Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Dalakos

George Dalakos, Niskayuna, NY US

Patent application numberDescriptionPublished
20080245966LONG-WAVELENGTH INFRA-RED NIGHT VISION GOGGLES - A night vision apparatus and method comprising employing a detector operating in the 7 to 14 microns wavelength region, converting via electronics and/or photonics the received light to the region visible to the human eye, and displaying the visible light on a display, wherein a housing contains the detector, the electronics and/or photonics, and the display.10-09-2008

George Theodore Dalakos, Niskayuna, NY US

Patent application numberDescriptionPublished
20100246094METHODS FOR IMPROVING THE DIELECTRIC PROPERTIES OF A POLYMER, AND RELATED ARTICLES AND DEVICES - In one aspect of the present invention, a method for increasing the dielectric breakdown strength of a polymer is described. The method comprises providing the polymer and contacting a surface of the polymer in a reaction chamber with a gas plasma, under specified plasma conditions. The polymer is selected from the group consisting of a polymer having a glass transition temperature of at least about 150° C., and a polymer composite comprising at least one inorganic constituent. The contact with the gas plasma is carried out for a period of time sufficient to incorporate additional chemical functionality into a surface region of the polymer film, to provide a treated polymer. Also provided are an article and method of manufacture.09-30-2010
20110008525CONDENSATION AND CURING OF MATERIALS WITHIN A COATING SYSTEM - Present embodiments are directed to a system and method for condensing and curing organic materials within a deposition chamber. Present embodiments may include condensing an organic component from a gas phase into a liquid phase on a target surface within the deposition chamber, wherein the gas phase of the organic component might be mixed with an inert gas. Further, present embodiments may include solidifying the liquid phase of the organic component into a solid phase within the deposition chamber using an inert plasma formed from the inert gas.01-13-2011
20110086183BARRIER COATING WITH REDUCED PROCESS TIME - The present techniques provide systems and methods for protecting electronic devices such as organic light emitting devices (OLEDs) from adverse environmental effects using a thin film encapsulation with reduced process time. In some embodiments, the process time of forming a graded barrier over the OLED structure may take less than 5 minutes, and may result in substantially similar barrier properties as those of metal and epoxy sealants and/or typical thin film encapsulations. The process time of forming the barrier may be reduced by increasing deposition rates for organic and/or inorganic materials, reducing the thicknesses of organic and/or inorganic layers, and/or varying the number of zones in the barrier.04-14-2011
20110151200EDGE SEALING METHOD USING BARRIER COATINGS - The present techniques provide systems and methods for protecting electronic devices, such as organic light emitting devices (OLEDs) from adverse environmental effects. The edges of the devices may also be protected by a edge protection coating to reduce the adverse affects of a lateral ingress of adverse environmental conditions. In some embodiments, inorganic materials, or a combination of inorganic and organic materials, are deposited over the device to form a edge protection coating which extends approximately 3 millimeter or less beyond the edges of the device. In other embodiments, the device may be encapsulated with an organic region, and with an inorganic region, or the device may be encapsulated with inorganic materials, which may form the edge protection coating and may be combined with ultra high barrier technology. The coatings formed over the device may extend beyond the edges of the device to ensure lateral protection.06-23-2011

Patent applications by George Theodore Dalakos, Niskayuna, NY US

George Theodore Dalakos, Niskayana, NY US

Patent application numberDescriptionPublished
20100079060SYSTEM AND METHOD FOR APPLYING A CONFORMAL BARRIR COATING WITH PRETREATING - In a method for depositing a barrier coating, a device is provided comprising a first portion and a second portion where a surface of the second portion is in a shadow zone. The device is pretreated wherein the pretreating alters a deposition rate of the barrier coating on a surface exposed to the pretreating. The shadow zone is substantially unexposed to the pretreating. A barrier coating is deposited wherein the barrier coating substantially conforms to a profile of the device. The coating may be a graded-composition barrier coating wherein a composition of the coating varies substantially continuously across a thickness thereof. The first portion may include a flexible, substantially transparent substrate. The second portion may include an electronic device. The barrier coating and first portion may encapsulate the second portion. The method is a single, commercially advantageous, barrier deposition process, enabling increased product throughput and low process tact time.04-01-2010
20100080929SYSTEM AND METHOD FOR APPLYING A CONFORMAL BARRIER COATING - An improvement of a baseline method for depositing a coating on a device having a surface where the surface includes a first portion and a second portion, where the second portion is in a shadow zone, and where the coating is deposited using a first predetermined set of process parameters having a first ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion. In the improved method, the coating is deposited using a second predetermined set of process parameters such that the coating substantially conforms to a profile of the device and a second ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion is greater than the first ratio. The method is a single, commercially advantageous deposition process, enabling increased product throughput and low process tact time.04-01-2010