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Daisuke Shimizu

Daisuke Shimizu, Tokyo JP

Patent application numberDescriptionPublished
20090274977COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.11-05-2009
20090280433RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN - A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.11-12-2009
20090311622METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM - A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated.12-17-2009
20100087559Hydrogenated Block Copolymers and Crosslinking Compositions Containing the Same - A hydrogenated block copolymer obtained by selective hydrogenation of a block copolymer comprising at least two polymer blocks (A) which each comprise vinyl aromatic monomer units as the main component and may be the same or different from each other, at least two polymer blocks (B) which each comprise monomer units derived from a conjugated diene of 5 or more carbon atoms as the main component and may be the same or different from each other, and one or more polymer blocks (C) which each comprise monomer units derived from a conjugated diene of 4 or more carbon atoms as the main component and may be the same or different from each other and/or one or more random copolymer blocks (D) which each comprise monomer units (d-1) derived from a conjugated diene of 4 or more carbon atoms and vinyl aromatic monomer units (d-2) as the main components, wherein the degree of hydrogenation of olefinically unsaturated double bonds of the blocks (B) is 50% or below; the degrees of hydrogenation of olefinically unsaturated double bonds of the blocks (C) and (D) are 80% or above; the content of vinyl aromatic monomer units in the block copolymer is 10 to 85% by weight; the contents of A, B, C and D in the block copolymer are 10 to 70% by weight, 1 to 15% by weight, 0 to 85% by weight and 0 to 85% by weight respectively with the proviso that the sum of C and D is 25 to 85% by weight and the sum total of A, B, C and D is 100% by weight; and the weight-average molecular weight (M) of A satisfies the relationship: M≧20000/[l+{content (%) of (d-2)}/20].04-08-2010
20100233635METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN - A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.09-16-2010
20100331440RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER - A polymer includes a repeating unit shown by a general formula (1) in which R12-30-2010
20110003928THERMOPLASTIC ELASTOMER COMPOSITION AND METHOD FOR PRODUCING THE SAME - The present invention provides a thermoplastic elastomer composition obtained by dynamically crosslinking, under a melting condition, 100 parts by mass of a block copolymer (I), 1 to 1,000 parts by mass of a polar resin (II), 1 to 500 parts by mass of a modified polymer (III), and 0.01 to 50 parts by mass of a crosslinking agent (IV), wherein the block copolymer (I) comprises at least one polymer block (A) comprising as a main component an alkylene unit, and/or at least one copolymer block (B) comprising as main components an alkylene unit (b-01-06-2011
20110117489COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1).05-19-2011

Patent applications by Daisuke Shimizu, Tokyo JP

Daisuke Shimizu, Daito-Shi JP

Patent application numberDescriptionPublished
20080272534Image Generating Apparatus - In this image generating apparatus, a paper cassette mounted on an apparatus body includes a pressing portion employed for pressing a first side surface of a paper rearward with respect to a first direction for feeding the paper and so arranged that the distance from a second roller is smaller than the length of the paper in the first direction when the paper cassette is mounted on the apparatus body.11-06-2008
20090266946Display Screen Turning Apparatus and Television Set - This display screen turning apparatus includes a first support member of metal supporting a display screen portion and a second support member of metal supporting the first support member to be anteroposteriorly rotatable by a prescribed angle with respect to a vertical plane, and either the first support member or the second support member has a receiving hole, while either the second support member or the first support member integrally has a platelike support shaft of metal inserted into the receiving hole.10-29-2009
20090268106Display Screen Support Mechanism and Television Set - In a display screen support mechanism, a first hole portion receiving a platelike support shaft is provided in the form of a symmetrical sector formed by connecting two sectoral forward ends which are symmetric with respect to a hole center, and a display screen support member is rotatable about the platelike support shaft serving as a rotating shaft within an angular range of the symmetrical sectoral hole portion in a state where an end of the platelike support shaft in a longitudinal direction comes into contact with an arcuate inner peripheral surface of the symmetrical sectoral hole portion.10-29-2009
20090268107Torque Limiter, Display Screen Turning Apparatus Comprising Torque Limiter and Television Set Including Torque Limiter - This torque limiter includes a first rotating member integrally provided with a plurality of fragment portions in a concentric manner and having a spring storage portion enclosed with the plurality of fragment portions, a second rotating member having a lid portion arranged to cover the spring storage portion of the first rotating member and a fit portion fitted with the outer peripheral surfaces of the plurality of fragment portions of the first rotating member and a spring member press-fitted into the spring storage portion enclosed with the inner peripheral surfaces of the plurality of fragment portions of the first rotating member thereby bringing the plurality of fragment portions into pressure contact with the fit portion of the second rotating member, for transmitting driving torque in response to pressure contact force applied by the spring member.10-29-2009
20090284668Display Screen Turning Apparatus and Television Set - A display screen turning apparatus includes a display screen support member provided with a first gear and supporting a display screen portion rotatably in a horizontal plane and rotatably with respect to a vertical plane and a rack plate provided with a second gear meshing with the first gear, wherein the first gear meshed with the second gear moves by movement of the second gear following linear movement of the rack plate in the horizontal plane, thereby rotating the display screen support member in an anteroposterior direction by a prescribed angle with respect to the vertical plane.11-19-2009
20090290077Display and Television Set - A display includes a display screen portion, a display screen support member supporting the display screen portion to be rotatable in an anteroposterior direction with respect to a vertical plane and a driving source rotating the display screen support member in the anteroposterior direction by a prescribed angle with respect to the vertical plane, wherein a center of gravity of the display screen portion is located on either a frontward side or a rearward side with respect to the vertical plane in both of a state where the driving source rotates the display screen support member on the frontward side with respect to the vertical plane and a state where the driving source rotates the display screen support member on the rearward side with respect to the vertical plane.11-26-2009

Patent applications by Daisuke Shimizu, Daito-Shi JP