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Dandu
Pradeepa Dandu, Potsdam, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100081281 | Abrasive compositions for chemical mechanical polishing and methods for using same - A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide. | 04-01-2010 |
P.r. Veera Dandu, Hillsboro, OR US
| Patent application number | Description | Published |
|---|---|---|
| 20110294404 | Tunable Polish Rates By Varying Dissolved Oxygen Content - A method and system for tunable removal rates and selectivity of materials during chemical-mechanical polishing using a chemical slurry or solution with increased dissolved oxygen content. The slurry can optionally include additives to improve removal rate and/or selectivity. Further selectivity can be obtained by varying the concentration and type of abrasives in the slurry, using lower operating pressure, using different pads, or using other additives in the dispersion at specific pH values. | 12-01-2011 |
Rahul Dandu, Woodbridge, NJ US
| Patent application number | Description | Published |
|---|---|---|
| 20090211371 | FLOW MEASURING DEVICE - A pneumotach for measuring respiratory gas flow is provided and includes a housing defining a lumen and having a longitudinal axis; and an airfoil diametrically supported within the lumen of the housing and extending at least partially thereacross, the airfoil defining a chord axis. The chord axis may be angled with respect to the longitudinal axis. | 08-27-2009 |
Ravikumar Varma Dandu, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100141470 | SYSTEMS, METHODS, AND COMPUTER PROGRAM PRODUCTS FOR REFRESHING DATA - A method performs an update for a first device that consumes information with a known expiration time. The first device operates within a network that accommodates other devices also consuming the information. The method includes setting a time for the first device to refresh the information, the time to refresh being based on a pseudorandom time offset. The method also includes sending a refresh request to a resource for the data during the set time. | 06-10-2010 |
Reddeppareddy Dandu, Downingtown, PA US
| Patent application number | Description | Published |
|---|---|---|
| 20110059959 | NOVEL MULTICYCLIC COMPOUNDS AND THE USE THEREOF - The present invention is directed to novel multicyclic molecules that mediate enzymatic activity. In particular, the compounds may be effective in the treatment of diseases or disease states related to the activity of PARP, VEGFR2, and MLK3 enzymes, including, for example, neurodegenerative diseases, inflammation, ischemia, and cancer. | 03-10-2011 |
Reddeppa Reddy Dandu, Downingtown, PA US
| Patent application number | Description | Published |
|---|---|---|
| 20100298332 | Substituted Spirocyclic Piperidine Derivatives as Histamine-3 (H3) Receptor Ligands - The present invention provides compounds of Formula (I): | 11-25-2010 |
| 20110071131 | Substituted Spirocyclic Piperidine Derivatives as Histamine-3 (H3) Receptor Ligands - The present invention provides compounds of Formula (I): | 03-24-2011 |
| 20110098269 | Substituted Pyridazinone Derivatives as Histamine-3 (H3) Receptor Ligands - The present invention provides compounds according to Formulas I, II, III, IV, V, VI, VII or VIII: | 04-28-2011 |