Dae Youn
Dae Youn Cho, Daejeon KR
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20130113390 | DC-DC CONVERTER AND LIGHT EMITTING DIODE DRIVING DEVICE INCLUDING THE SAME - A direct current to direct current converter includes: an input terminal; an output terminal having voltage higher than the input terminal; a coupled inductor boost cell including a coupled inductor connected to the input terminal, a switch connected to the coupled inductor, and an output diode connected to the output terminal; and a clamp and energy transfer cell including a clamp diode connected to the coupled inductor, a clamp capacitor connected to the clamp diode, and an energy transfer diode connected to the output diode. | 05-09-2013 |
Dae Youn Kang, Pusan KR
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20080277403 | Beverage can with an external reservoir for additional sweet - A beverage can with a small external sweet reservoir is provided. The reservoir is rotate-ably attached to the bottom of the beverage can. A hole for introducing the sweets is developed a he bottom of the beverage can. The reservoir is a shallow cylindrical can, which is divided into pluralities of sections of same internal volume by pluralities of dividers that are installed inside of the reservoir and are extending radially from the center thereof. Each section is filled with sugar solution, except first section. Face of the reservoir toward the main can body is open. Rubber gaskets are attached at each end of the dividers and the open end of the reservoir, which contacts with the beverage can, to prevent leak of the sugar solution. As a customer turns the reservoir, additional sugar solution is introduced to the beverage can through the hole and the user can adjust sweetness or the beverage. | 11-13-2008 |
Dae Youn Kim, Seoul KR
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20100251469 | UPPER BODY SUPPORT APPARATUS FOR TOILETS - An upper body support apparatus for toilets is disclosed. The upper body support apparatus includes a support board ( | 10-07-2010 |
20100293705 | UPPER BODY SUPPORT APPARATUS FOR TOILETS - The preset invention provides an upper body support apparatus for toilets which enables a user to place his/her arms thereon when having a bowel movement. The upper body support apparatus ( | 11-25-2010 |
20150032595 | METHOD AND APPARATUS FOR TRADING SECURITIES - The present invention relates to a method and apparatus for transaction securities. According to the present invention, a disposal restriction on securities can be set or canceled by setting up a security right or creating other contracts according to an enterprise declaration of will. Also, according to the present invention, securities liquidity and stability can be increased by enabling an owner of securities to dispose of the securities having a disposal restriction set through a sell restriction management agreement, as well as by imposing certain restrictions on disposal. | 01-29-2015 |
Dae Youn Kim, Daejeon-Si KR
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20080241384 | LATERAL FLOW DEPOSITION APPARATUS AND METHOD OF DEPOSITING FILM BY USING THE APPARATUS - A deposition apparatus and deposition method for forming a film on a substrate are disclosed. A film is deposited on a substrate by exposing the substrate to different flow directions of reactant gases. In one embodiment, the substrate is rotated in the reaction chamber after a film having an intermediate thickness is formed on the substrate. In other embodiments, the substrate is transferred from one reaction chamber to another after a film having an intermediate thickness is formed on the substrate. Accordingly, a film having a uniform thickness is deposited, averaging out depletion effect. | 10-02-2008 |
20090155452 | THIN FILM DEPOSITION APPARATUS AND METHOD THEREOF - A thin film deposition apparatus including a substrate mounting error detector, a chamber and a substrate support positioned in the chamber. The substrate support is configured to support a substrate. The substrate mounting error detector includes: a light source configured to provide a light beam to the substrate, such that the substrate reflects the light beam; a collimator configured to selectively pass at least a portion of the light beam reflected by the substrate; and an optical sensor configured to detect the at least a portion of the reflected light beam passed by the collimator. The detector is positioned and oriented to detect substrate position on a lowered support prior to raising the support into contact with an upper cover of a clamshell reactor arrangement. This configuration allows a thin film deposition process only if the substrate is correctly mounted on the substrate support. Thus, abnormal deposition due to a substrate mounting error is prevented in advance. | 06-18-2009 |
Dae Youn Kim, Daedog-Gu KR
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20110308460 | ATOMIC LAYER DEPOSITION APPARATUS - The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate. | 12-22-2011 |
Dae Youn Lee, Seoul KR
