Patent application number | Description | Published |
20080196626 | SILICONE COATING COMPOSITION - The present invention relates to a composition comprising:
| 08-21-2008 |
20080199789 | Antireflective Coating Composition Based on Silicon Polymer - The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, | 08-21-2008 |
20080292987 | Antireflective Coating Composition Comprising Fused Aromatic Rings - The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition. | 11-27-2008 |
20080292995 | Antireflective Coating Composition Comprising Fused Aromatic Rings - The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition. | 11-27-2008 |
20090042133 | Antireflective Coating Composition - An antireflective coating composition which forms films with high n values is described. | 02-12-2009 |
20090061347 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS - Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described. | 03-05-2009 |
20090162800 | Process for Imaging a Photoresist Coated over an Antireflective Coating - The process of the present invention relates to imaging a photoresist film coated over an antireflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective film with an aqueous alkaline treating solution, c) rinsing the antireflective film treated with an aqueous rinsing solution, d) forming a coating of a photoresist over the film of the antireflective coating composition, e) imagewise exposing the photoresist film, and, f) developing the photoresist with an aqueous alkaline developing solution. | 06-25-2009 |
20090246691 | Antireflective Coating Composition - The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2. | 10-01-2009 |
20090253080 | Photoresist Image-Forming Process Using Double Patterning - A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with a hardening compound comprising at least 2 amino (NH | 10-08-2009 |
20090253081 | Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step - A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with a hardening compound comprising at least 2 amino (NH | 10-08-2009 |
20090274974 | SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING - Graded absorption silicon based antireflective coating compositions are described. | 11-05-2009 |
20090280435 | Antireflective coating composition - The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), | 11-12-2009 |
20100093969 | Process for making siloxane polymers - The present invention relates to process for making a siloxane polymer which comprises at least one Si—OH group and at least one Si—OR group, where R is a moiety other than hydrogen, comprising reacting one or more silane reactants together in the presence of a hydrolysis catalyst in either a water/alcohol mixture or in one or more alcohols to form the siloxane polymer; and separating the siloxane polymer from the water/alcohol mixture or the alcohol(s). | 04-15-2010 |
20100203299 | Hardmask Process for Forming a Reverse Tone Image Using Polysilazane - The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a photoresist over the underlayer; c) forming a photoresist pattern; d) forming a polysilazane coating over the photoresist pattern from a polysilazane coating composition, where the polysilazane coating is thicker than the photoresist pattern, and further where the polysilazane coating composition comprises a silicon/nitrogen polymer and an organic coating solvent; e) etching the polysilazane coating to remove the polysilazane coating at least up to a level of the top of the photoresist such that the photoresist pattern is revealed; and, f) dry etching to remove the photoresist and the underlayer which is beneath the photoresist, thereby forming an opening beneath where the photoresist pattern was present. | 08-12-2010 |
20100248137 | Antireflective Coating Compositons - The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature. | 09-30-2010 |
20110300488 | Antireflective Coating Composition and Process Thereof - The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image. | 12-08-2011 |