin film medium over a disc-shaped substrate. A master pattern having a plurality of tracks is recorded on the disc. Each track on the disc includes a plurality of magnetic islands, each having a size and magnetic properties. The size and/or magnetic properties of one or more of the magnetic islands of each track are modulated such that each track has a modulation frequency, so as to imprint a magnetic topology on the disc. The modulation frequency of each track is either a fundamental frequency or an overtone of the fundamental frequency. | 03-04-2010 |
20100062282 | BIT PATTERNED MEDIA - The invention relates to bit patterned recording media having a stop layer for chemical mechanical polishing. One embodiment of the present invention is a method of manufacturing a magnetic recording medium comprising the step of planarizing by chemical mechanical polishing until the stop layer is reached. The present invention also provides a magnetic recording medium having a stop layer. | 03-11-2010 |
20100119778 | ULTRA THIN ALIGNMENT WALLS FOR DI-BLOCK COPOLYMER - Methods comprising providing a pre-patterned substrate having an array of thick walls, depositing a conforming layer on the pre-patterned substrate, etching the conforming layer from the top of the thick walls and the space between the walls, and etching the thick walls while leaving thin walls of conforming layer. | 05-13-2010 |
20100221581 | PROCESS FOR FABRICATING PATTERNED MAGNETIC RECORDING MEDIA - A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer. | 09-02-2010 |
20100247960 | PATTERNED ECC AND GRADIENT ANISOTROPY MEDIA THROUGH ELECTRODEPOSITION - An electrodeposited magnetic recording medium having multiple coercivity values is disclosed. In some embodiments, layers having different coercivity levels may be separated by exchange coupled composites and in other embodiments a range of coercivity levels are deposited in a gradient fashion. In some embodiments, the layers with multiple coercivity values comprise bit patterned media islands formed from a photoresist. | 09-30-2010 |
20110027407 | PROFILE CONTROL UTILIZING A RECESSED IMPRINT TEMPLATE - An imprint template is provided with a shallower field bordering the patterned region. The shallower field can be formed with additional lithography/etch steps after (or before) the formation of the features in the patterned region. The template is used to establish a thin film pattern with a field thickness that is shallower than the pattern. A shallower field bordering the patterned region alleviates sidewall re-deposition during ion mill. In a planarization/etch-back process, a thinner field helps to achieve a flat top surface by compensating for the thickness variation caused by different filling ratios. Fabrication of the recessed field template comprises a multi-step patterning process. The initial patterns are formed using a convention fabrication process. A second patterning step is used to reduce the height of the field region, which can be applied by coating the “half-finished” template with a suitable resist pattern and patterning the resist using a second lithography step that is aligned to the original pattern. Template material in the field region is then etched with the resist as a mask, forming a template with a recessed field region after the remaining resist is removed. It should be appreciated that the order of these etch steps can be reversed to obtain the same result. | 02-03-2011 |
20110038082 | COMBINED CMP AND ETCH PLANARIZATION - A magnetic device having a magnetic feature, the magnetic feature including magnetic portions, a stop layer portion on each magnetic portion, and a region of non-magnetic material adjacent to the magnetic portions and the stop layer portions, where the stop layer portions define planar upper boundaries for the magnetic portions and an endpoint in planarization of the magnetic feature. | 02-17-2011 |
20110044147 | WRITEALE OPTICAL RECORDING OF MULTI-LEVEL ORIENTED NANO-STRUCTURE DISCS - A method of performing writable optical recording of a medium to form multilevel oriented nano-structures therein, comprises steps of providing a disc-shaped, writable recording medium having a planar surface; and encoding data/information in the medium by forming a plurality of multilevel nano-structured pits in the surface by scanning with a focused spot of optical energy to form at least one data track therein, including scanning the optical spot in a cross-track direction while rotating the disc about a central axis. | 02-24-2011 |
20110128647 | METHOD OF DISK ALIGNMENT USING PRINTED ALIGNMENT MARKS - Processes include aligning a disc with a template at a location so that the pattern from the template is transferred to the disc in a relative orientation. The relative orientation provides that when the disc with the transferred pattern is finally assembled into a hard disc drive, an inner diameter of the spindle hole of the disc may be abutted against an outer diameter of the disc drive spindle, and the data-containing patterns on the discs will be aligned concentrically with a center of the disc drive spindle. While the data-containing patterns are aligned concentrically with the disc drive spindle, the substrate itself is allowed to be non-concentric. Still other aspects include a disc having eccentric formations including PIM and one or more of bit patterns and servo information formed on a disc surface, the eccentricity of the formations is determined based on an expected difference between the radius of the spindle hole of the disc and the radius of the spindle on which the disc will be placed during assembly, with the PIM used to determine the angular alignment of the disc with the spindle. | 06-02-2011 |
