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Coene
Chris Coene, Torhout BE
| Patent application number | Description | Published |
|---|---|---|
| 20120121036 | METHOD AND APPARATUS FOR CLOCK SPUR SUPPRESSION IN DIRECT-RF MODULATORS - Methods and systems to reduce clock spurs produced by a direct-RF modular to acceptable levels using a digital predistortion compensation signal. The digital compensation signal may be used to generate a sine wave in the digital domain with adjustable phase and amplitude. The digital compensation signal may be added to a digital signal processor (DSP) section of an upconvertor, and may be combined with the undesired clock spur signal to reduce it or even cancel it out completely. In some implementations, the digital predistortion compensation signal may have a similar level of the clock spur such that when added to the clock spur, results in a clock spur having a reduced amplitude. | 05-17-2012 |
Lode Coene, Brugge Sintkruis BE
| Patent application number | Description | Published |
|---|---|---|
| 20090245244 | Method for transmitting packets in a network - Stream Control Transmission Protocol (SCTP) transmits packets to the remote peer with a size equal or smaller than Maximum Transmission Unit (MTU). The MTU can be discovered by SCTP utilizing the path-MTU discovery algorithm of RFC1191 (or similar techniques). However the MTU of a certain path within a SCTP association can change over time. If the path MTU grows then there is no problem. If the path MTU decreases, then packets with size equal to the old path MTU will not be able to be delivered to the remote peer as the link or router with the smaller MTU will drop the packet. Thus all such packets will remain unacknowledged and will lead to head of line blocking for in-sequence delivery of packets of the streams to which to non-delivered packets belong. This leads to the failure of the association. The proposed method resegments SCTP-packets due to a path MTU decrease in a SCTP association. | 10-01-2009 |
Matthew Coene, Ontario, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100329545 | METHOD AND SYSTEM FOR TRAINING CLASSIFICATION AND EXTRACTION ENGINE IN AN IMAGING SOLUTION - A method and system for automatically training a document imaging classification and extraction system that switches between a manual mode and an automatic mode based on constant monitoring. A specialized sub-system monitors and records a user interaction with the classification system during the initial manual mode and, in parallel, develops and tests a user configuration with respect to an automated processing engine. The system is capable of being shifted to the automatic mode if a desired acceptability threshold is attained and the document can then be processed automatically. Furthermore, a user can interact with the classification system if the automatic mode fails. Information concerning exception handling can be entered into a training database for continual refinement of the classification and extraction system. | 12-30-2010 |
Matthew Dylan Coene, Ontario, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100235305 | SYSTEM AND METHOD OF ON-DEMAND DOCUMENT PROCESSING - A document processing method includes receiving, at a server with a network interface, electronic documents from a user. The server includes a software application adapted to recognize a class of electronic documents to which the electronic documents belong. The method also includes processing the electronic documents received from the user to extract data therefrom based on a recognition that the electronic documents belong to the class of electronic documents. The extracted data corresponds to a service being provided to the user. The method also includes automatically mapping the extracted data from the processed electronic documents to a data repository on the server. The data repository is accessible by the user through the network interface. The method also includes electronically generating output data based on the mapped data from the data repository to the user. The output data corresponds to the service being provided to the user. | 09-16-2010 |
Paul Coene, Grobbendonk BE
| Patent application number | Description | Published |
|---|---|---|
| 20090187756 | SYSTEM AND METHOD FOR HARDWARE-SOFTWARE MULTITASKING ON A RECONFIGURABLE COMPUTING PLATFORM - A platform supporting reconfigurable computing, enabling the introduction of reconfigurable hardware into portable devices is described. Dynamic hardware/software multitasking methods for a reconfigurable computing platform including reconfigurable hardware devices such as gate arrays, especially FPGA's, and software, such as dedicated hardware/software operating systems and middleware, adapted for supporting the methods, especially multitasking, are described. A computing platform, which is a heterogeneous multi-processor platform, containing one or more instruction set processors (ISP) and a reconfigurable matrix (for instance a gate array, especially an FPGA), adapted for (dynamic) hardware/software multitasking is described. | 07-23-2009 |
Willem Maria Julia Marcel Coene, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20090027239 | CODER AND A METHOD OF CODING FOR CODES HAVING A REPEATED MAXIMUM TRANSITION RUN CONSTRAINT OF 2 - Presently known codes have long trains consisting of consecutive 2T runs that reduce the performance of the bit detector. By using a code with an RMTR constraint of 2 an improvement in the bit detection is achieved. A code constructed in a systematic way that provides an RMTR constraint of 2 is presented. Several variations of such a code are disclosed where one or more sub-codes are used, where coding states are divided into coding classes and where code words are divided into code word types. Then, for a given sub-code, an code word of type t can be concatenated with an code word of the next sub-code if said subsequent code word of said next sub-code belongs to one of coding states of the coding class with index T | 01-29-2009 |
Willem Marie Julia Marcel Coene, Geldrop NL
| Patent application number | Description | Published |
|---|---|---|
| 20100284008 | Method of Determining Overlay Error and a Device Manufacturing Method - A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method. | 11-11-2010 |
| 20110001978 | Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method - A method of determining an overlay error between two successive layers produced by a lithographic process on a substrate, including using the lithographic process to form a calibration structure including a periodic structure of the same pitch on each of the layers, such that an overlaid pair of periodic structures is formed, the structures being parallel, but offset relative to each other by an overlay amount. A spectrum produced by directing a beam of radiation onto the calibration structure is measured and compared with one or more modeled spectra so as to determine values of the grating parameters for the calibration structure from the measured spectrum. The lithographic process is used to form further overlaid periodic structures on the same or one or more subsequent substrates, the determined grating parameter values for the calibration structure being used to determine overlay amounts for the further overlaid periodic structures. | 01-06-2011 |
| 20110020616 | Method of Determining Overlay Error and a Device Manufacturing Method - A method of determining an overlay error in a set of superimposed patterns. The patterns are divided into two and a first part of the pattern has a bias of d+s/2 between the first layer and second layer. A second part of the pattern has a bias of d−s/2 between the first and second layer. The two parts of the pattern are of equal size. To eliminate a particular harmonic s is chosen to be T/(2n) where T is the period of the pattern and n is a positive integer. | 01-27-2011 |
| 20110043791 | Metrology Method and Apparatus, Lithographic Apparatus, Device Manufacturing Method and Substrate - A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field. | 02-24-2011 |
| 20110178785 | Calibration Method and Apparatus - Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials. | 07-21-2011 |
| 20110194092 | Substrate, an Inspection Apparatus, and a Lithographic Apparatus - A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced | 08-11-2011 |
| 20110304851 | Scatterometry Method and Measurement System for Lithography - Scatterometry method and apparatus are useful in a lithographic apparatus and device manufacturing. A back focal plane diffraction intensity image of a measurement projection system configured to project a radiation beam onto a target portion of a substrate is measured. A beam of radiation having a first wavelength is directed to the substrate. A diffraction image of a zeroth diffraction order and higher order diffraction from a diffraction structure in the substrate is provided. A first layer ( | 12-15-2011 |
| 20120123581 | Metrology Method and Inspection Apparatus, Lithographic System and Device Manufacturing Method - Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus. | 05-17-2012 |