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20110091118 | APPARATUS AND METHOD FOR CODING A THREE DIMENSIONAL MESH - Disclosed is a three-dimensional (3D) mesh compression apparatus and method. The 3D mesh compression apparatus may generate a base mesh through a mesh simplification, may separately compress the base mesh and peaks eliminated by the simplification, may construct a covariance matrix based on a topological distance between the eliminated peaks, and may compress 3D mesh data based on the covariance matrix. | 04-21-2011 |
20120013608 | APPARATUS AND METHOD OF SCALABLE ENCODING OF 3D MESH, AND APPARATUS AND METHOD OF SCALABLE DECODING OF 3D MESH - A scalable three-dimensional (3D) mesh encoding method includes dividing the 3D mesh into layers of complexity into a plurality of graduated levels and generating vertex position information and connectivity information of each of the plurality of levels. The vertex position information about the 3D mesh is encoded based on a weighting in each bit plane and vertex position information having a higher weighting in each bit plane is first encoded. | 01-19-2012 |
20120189220 | APPARATUS AND METHOD FOR DATA PROCESSING - A data processing apparatus and method. A vertex grouping unit of the data processing apparatus may group, into at least one group, a plurality of vertices included in a three-dimensional (3D) object desired to be compressed. A prediction mode determination unit may determine a prediction mode for compressing a vertex position with respect to each of the at least one group. A coder may code a prediction error vector and an identification (ID) index of the prediction mode determined with respect to each of the at least one group. | 07-26-2012 |
20140168360 | METHOD AND APPARATUS FOR ENCODING A 3D MESH - Disclosed is a method and apparatus for encoding a three-dimensional (3D) mesh. The method for encoding the 3D mesh includes determining a priority of a gate configuring a 3D mesh corresponding to a 3D object, removing vertices configuring the 3D mesh using the determined priority of the gate, and simplifying the 3D mesh. | 06-19-2014 |
20140300598 | APPARATUS AND METHOD FOR CODING A THREE DIMENSIONAL MESH - Disclosed is a three-dimensional (3D) mesh compression apparatus and method. The 3D mesh compression apparatus may generate a base mesh through a mesh simplification, may separately compress the base mesh and vertices eliminated by the simplification, and may compress 3D mesh data based on the covariance matrix. | 10-09-2014 |
Dae Youn Park, Yongin-City KR
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20160124263 | LIQUID CRYSTAL DISPLAY - Provided is a liquid crystal display, including a first substrate including a plurality of pixel regions including a transmissive light area and a non-transmissive light area, a second substrate facing the first substrate and a liquid crystal layer disposed between the first substrate and the second substrate, wherein the pixel regions includes color filters disposed on a base substrate, a pixel electrode disposed on each of the color filters at the transmissive light area and a black column spacer at a region except a region corresponding to the transsmissive light area, wherein the each of the color filters has substantially rectangular shape with a long side and a short side, and wherein the long side has a recess portion in which a part of a long side corresponding to the non-transmissive light area is removed. | 05-05-2016 |
Dae-Youn Cho, Yuseong-Gu KR
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20090058792 | BACKLIGHT UNIT, LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME, AND LOCALIZED DIMMING METHOD THEREOF - A backlight unit of a liquid crystal display device supplies light to one or more corresponding pixels of a liquid crystal display panel. The backlight unit includes a plurality of blocks formed into a matrix shape. Each block includes a light emitting diode module. The blocks in a row of the matrix are driven by a same row driving signal and the blocks in a column of the matrix are driven by a same column driving signal, to adjust luminance of the light supplied to the corresponding pixels. | 03-05-2009 |
Dae-Youn Kim, Gyeonggi-Do KR
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20080211199 | Snow Vehicle - A snow vehicle according to the present invention takes a shape streamlined from a front part | 09-04-2008 |
Dae-Youn Kim, Daedeok-Gu KR
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20100170441 | Method of Forming Metal Oxide and Apparatus for Performing the Same - In a method and an apparatus for forming metal oxide on a substrate, a source gas including metal precursor flows along a surface of the substrate to form a metal precursor layer on the substrate. An oxidizing gas including ozone flows along a surface of the metal precursor layer to oxidize the metal precursor layer so that the metal oxide is formed on the substrate. A radio frequency power is applied to the oxidizing gas flowing along the surface of the metal precursor layer to accelerate a reaction between the metal precursor layer and the oxidizing gas. Acceleration of the oxidation reaction may improve electrical characteristics and uniformity of the metal oxide. | 07-08-2010 |
Dae-Youn Kim, Daejeon KR
