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Dae Youn
Dae Youn Kang, Pusan KR
| Patent application number | Description | Published |
|---|---|---|
| 20080277403 | Beverage can with an external reservoir for additional sweet - A beverage can with a small external sweet reservoir is provided. The reservoir is rotate-ably attached to the bottom of the beverage can. A hole for introducing the sweets is developed a he bottom of the beverage can. The reservoir is a shallow cylindrical can, which is divided into pluralities of sections of same internal volume by pluralities of dividers that are installed inside of the reservoir and are extending radially from the center thereof. Each section is filled with sugar solution, except first section. Face of the reservoir toward the main can body is open. Rubber gaskets are attached at each end of the dividers and the open end of the reservoir, which contacts with the beverage can, to prevent leak of the sugar solution. As a customer turns the reservoir, additional sugar solution is introduced to the beverage can through the hole and the user can adjust sweetness or the beverage. | 11-13-2008 |
Dae Youn Kim, Seoul KR
| Patent application number | Description | Published |
|---|---|---|
| 20100251469 | UPPER BODY SUPPORT APPARATUS FOR TOILETS - An upper body support apparatus for toilets is disclosed. The upper body support apparatus includes a support board ( | 10-07-2010 |
| 20100293705 | UPPER BODY SUPPORT APPARATUS FOR TOILETS - The preset invention provides an upper body support apparatus for toilets which enables a user to place his/her arms thereon when having a bowel movement. The upper body support apparatus ( | 11-25-2010 |
Dae Youn Kim, Daedog-Gu KR
| Patent application number | Description | Published |
|---|---|---|
| 20110308460 | ATOMIC LAYER DEPOSITION APPARATUS - The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate. | 12-22-2011 |
Dae Youn Kim, Daejeon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20080241384 | LATERAL FLOW DEPOSITION APPARATUS AND METHOD OF DEPOSITING FILM BY USING THE APPARATUS - A deposition apparatus and deposition method for forming a film on a substrate are disclosed. A film is deposited on a substrate by exposing the substrate to different flow directions of reactant gases. In one embodiment, the substrate is rotated in the reaction chamber after a film having an intermediate thickness is formed on the substrate. In other embodiments, the substrate is transferred from one reaction chamber to another after a film having an intermediate thickness is formed on the substrate. Accordingly, a film having a uniform thickness is deposited, averaging out depletion effect. | 10-02-2008 |
| 20090155452 | THIN FILM DEPOSITION APPARATUS AND METHOD THEREOF - A thin film deposition apparatus including a substrate mounting error detector, a chamber and a substrate support positioned in the chamber. The substrate support is configured to support a substrate. The substrate mounting error detector includes: a light source configured to provide a light beam to the substrate, such that the substrate reflects the light beam; a collimator configured to selectively pass at least a portion of the light beam reflected by the substrate; and an optical sensor configured to detect the at least a portion of the reflected light beam passed by the collimator. The detector is positioned and oriented to detect substrate position on a lowered support prior to raising the support into contact with an upper cover of a clamshell reactor arrangement. This configuration allows a thin film deposition process only if the substrate is correctly mounted on the substrate support. Thus, abnormal deposition due to a substrate mounting error is prevented in advance. | 06-18-2009 |
Dae Youn Lee, Seoul KR
| Patent application number | Description | Published |
|---|---|---|
| 20110091118 | APPARATUS AND METHOD FOR CODING A THREE DIMENSIONAL MESH - Disclosed is a three-dimensional (3D) mesh compression apparatus and method. The 3D mesh compression apparatus may generate a base mesh through a mesh simplification, may separately compress the base mesh and peaks eliminated by the simplification, may construct a covariance matrix based on a topological distance between the eliminated peaks, and may compress 3D mesh data based on the covariance matrix. | 04-21-2011 |
Dae-Youn Cho, Yuseong-Gu KR
| Patent application number | Description | Published |
|---|---|---|
| 20090058792 | BACKLIGHT UNIT, LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME, AND LOCALIZED DIMMING METHOD THEREOF - A backlight unit of a liquid crystal display device supplies light to one or more corresponding pixels of a liquid crystal display panel. The backlight unit includes a plurality of blocks formed into a matrix shape. Each block includes a light emitting diode module. The blocks in a row of the matrix are driven by a same row driving signal and the blocks in a column of the matrix are driven by a same column driving signal, to adjust luminance of the light supplied to the corresponding pixels. | 03-05-2009 |
Dae-Youn Kim, Daejeon KR
| Patent application number | Description | Published |
|---|---|---|
| 20100275844 | DEPOSITION APPARATUS - In a deposition apparatus according to an embodiment of the present invention, a buffer unit is provided between a vaporizer and a reactor of a vaporization supply system to temporarily store source gas, thus, before and when the source gas is supplied to the reactor, the variations of the internal pressure of the vaporizer can be reduced to supply the constant amount of source gas of to reaction spaces, thereby depositing a thin film having a uniform thin-film thickness. | 11-04-2010 |
Dae-Youn Kim, Gyeonggi-Do KR
| Patent application number | Description | Published |
|---|---|---|
| 20080211199 | Snow Vehicle - A snow vehicle according to the present invention takes a shape streamlined from a front part | 09-04-2008 |
Dae-Youn Kim, Daedeok-Gu KR
| Patent application number | Description | Published |
|---|---|---|
| 20100170441 | Method of Forming Metal Oxide and Apparatus for Performing the Same - In a method and an apparatus for forming metal oxide on a substrate, a source gas including metal precursor flows along a surface of the substrate to form a metal precursor layer on the substrate. An oxidizing gas including ozone flows along a surface of the metal precursor layer to oxidize the metal precursor layer so that the metal oxide is formed on the substrate. A radio frequency power is applied to the oxidizing gas flowing along the surface of the metal precursor layer to accelerate a reaction between the metal precursor layer and the oxidizing gas. Acceleration of the oxidation reaction may improve electrical characteristics and uniformity of the metal oxide. | 07-08-2010 |