| Patent application number | Description | Published |
|---|
| 20090109419 | Supporting plate, stage device, exposure apparatus, and exposure method - An exposure apparatus and method exposes, using an optical member, a pattern of a mask onto a substrate that is located on a substrate stage which is movable over a supporting plate. A liquid is provided between the optical member and the substrate, Fluid is sprayed toward the supporting plate to remove liquid from the supporting plate. | 04-30-2009 |
| 20090123853 | ALIGNING APPARATUS, ALIGNING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An aligning apparatus and the like are provided which can improve stage alignment accuracy during stage acceleration and suppress the generation of internal vibration of the stage to improve throughput. An aligning apparatus including a table part ( | 05-14-2009 |
| 20090128793 | Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method - A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking. | 05-21-2009 |
| 20090201484 | Utilities supply member connection apparatus, stage apparatus, projection optical system support apparatus and exposure apparatus - A connection apparatus for a utilities supply member, comprises: a holding part ( | 08-13-2009 |
| 20090213357 | Exposure apparatus and device manufacturing method - An exposure apparatus equipped with a measurement stage that is provided with various measuring instruments disposed in a relationship wherein measurement accuracy is not lowered, and a device manufacturing method using the exposure apparatus are provided. An exposure apparatus according to the present invention is equipped with a measurement stage provided independent of a wafer stage that holds a wafer, On a measurement table (MTB) held on the upper face of this measurement stage, a reference plate ( | 08-27-2009 |
| 20090231561 | Measuring method, stage apparatus, and exposure apparatus - An exposure apparatus can mitigate the impact of fluctuations in the refractive index of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer on a wafer stage through a projection optical system, and forms a prescribed pattern on the wafer, and comprises: a scale, which is provided to the wafer stage; a plurality of X heads, which detect information related to the position of the scale; a measurement frame that integrally supports the plurality of X heads and has a coefficient of linear thermal expansion that is smaller than that of the main body of the wafer stage (portions excepting a plate wherein the scale is formed); and a control apparatus that derives information related to the displacement of the wafer stage based on the detection results of the plurality of X heads. | 09-17-2009 |
| 20090297990 | Liquid holding apparatus, liquid holding method, exposure apparatus, exposing method, and device fabricating method - Liquid is held in a prescribed region between a first object and a second object. An electrostatic holder holds the liquid by electrostatic force. | 12-03-2009 |
| 20100271613 | BEARING DEVICE, STAGE DEVICE, AND EXPOSURE APPARATUS - A sufficient moving stroke can be secured without connecting a tube, etc. for supply of air. A movable body ( | 10-28-2010 |
| 20110013161 | Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method - An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally. | 01-20-2011 |
| 20110019170 | PROJECTION EXPOSURE APPARATUS AND STAGE UNIT, AND EXPOSURE METHOD - A projection exposure apparatus has a substrate table on which a substrate is mounted that can be moved holding the substrate, a position measuring system that measures positional information of the substrate table, and a correction unit that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate. | 01-27-2011 |
