Patent application number | Description | Published |
20090274977 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner. | 11-05-2009 |
20090280433 | RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN - A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent. | 11-12-2009 |
20090311622 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM - A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated. | 12-17-2009 |
20100087559 | Hydrogenated Block Copolymers and Crosslinking Compositions Containing the Same - A hydrogenated block copolymer obtained by selective hydrogenation of a block copolymer comprising at least two polymer blocks (A) which each comprise vinyl aromatic monomer units as the main component and may be the same or different from each other, at least two polymer blocks (B) which each comprise monomer units derived from a conjugated diene of 5 or more carbon atoms as the main component and may be the same or different from each other, and one or more polymer blocks (C) which each comprise monomer units derived from a conjugated diene of 4 or more carbon atoms as the main component and may be the same or different from each other and/or one or more random copolymer blocks (D) which each comprise monomer units (d-1) derived from a conjugated diene of 4 or more carbon atoms and vinyl aromatic monomer units (d-2) as the main components, wherein the degree of hydrogenation of olefinically unsaturated double bonds of the blocks (B) is 50% or below; the degrees of hydrogenation of olefinically unsaturated double bonds of the blocks (C) and (D) are 80% or above; the content of vinyl aromatic monomer units in the block copolymer is 10 to 85% by weight; the contents of A, B, C and D in the block copolymer are 10 to 70% by weight, 1 to 15% by weight, 0 to 85% by weight and 0 to 85% by weight respectively with the proviso that the sum of C and D is 25 to 85% by weight and the sum total of A, B, C and D is 100% by weight; and the weight-average molecular weight (M) of A satisfies the relationship: M≧20000/[l+{content (%) of (d-2)}/20]. | 04-08-2010 |
20100233635 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN - A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion. | 09-16-2010 |
20100331440 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER - A polymer includes a repeating unit shown by a general formula (1) in which R | 12-30-2010 |
20110003928 | THERMOPLASTIC ELASTOMER COMPOSITION AND METHOD FOR PRODUCING THE SAME - The present invention provides a thermoplastic elastomer composition obtained by dynamically crosslinking, under a melting condition, 100 parts by mass of a block copolymer (I), 1 to 1,000 parts by mass of a polar resin (II), 1 to 500 parts by mass of a modified polymer (III), and 0.01 to 50 parts by mass of a crosslinking agent (IV), wherein the block copolymer (I) comprises at least one polymer block (A) comprising as a main component an alkylene unit, and/or at least one copolymer block (B) comprising as main components an alkylene unit (b- | 01-06-2011 |
20110117489 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1). | 05-19-2011 |
20110275731 | CROSSLINKABLE AND FOAMABLE COMPOSITION, CROSSLINKED FOAM, AND SHOE MIDSOLE COMPRISING THE SAME - The present invention provides a crosslinked foam having an excellent balance of various physical properties in terms of lightness, flexibility, permanent compression set, tear strength, impact resilience, and molding stability; a shoe midsole; and a crosslinkable and foamable composition that provides the crosslinked foam and shoe midsole. A crosslinkable and foamable composition comprising (A) an ethylene-based copolymer; (B) a copolymer comprising a vinyl aromatic monomer unit and an unsaturated bond-containing a conjugated diene monomer unit; (C) an organic peroxide; and (D) a foaming agent; a mass ratio of the component (A) to the component (B), (NB), being from 97/3 to 50/50; and the component (B) comprising 5 mass % or more and 80 mass % or less of the vinyl aromatic monomer unit, and 5 mass % or more and 55 mass % or less of the conjugated diene monomer unit. | 11-10-2011 |
20120058429 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). | 03-08-2012 |
20120122036 | PATTERN FORMING METHOD - A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed. | 05-17-2012 |
20130108962 | RADIATION-SENSITIVE COMPOSITION | 05-02-2013 |
20150112027 | Method for Producing Polymer - The present invention is related to a method for producing a polymer to efficiently remove metal residues of at least lithium and/or titanium from a polymer solution comprising the at least lithium and/or titanium to thereby obtain a refined polymer solution having little metal residue. | 04-23-2015 |
20150299370 | METHOD FOR PRODUCING A POLYMER, POLYMER SOLUTION AND POLYMER - The present invention provides a method for producing a polymer by efficiently removing residue of metals such as titanium, aluminum and lithium from a polymer solution containing the residue of these metals to successfully obtain a purified polymer solution containing a smaller amount of the metal residue and having satisfactory color tone and transparency, a polymer solution and a polymer obtained by the production method. | 10-22-2015 |
Patent application number | Description | Published |
20080272534 | Image Generating Apparatus - In this image generating apparatus, a paper cassette mounted on an apparatus body includes a pressing portion employed for pressing a first side surface of a paper rearward with respect to a first direction for feeding the paper and so arranged that the distance from a second roller is smaller than the length of the paper in the first direction when the paper cassette is mounted on the apparatus body. | 11-06-2008 |
20090266946 | Display Screen Turning Apparatus and Television Set - This display screen turning apparatus includes a first support member of metal supporting a display screen portion and a second support member of metal supporting the first support member to be anteroposteriorly rotatable by a prescribed angle with respect to a vertical plane, and either the first support member or the second support member has a receiving hole, while either the second support member or the first support member integrally has a platelike support shaft of metal inserted into the receiving hole. | 10-29-2009 |
20090268106 | Display Screen Support Mechanism and Television Set - In a display screen support mechanism, a first hole portion receiving a platelike support shaft is provided in the form of a symmetrical sector formed by connecting two sectoral forward ends which are symmetric with respect to a hole center, and a display screen support member is rotatable about the platelike support shaft serving as a rotating shaft within an angular range of the symmetrical sectoral hole portion in a state where an end of the platelike support shaft in a longitudinal direction comes into contact with an arcuate inner peripheral surface of the symmetrical sectoral hole portion. | 10-29-2009 |
