Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Daito, JP
Akihiro Daito, Handa-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20100027871 | Method and system for inspection of tube width of heat exchanger - An appearance inspection method and system of a core of a heat exchanger provided with fins and tubes including identifying a region in which an image of a single tube is captured, performing averaging and dynamic binarization of the image data in this region to extract only the image of the tube, dividing this region into a plurality of blocks, finding the smallest rectangle surrounding a tube at each divided block to find a width dimension of the tube, comparing the tube width dimension at each block found with a predetermined threshold value, and judging a part as good when all of the tube width dimensions at the blocks are the predetermined threshold value or less. | 02-04-2010 |
| 20100027872 | Method and system for inspection of tube width of heat exchanger - A method and system for appearance inspection of a core of a heat exchanger provided with fins and tubes, performing averaging and dynamic binarization on the imaging data to extract an image of only a tube, then calculating, with respect to the extracted tube image, a center axis across a long direction of the tube comprised of the center coordinates of the tube width direction, comparing the discovered center axis with a reference value to find the maximum displacement across the long direction of the tube, and judging the tube is a defect when the maximum displacement is greater than a predetermined threshold. | 02-04-2010 |
| 20100044004 | Fin inspection method of a heat exchanger - A fin inspection method comprising a step of having an imaging device capture an image of the core and inputting into an image processing device the image data for storage, a step of setting a first region in the image data in which an image of the entire core is captured and setting a second region in which an image of at least a portion of all of the tubes is captured so as to identify position information of the tubes, a step of setting a third region for fin detection between adjacent tubes based on the identified position information of the tubes, a step of performing binarization and noise removal in the third region to obtain an image of the fins and identifying from the image of the fins the edge position information of the fins along a long direction of the tubes, and a step of performing statistical processing of the pitch intervals based on the edge position information of the fins and judging fin defects. | 02-25-2010 |
Izuru Daito, Kizukawa-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110096385 | PLASMA SHUTTER FORMING APPARATUS AND FORMING METHOD - A plasma shutter forming apparatus for forming a plasma shutter used in a system configured to generate and accelerate radiations by irradiating a target with a laser pulse and generating a high-density plasma for blocking the laser pulse which is returned as a feedback light to upstream of the system without being absorbed by the high-density plasma, including a plasma shutter generating target, and a plasma shutter triggering laser irradiator, wherein the laser pulse from the plasma shutter triggering laser irradiator is directed to the plasma shutter generating target to generate the high-density plasma and form the plasma shutter, thereby blocking the laser pulse which is returned as the feedback light. Optics are prevented from becoming damaged by feedback light reflecting when generating the high-density plasma in a laser-driven radiation generating system and returning back to the upstream of the laser system. | 04-28-2011 |
Izuru Daito, Kyoto JP
| Patent application number | Description | Published |
|---|---|---|
| 20110095683 | High pressure discharge lamp and method of manufacturing high pressure discharge lamp - A high pressure discharge lamp has a sealing portion that is made of glass and a sealing metal piece. In a method of manufacturing the high pressure discharge lamp, the sealing metal piece is irradiated with laser beam whose pulse width is 1×10 | 04-28-2011 |
Masayuki Daito, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20080244608 | Multiprocessor system and access protection method conducted in multiprocessor system - In a conventional multiprocessor system, an access right with respect to a shared resource could not be changed in a flexible manner. The present invention provides a multiprocessor system having a first processor element (PE-A) and a second processor element (PE-B), the first processor element (PE-A) and the second processor element (PE-B) independently executing a program, in which the first processor element (PE-A) includes: a central processing unit (CPUa) for performing an operation processing based upon the program; a shared resource ( | 10-02-2008 |
| 20080250235 | Microcomputer and method of setting operation of microcomputer - Provided is a microcomputer having the improved flexibility in changing correspondences between exception causes and exception vectors. The microcomputer includes: a vector candidate output section capable of outputting a plurality of vector candidates; an address selecting section selecting, as an exception vector, one of the vector candidates according to an exception cause; an instruction execution section starting an exception processing routine by accessing a memory area specified by the exception vector; and a correspondence changing section changing the number of exception causes associated with at least one of address candidates included in the vector candidates. | 10-09-2008 |
| 20090030961 | Microprocessor performing IIR filter operation with registers - A filter operation circuit of a microprocessor executes an IIR filter operation by using data provided from registers R | 01-29-2009 |
Noboru Daito, Fukuoka JP
| Patent application number | Description | Published |
|---|---|---|
| 20090034362 | MICRODEVICE AND METHOD FOR JOINING FLUIDS - There is provided a microdevice which supplies two or more kinds of fluids flowed into itself independently toward a joining region respectively, and which discharges those fluids from the joining region. The microdevice is constituted by a supply channel which supplies each fluid flowed into the microdevice toward the joining region and a discharge channel which discharges the joined fluid from the joining region toward outside of the microdevice, in a manner that a supply channel which supplies at least one kind of the fluid has a plurality of subchannels which supply the fluid supplied into the microdevice toward the joining region, and those subchannels and supply channels are formed so that at least one central axis of the plurality of subchannels and at least one central axis of the supply channel which supplies at least one kind of fluid other than the kind that the subchannel supplies or of the subchannel intersect at one point. | 02-05-2009 |
Toru Daito, Mie JP
| Patent application number | Description | Published |
|---|---|---|
| 20090096759 | TOUCH PANEL, DISPLAY DEVICE AND TOUCH PANEL MANUFACTURING METHOD - A touch panel includes an insulating substrate, a transparent touch electrode provided on the insulating substrate, and a frame portion connected to a periphery of the touch electrode. The touch panel detects a touched position on the touch electrode based on an electric signal through the frame portion. The frame portion is provided between the insulating substrate and the touch electrode. | 04-16-2009 |
Yoshihiro Daito, Ichihara JP
| Patent application number | Description | Published |
|---|---|---|
| 20100323304 | INSPECTION METHOD FOR PATTERNING OF PHOTORESIST - A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure which is performed so as to transfer a latent image to the photoresist layer, and a development of the photoresist layer which is performed so as to leave the latent image. The latent image contains a dummy latent image which extends in an unbroken manner parallel to the longitudinal direction of the slit. The resist pattern contains a dummy resist formed correspondingly to the dummy latent image. The inspection of the resist pattern includes the detection of the presence or non-presence of a cut in the dummy resist in the longitudinal direction. | 12-23-2010 |