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20100275844 | DEPOSITION APPARATUS - In a deposition apparatus according to an embodiment of the present invention, a buffer unit is provided between a vaporizer and a reactor of a vaporization supply system to temporarily store source gas, thus, before and when the source gas is supplied to the reactor, the variations of the internal pressure of the vaporizer can be reduced to supply the constant amount of source gas of to reaction spaces, thereby depositing a thin film having a uniform thin-film thickness. | 11-04-2010 |
20120272900 | LATERAL FLOW ATOMIC LAYER DEPOSITION DEVICE - A lateral flow atomic layer deposition device according to an exemplary embodiment of the present invention eliminates a gas flow control plate in a conventional lateral flow atomic layer deposition device and controls shapes of a gas input part and a gas output part in a reactor cover to make a gas flow path to a center of a substrate shorter than a gas flow path to an edge of the substrate and thereby increase the amount of gas per unit area flowing to the center of the substrate. Therefore, film thickness in the center of the substrate in the lateral flow reactor increases. | 11-01-2012 |
20130247822 | DEPOSITION APPARATUS - In a deposition apparatus, a protecting member made of an elastic body is inserted into a pin hole where a fixed substrate supporting pin is inserted and the substrate supporting pin is fixed through the protecting member to prevent damages to the substrate and a decrease in yield due to damages to the substrate supporting pin by preventing the substrate supporting pin from being damaged by loading or unloading of the substrate or static electricity. Further, the deposition apparatus includes a substrate supporting pin guide member capable of preventing misalignment of an unfixed substrate supporting pin to prevent damages to the substrate and a decrease in the yield due to damages to the substrate supporting pin by preventing the substrate supporting pin from being damaged by loading or unloading of the substrate or static electricity. | 09-26-2013 |
20140109832 | DEPOSITION APPARATUS - In a deposition apparatus, as a plurality of plasma connection terminals that transfer plasma power to a plasma electrode are coupled in parallel to the plasma electrode, resistance caused by the plurality of plasma connection terminals is reduced and a current is distributed such that heat generated in the plurality of plasma connection terminals can be distributed. Therefore, even if high RF power is used, by preventing the plurality of plasma connection terminals from being oxidized, plasma is stably supplied and thus, stability of a deposition apparatus and the accuracy of a process can be enhanced. | 04-24-2014 |
20140338601 | DEPOSITION APPARATUS - A deposition apparatus according to an exemplary embodiment of the present invention includes: a reactor; a plasma chamber connected to the reactor; a plasma electrode mounted inside of the plasma chamber; and a gas supply plate coupled with the plasma chamber to supply gas into the plasma chamber, wherein a plurality of gas holes is formed at an inner wall of the gas supply plate, and the plurality of gas supply holes is spaced apart from each other by a predetermined interval. | 11-20-2014 |
20150114295 | DEPOSITION APPARATUS - An exemplary embodiment of the present invention provides a deposition apparatus including: a substrate support for supporting a substrate; a reaction chamber wall defining a reaction chamber and contacting the substrate support; a plurality of gas inlets connected to the reaction chamber wall; a remote plasma unit connected to at least one of the plurality of gas inlets; and a gas-supplying path connected to the plurality of gas inlets and defining a reaction region along with the substrate support. A plurality of gases passing through the plurality of gas inlets move along the gas-supplying path to be directly supplied onto the substrate without contacting other parts of the reactor. | 04-30-2015 |
20150125628 | METHOD OF DEPOSITING THIN FILM - Disclosed is a method of depositing a thin film, which includes supplying a purge gas and a source gas into a plurality of reactors for a first period, stopping supplying of the source gas, and supplying the purge gas and a reaction gas into the plurality of reactors for a second period, and supplying the reaction gas and plasma into the plurality of reactors for a third period. | 05-07-2015 |
20150125629 | METHOD OF DEPOSITING THIN FILM - A method of depositing a thin film includes: repeating a first gas supply cycle a first plurality of times, the first gas supply cycle including supplying a source gas to a reaction space; supplying first plasma while supplying a reactant gas to the reaction space; repeating a second gas supply cycle a second plurality of times, the second gas supply cycle including supplying the source gas to the reaction space; and supplying second plasma while supplying the reactant gas to the reaction space, wherein the supplying of the first plasma includes supplying remote plasma, and the supplying of the second plasma includes supplying direct plasma. | 05-07-2015 |
20160060760 | DEPOSITION APPARATUS AND CLEANSING METHOD USING THE SAME - Provided is a deposition apparatus including a connection channel connecting a gas inflow channel and a gas outflow channel so as to increase cleaning efficiency by providing a portion of cleaning gas to the dead space of the gas inflow channel and controlling a flow of a cleaning gas. | 03-03-2016 |