| Patent application number | Description | Published |
|---|
| 20090176095 | Novel triphenylmethane derivative, organic gellant containing the same, organic gel, and organic fiber - In accordance with the present invention, there are provided a triphenylmethane derivative represented by the following general formula (1), an organic gelling agent containing the triphenylmethane derivative, an organic gel and an organic fiber. The triphenylmethane derivatives of the present invention can exhibit a capability of gelling various organic solvents even when used in a small amount notwithstanding these derivatives are low-molecular compounds. The resultant organic gel is useful as materials usable under a high-temperature condition such as chemomechanical system materials, impact and vibration absorbing materials, drug base materials, controlled drug-release materials, and silicone oil gels for solidification of electrolytic solutions and for cosmetics. In addition, an organic nanofiber can be produced from the triphenylmethane derivative by a simple process. The organic nanofiber can be applied to wiring materials for electronic devices, separation membranes for nano-scale substances, high-efficiency photocatalysts, and culture media for regenerative medical treatments or filters for preventing biochemical hazards utilizing a nonwoven fabric (nano-fabric) made of nanofiber. | 07-09-2009 |
| 20100047709 | RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition. | 02-25-2010 |
| 20100316950 | COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN - A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent. | 12-16-2010 |
| 20110009574 | MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CONTAINING NAPHTHOL COMPOUND AND ESTER COMPOUND - A modified dimethylnaphthalene formaldehyde resin is disclosed, which is excellent in heat resistance and useful for thermosetting resins which are used for an electrical insulating material, a resin for resist, a semiconductor sealing resin, an adhesive for printed wiring board, a matrix resin for electrical laminate or prepreg to be mounted in electrical instruments, electronic instruments, industrial instruments, etc., a buildup laminate material, a resin for fiber-reinforced plastic, a sealing resin for liquid crystal display panel, a paint, a variety of coating agents, an adhesive, a laminate for electrical or electronic parts, a molded article, a coating material, a sealing material and the like, the modified dimethylnaphthalene formaldehyde resin being obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] (provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included). | 01-13-2011 |
| 20110165516 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance. | 07-07-2011 |
| 20110269976 | GLYCOL COMPOUND HAVING DIOXANE STRUCTURE AND METHOD FOR PRODUCING THE SAME - Disclosed is a glycol compound which is useful as a raw material and an intermediate for synthetic resins, additives for synthetic resins, medicines, cosmetics, food additives, surfactants and the like, further disclosed is a method for producing the compound. | 11-03-2011 |
| 20110275840 | GLYCOL COMPOUND HAVING DIOXANE STRUCTURE AND METHOD FOR PRODUCING THE SAME - Disclosed is a glycol compound which is useful as a raw material and an intermediate for synthetic resins, additives for synthetic resins, medicines, cosmetics, food additives, surfactants and the like, further disclosed is a method for producing the compound. | 11-10-2011 |
| 20110282076 | ALCOHOL COMPOUND HAVING DIOXANE STRUCTURE AND PROCESS FOR PRODUCING SAME - Disclosed is an alcohol compound which is useful as a raw material and an intermediate for paints, adhesives, medicines, cosmetics, food additives, surfactants and the like, further disclosed is a method for producing the above compound. | 11-17-2011 |