20130001195 | METHOD OF STACK PATTERNING USING A ION ETCHING - The embodiments disclose a method of stack patterning, including loading a stack into a stationary stack stage, rotating one or more ion beam grid assemblies substantially concentrically aligned with the stationary stack stage to etch the stack and controlling the operation of the one or more ion beam grid assemblies to achieve substantial axial uniformity of the etched stack. | 01-03-2013 |
20130004763 | METHOD OF PATTERNING A STACK - The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers. | 01-03-2013 |
20130208378 | BIT PATTERNED MEDIA - The invention relates to bit patterned recording media having a stop layer for chemical mechanical polishing. One embodiment of the present invention is a method of manufacturing a magnetic recording medium comprising the step of planarizing by chemical mechanical polishing until the stop layer is reached. The present invention also provides a magnetic recording medium having a stop layer. | 08-15-2013 |
20140127533 | PATTERNED TEMPLATE WITH 1xN NUCLEATION SITE TO GRAIN GROWTH FOR UNIFORM GRAIN SIZE RECORDING MEDIA - A perpendicular magnetic media includes a substrate, a patterned template, a seed layer and a magnetic layer. The patterned template is formed on the substrate and includes a plurality of growth sites that are evenly spaced apart from each other. The seed layer is formed over the patterned template and the exposed areas of the substrate. Magnetic material is sputter deposited onto the seed layer with one grain of the magnetic material nucleated over each of the growth sites. The grain size distribution of the magnetic material is reduced by controlling the locations of the growth sites which optimizes the performance of the perpendicular magnetic media. | 05-08-2014 |
20140193538 | Dual-imprint pattern for apparatus - Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern. | 07-10-2014 |
20150013946 | METHOD FOR FABRICATING PATTERNED GRADIENT HEAT SINKS - The embodiments disclose at least one predetermined patterned layer configured to eliminate a physical path of lateral thermal bloom in a recording device, at least one gradient layer coupled to the patterned layer and configured to use materials with predetermined thermal conductivity for controlling a rate of dissipation and a path coupled to the gradient layer and configured to create a path of least thermal conduction resistance for directing dissipation along the path, wherein the path substantially regulates and prevents lateral thermal bloom. | 01-15-2015 |
20150016237 | METHOD FOR FABRICATING A PATTERNED COMPOSITE STRUCTURE - The embodiments disclose a patterned composite magnetic layer structure configured to use magnetic materials having differing temperature and magnetization characteristics in a recording device, wherein the patterned composite magnetic layer structure includes magnetic layers, at least one first magnetic material configured to be used in a particular order to reduce a recording temperature and configured to control and regulate coupling and decoupling of the magnetic layers and at least one second magnetic material with differing temperature characteristics is configured to control recording and erasing of data. | 01-15-2015 |
20150016774 | METHOD FOR REGULATING PATTERNED PLASMONIC UNDERLAYER - The embodiments disclose a stack feature of a stack configured to confine optical fields within and to a patterned plasmonic underlayer in the stack configured to guide light from a light source to regulate optical coupling. | 01-15-2015 |
20150017482 | METHOD FOR FABRICATING PLASMONIC CLADDING - The embodiments disclose a plasmonic cladding structure including at least one conformal plasmonic cladding structure wrapped around plural stack features of a recording device, wherein the conformal plasmonic cladding structure is configured to create a near-field transducer in close proximity to a recording head of the recording device, at least one conformal plasmonic cladding structure with substantially removed top surfaces of the stack features with exposed magnetic layer materials and a thermally insulating filler configured to be located between the stack features. | 01-15-2015 |
20150017483 | METHOD OF FABRICATION OF AN ANISOTROPY MAGNETIC LAYER OF A PATTERNED STACK - Provided herein is a method including oxidizing tops of features of a patterned magnetic layer to form oxidized tops of the features; removing an excess of an applied first protective material down to at least the oxidized tops of the features to form a planarized layer; and applying a second protective material over the planarized layer. | 01-15-2015 |