20090268107 | Torque Limiter, Display Screen Turning Apparatus Comprising Torque Limiter and Television Set Including Torque Limiter - This torque limiter includes a first rotating member integrally provided with a plurality of fragment portions in a concentric manner and having a spring storage portion enclosed with the plurality of fragment portions, a second rotating member having a lid portion arranged to cover the spring storage portion of the first rotating member and a fit portion fitted with the outer peripheral surfaces of the plurality of fragment portions of the first rotating member and a spring member press-fitted into the spring storage portion enclosed with the inner peripheral surfaces of the plurality of fragment portions of the first rotating member thereby bringing the plurality of fragment portions into pressure contact with the fit portion of the second rotating member, for transmitting driving torque in response to pressure contact force applied by the spring member. | 10-29-2009 |
20090284668 | Display Screen Turning Apparatus and Television Set - A display screen turning apparatus includes a display screen support member provided with a first gear and supporting a display screen portion rotatably in a horizontal plane and rotatably with respect to a vertical plane and a rack plate provided with a second gear meshing with the first gear, wherein the first gear meshed with the second gear moves by movement of the second gear following linear movement of the rack plate in the horizontal plane, thereby rotating the display screen support member in an anteroposterior direction by a prescribed angle with respect to the vertical plane. | 11-19-2009 |
20090290077 | Display and Television Set - A display includes a display screen portion, a display screen support member supporting the display screen portion to be rotatable in an anteroposterior direction with respect to a vertical plane and a driving source rotating the display screen support member in the anteroposterior direction by a prescribed angle with respect to the vertical plane, wherein a center of gravity of the display screen portion is located on either a frontward side or a rearward side with respect to the vertical plane in both of a state where the driving source rotates the display screen support member on the frontward side with respect to the vertical plane and a state where the driving source rotates the display screen support member on the rearward side with respect to the vertical plane. | 11-26-2009 |
Patent application number | Description | Published |
20140213059 | BORON-DOPED CARBON-BASED HARDMASK ETCH PROCESSING - Boron-doped carbon-based hardmask etch processing is described. In an example, a method of patterning a film includes etching a boron-doped amorphous carbon layer with a plasma based on a combination of CH | 07-31-2014 |
20140213062 | SILICON DIOXIDE-POLYSILICON MULTI-LAYERED STACK ETCHING WITH PLASMA ETCH CHAMBER EMPLOYING NON-CORROSIVE ETCHANTS - Multilayered stacks having layers of silicon interleaved with layers of a dielectric, such as silicon dioxide, are plasma etched with non-corrosive process gas chemistries. Etching plasmas of fluorine source gases, such as SF | 07-31-2014 |
20140342570 | ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AND POWER - The disclosure concerns a plasma-enhanced etch process in which chamber pressure and/or RF power level is ramped throughout the etch process. | 11-20-2014 |
20150072530 | METHODS FOR ETCHING MATERIALS USING SYNCHRONIZED RF PULSES - Embodiments of the present invention provide methods for etching a material layer using synchronized RF pulses. In one embodiment, a method includes providing a gas mixture into a processing chamber, applying a first RF source power at a first time point to the processing chamber to form a plasma in the gas mixture, applying a first RF bias power at a second time point to the processing chamber to perform an etching process on the substrate, turning off the first RF bias power at a third time point while continuously maintaining the first RF source power on from the first time point through the second and the third time points, and turning off the first RF source power at a fourth time point while continuously providing the gas mixture to the processing chamber from the first time point through the second, third and fourth time points. | 03-12-2015 |
Patent application number | Description | Published |
20140160447 | IMAGE DISPLAY DEVICE - An image display device includes a holder and an optical component. The holder has an optical path. The optical component is mounted to the holder such that the optical component is disposed in the optical path of the holder. The holder has a first portion with a first edge part and a second portion with a second edge part. The holder is integrally formed as a one-piece, unitary member. The first and second portions are axially and adjacently arranged relative to each other along an optical axis of the optical path of the holder. The first and second edge parts at least partially define a circumferential edge of an aperture that is arranged with respect to the optical component in the optical path of the holder. | 06-12-2014 |
20140293239 | PROJECTOR AND HEAD-UP DISPLAY DEVICE - A projector includes a cooling unit that is disposed so as to face an inner side of a housing and that includes a cooling plane that cools to a temperature lower than the housing, a light emitting element that is disposed in the housing, that emits a light beam, that enables an adjustment of a position and a tilt of an optical axis, and that comprises an outer plane where an angle relative to the cooling plane of the cooling unit is fixed even when displaced by the adjustment, and a heat transfer member that is in surface contact with and thermally connected to the cooling plane of the cooling unit and the outer plane of the light emitting element. | 10-02-2014 |
20150234263 | Projector and Headup Display - This headup display (projector) includes a plurality of light source portions, an optical scanning portion, a base portion and a heat transfer portion that contacts with the light source portions, and the thermal resistance of a first heat transfer path from the light source portions to the base portion is larger than the thermal resistance of a second heat transfer path from the light source portions to the heat transfer portion. | 08-20-2015 |