Patent application number | Description | Published |
20080211981 | DISPLAY DEVICE - The present invention relates to a technique for preventing the occurrence of a contact defect or exfoliation caused by a Mo oxide layer that is produced on a surface of a conductive layer when a coating type insulating film is applied onto a conductive layer made of a Mo or Mo-alloy. A display device (e.g., a liquid crystal display device) of the present invention has a first substrate, wherein the first substrate includes a first conductive layer composed of a Mo or Mo-alloy layer, a coating type insulating film formed above the first conductive layer, and a second conductive layer composed of an Al or Al-alloy layer (or Ti or Ti-alloy layer) formed on the conductive layer and wherein the coating type insulating film is formed on the second conductive layer. | 09-04-2008 |
20090073359 | Liquid Crystal Display Device - Reflective electrodes having unevenness are formed on a resin layer of a TFT substrate. A coating-type ITO film having a film thickness of 0.5 μm to 1 μm which constitute a pixel electrode is applied to the reflective electrode. A surface of the coating-type ITO film is leveled. A capacitive insulation film is formed on the pixel electrode, and a comb-teeth-shaped common electrode is formed on the capacitive insulation film. When a voltage is applied between the common electrode and the pixel electrode, liquid crystal is controlled by a leaked electric field. Since the common electrode is formed in a planar plane, a thickness of a liquid crystal layer can be made uniform. | 03-19-2009 |
20090218574 | Display device and manufacturing method therefor - A display device includes a thin film transistor above a substrate, in which the thin film transistor is configured to include a gate electrode, a gate insulating film formed to cover the gate electrode, a semiconductor layer formed to stride over the gate electrode on the gate insulating film, an inter-layer insulating film formed to cover the semiconductor layer, and a pair of electrodes formed to be connected to each of sides of the semiconductor layer interposing the gate electrode therebetween through contact holes formed through the inter-layer insulating film, high concentration impurity layers are formed at each connecting portion of the electrodes of the semiconductor layer, and an annular low-concentration impurity layer is formed to surround at least one of the high concentration impurity layers. | 09-03-2009 |
20090273751 | LIQUID CRYSTAL DISPLAY DEVICE AND DIELECTRIC FILM USABLE IN THE LIQUID CRYSTAL DISPALY DEVICE - The present invention provides a liquid crystal display device with high image visibility at low power consumption and produced at low cost by using an interlayer dielectric film, which has low dielectric constant, high heat-resistant property, high optical transmissivity, high film thickness and high flattening property produced at low cost. An organic siloxane dielectric film is used as an interlayer dielectric film of the liquid crystal display device. A ratio of nitrogen content to silicon content (Ni content/Si content) in the interlayer dielectric film is controlled to 0.04 or more in the element ratio. The limiting film thickness to suppress and limit the cracking caused by the thickening of the interlayer dielectric film is set to 1.5 μm or more. | 11-05-2009 |
20100096645 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a display device and a display device which can reduce the number of times that an insulation substrate is put into a CVD device and is taken out from the CVD device are provided. The manufacturing method of a display device includes the steps of forming a conductive layer including first electrode films and second electrode films, a first insulation layer, semiconductor films, a second insulation layer and a protective layer on an insulation substrate; forming first resist films having a predetermined thickness which are arranged in first regions above the semiconductor films, opening portions which are arranged in second regions above the second electrode films and second resist films having a large thickness which are arranged in regions other than the first regions and the second regions on the protective layer; etching portions below the second regions, removing the first resist films by ashing; forming first holes which reach the semiconductor films below the first regions and second holes which reach the second electrode films below the second regions; removing the second resist films, and forming lines which are connected to the semiconductor films and lines which are connected to the second electrode films. | 04-22-2010 |
20100201932 | LIQUID CRYSTAL DISPLAY DEVICE - An IPS liquid crystal display device having comb-teeth-shaped pixel electrodes which can prevent image retention while ensuring reliability of through hole portions and reliability of terminal area is provided. In an IPS liquid crystal display device having comb-teeth-shaped pixel electrodes, image retention occurs when rubbing is not applied to a gap defined between the comb-teeth-shaped electrodes. The pixel electrodes, through holes which supply a voltage to the pixel electrodes and a terminal area are formed of an ITO film. By setting a film thickness of only the ITO film for forming the pixel electrodes smaller than a film thickness of the ITO film formed at the through holes and a film thickness of the ITO film for forming the terminal area, it is possible to sufficiently apply rubbing to a gap between the comb-teeth-shaped electrodes which constitute the pixel electrodes. | 08-12-2010 |
20110001910 | LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal display device according to the invention includes a first substrate, on a surface of which are formed: a first color film which has a color other than black, and one portion of which configures a first pixel; a second color film, one portion of which configures a second pixel adjacent to the first pixel; a third color film, at least one portion of which configures a third pixel; and a fourth color film, a second substrate, and a liquid crystal layer sandwiched between the first substrate and second substrate, wherein the first color film and second color film have a first overlapping portion in which they overlap each other in the boundary between the first pixel and second pixel, and the fourth color film, being formed on the first overlapping portion, configures a post spacer which defines the space between the first substrate and second substrate. | 01-06-2011 |
20110024763 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A display device which has thin film transistors, wherein a semiconductor layer includes a first layer, second layers and third layers, the first layer has a channel region, the second layers are an impurity layer, the third layers are a low-concentration impurity layer, the second layers have connection portions connected with an electrodes, the third layers are formed to annularly surround the second layers, a channel-region-side edge portion out of edge portions of the third layer is in contact with the first layer, the edge portions of the third layer but the channel-region-side edge portion are in contact with an interlayer insulation film, the second layers have a first region where the second layer overlaps with a gate electrode and a second region where the second layer does not overlap with the gate electrode, and the connection portion is in the second region. | 02-03-2011 |
