| Patent application number | Description | Published |
|---|
| 20100122576 | Rotation rate sensor - A rotation rate sensor includes: a mounting device; a first drive frame having a drive, which is designed to set the first drive frame into a first oscillatory motion along an axis of oscillation relative to the mounting device; a first stator electrode; a first actuator electrode coupled to the first drive frame in such a way that in a rotary motion of the rotation rate sensor due to a Coriolis force, the first actuator electrode being displaceable in a first deflection direction relative to the first stator electrode; and an evaluation device configured to determine a voltage applied between the first stator electrode and the first actuator electrode, and to specify information regarding the rotary motion of the rotation rate sensor while taking the determined voltage value into account. | 05-20-2010 |
| 20100186505 | ROTATION RATE SENSOR AND METHOD FOR OPERATING A ROTATION RATE SENSOR - A rotation rate sensor includes a substrate having a main extension plane, and a Coriolis element movable relative to the substrate, the Coriolis element being provided to be excitable, by way of excitation means, to perform an oscillation deflection substantially parallel to the main extension plane; and the Coriolis element further being provided to be deflectable, by way of a Coriolis force acting on the Coriolis element, to perform a detectable Coriolis deflection perpendicular to the main extension plane; and the rotation rate sensor further including at least one compensation electrode that is provided for at least partial compensation, as a function of the oscillation deflection, for a levitation force acting on the Coriolis element. | 07-29-2010 |
| 20100199762 | MICROMECHANICAL DEVICE HAVING A DRIVE FRAME - A micromechanical device includes at least one drive frame and at least one vibrator, the vibrator being situated in a region surrounded by the drive frame; the vibrator being mechanically coupled to the drive frame. The drive frame is able to be excited to generate a flexural vibration. | 08-12-2010 |
| 20110023600 | MICROMECHANICAL YAW-RATE SENSOR - A micromechanical yaw-rate sensor comprising a first yaw-rate sensor element, which outputs a first sensor signal, which contains information about a rotation around a first rotational axis, a second yaw-rate sensor element, which outputs a second sensor signal, which contains information about a rotation around a second rotational axis, which is perpendicular to the first rotational axis, a drive, which drives the first yaw-rate sensor element, and a coupling link, which mechanically couples the first yaw-rate sensor element and the second yaw-rate sensor element to one another, so that driving of the first yaw-rate sensor element also causes driving of the second yaw-rate sensor element. | 02-03-2011 |
| 20110079080 | Micromechanical structure and method for operating a micromechanical structure - A micromechanical yaw rate sensor includes a substrate having a main plane of extension and two Coriolis elements. The first Coriolis element may be driven to a first vibration along a second direction which is parallel to the main plane of extension. The second Coriolis element may be driven to a second vibration which is antiparallel to the first vibration. A first deflection of the first Coriolis element and a second deflection of the second Coriolis element, in each case along a first direction which is parallel to the main plane of extension and perpendicular to the second direction, may be detected. The micromechanical sensor also has a rocker element indirectly or directly coupled to the first Coriolis element and to the second Coriolis element, which rocker element has a torsional axis essentially parallel to the second direction. | 04-07-2011 |
| 20110132087 | Yaw rate sensor - A yaw rate sensor having a substrate, a first Coriolis element and a second Coriolis element is described, the first Coriolis element being excitable to a first vibration by first excitation means, and the second Coriolis element being excitable to a second vibration by second excitation means, and the first and second Coriolis elements being connected to one another by a spring structure, and the spring structure also including at least one rocker structure, the rocker structure being anchored on the substrate by at least one spring element. | 06-09-2011 |
| 20110185813 | MICROMECHANICAL YAW RATE SENSOR HAVING TWO SENSITIVE AXES AND COUPLED DETECTION MODES - In a yaw rate sensor with a substrate having a main extent plane and with a first and second partial structure disposed parallel to the main extent plane, the first partial structure includes a first driving structure and the second partial structure includes a second driving structure, the first and second partial structure being excitable by a driving device, via the first and second driving structure, into oscillation parallel to a first axis parallel to the main extent plane, the first partial structure having a first Coriolis element and the second partial structure having a second Coriolis element, the yaw rate sensor being characterized in that the first and second Coriolis elements are displaceable by a Coriolis force parallel to a second axis, which is perpendicular to the first axis, and parallel to a third axis, which is perpendicular to the first and second axis, the second axis extending parallel to the main extent plane, and the first Coriolis element being connected to the second Coriolis element via a coupling element. | 08-04-2011 |
| 20110186944 | Micromechanical Structure and Method for Setting the Working Gap Width of a Micromechanical Structure - A micromechanical structure, includes at least two structure sections configured to bound a working gap, the at least two structure sections being movable relative to one another, and a working gap width setting device configured to broaden the at least one working gap by movement of a first structure section of the at least two structure sections relative to a second structure section of the at least two structure section, the first structure section is stationary relative to a reference point during operation of the micromechanical structure and (ii) the second structure section is movable relative to the reference point during operation. | 08-04-2011 |