20110176081 | LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD FOR SAME - The present invention provides a liquid crystal display device having gate wires and source/drain wires with a multilayer structure made of the same material which can be manufactured at low cost, as well as a manufacturing method for the same. In accordance with the manufacturing method, a wet etching process is carried out on the gate wires and the source/drain wires using an etchant including hydrofluoric acid and an oxidant, and the concentration of hydrofluoric acid in the etchant is different between the etchant for the gate wires and that for the source/drain wires. | 07-21-2011 |
20120087003 | ELECTROPHORETIC DISPLAY DEVICE - A pixel is formed by sealing an insulating liquid and floating particles in an area defined by a first substrate, a second substrate and partitions. The width of the partition has to be reduced in order to improve the pixel brightness by enlarging a flat electrode. In this case, the height of the partition has to be reduced for retaining the mechanical strength. If the height of the partition is reduced, an area of the partition electrode becomes small, thus failing to retain the memory effect. The planar surface of the partition is then formed into a zigzag shape so as to increase the area of the partition electrode. | 04-12-2012 |
20120228624 | IMAGE DISPLAY DEVICE - The image display device according to the present invention is an image display device where a pixel unit and an external connection terminal unit are provided on a substrate (SUB), and the pixel unit and the external connection terminal unit are connected by an aluminum wire (LN), having; an organic protective film (OPAS) directly covering the aluminum wire, except a contact hole (CH) of the external connection terminal unit and part of the pixel unit; and an ITO film (ITO) provided on the upper side of the organic protective film so as to cover the aluminum wire, including the external connection terminal unit and reaching to the pixel unit. | 09-13-2012 |
20120287494 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE DISPLAY DEVICE - A metal layer is formed on a highly light-transmissive substrate; a resist mask having an opening pattern is formed on the metal layer; exposed portions of the metal layer is etched away in this state to form openings; then the resist mask is removed; and a surface of the metal layer and an inner side wall of each of the openings are oxidized to form a metal oxide layer. Thus, a front surface and a rear surface of the aperture plate are caused to have different reflectances. The oxide layer is formed at the same time as when the resist mask is ashed to remove resist. | 11-15-2012 |
20120306830 | DISPLAY DEVICE - A display device includes: a plurality of pixels each having a shutter plate formed and an actuator portion, wherein the actuator portion has a beam portion connected to the shutter plate, a drive electrode causing the beam portion to bend to drive the shutter plate, a first supporting portion supporting the drive electrode and fixed on a substrate, and a second supporting portion supporting the beam portion and fixed on the substrate, at least one of the first supporting portion and the second supporting portion has a planar portion, and a recessed portion formed to be concaved from the planar portion and connected to the substrate, and the recessed portion has a vertically formed portion formed to be inclined substantially vertically from the planar portion, and a portion starting from the vertically formed portion and formed such that the inclination of the portion becomes gentle toward the substrate. | 12-06-2012 |
20130021781 | DISPLAY DEVICE WITH TAPERED LIGHT REFLECTING LAYER AND MANUFACTURING METHOD FOR SAME - A display device includes a substrate having an upper surface. The display device also includes a light reflecting layer to reflect light, formed over the upper surface of the substrate. The display device also includes a light absorbing layer to absorb light, formed over the upper surface of the light reflecting layer. A plurality of apertures are defined through the light reflecting layer and the light absorbing layer such that, at an edge of each of the plurality of apertures, the light absorbing layer partially overhangs the light reflecting layer. | 01-24-2013 |
20130323997 | METHOD OF MANUFACTURING A DISPLAY DEVICE - Provided is a method of manufacturing a display device that includes a structure formed so as to protrude at least in a normal direction of a first substrate, and an electrode formed in a side wall surface of the structure, the method including: forming a transparent conductive film for the electrode; forming a low-affinity material having a low affinity for a resist film on an upper surface of the transparent conductive film formed in a head surface of the structure; forming a resist film by applying a liquid resist material to an upper layer of the transparent conductive film and then fixing the resist material; forming an opening that exposes the transparent conductive film in the resist film by removing the low-affinity material; etching the transparent conductive film which is a lower layer using the resist film as a protective film; and removing the resist film. | 12-05-2013 |
20140036209 | LIQUID CRYSTAL DISPLAY DEVICE - In a liquid crystal display device having wall structures, the generation of low-temperature shock bubbles is suppressed. Also, electrodes and the like within substrates are prevented from being damaged during manufacturing. The liquid crystal display device includes a first substrate, a second substrate that is disposed to face the first substrate, a liquid crystal layer that is disposed between the first substrate and the second substrate, wall structures that are formed on the first substrate, pixel electrodes that are disposed on at least side wall of the wall structures, a common electrode that is formed on the first substrate, and a plurality of pixels including the pixel electrodes and the common electrode, in which higher portions are partially disposed on a surface of the second substrate, and the higher portions come into contact with the wall structures to bring the first substrate into contact with the second substrate. | 02-06-2014 |
20140184990 | LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD FOR SAME - The present invention provides a liquid crystal display device having gate wires and source/drain wires with a multilayer structure made of the same material which can be manufactured at low cost, as well as a manufacturing method for the same. In accordance with the manufacturing method, a wet etching process is carried out on the gate wires and the source/drain wires using an etchant including hydrofluoric acid and an oxidant, and the concentration of hydrofluoric acid in the etchant is different between the etchant for the gate wires and that for the source/drain wires. | 07-03-2014 |