Patent application number | Description | Published |
20080204665 | Color combiner for solid-state light sources - An illumination apparatus has first and second optical condenser systems sharing a common aperture. The first optical condenser system has a first solid-state light source having a first spectral band and a first curved surface spaced apart from the first solid-state light source and treated to reflect the first spectral band along a first optical path to exit at the common aperture and to pass light outside the first spectral band. The second optical condenser system has a second solid-state light source having a second spectral band and a second curved surface disposed behind the first curved surface with respect to the first and second light sources and treated to reflect the second spectral band along a second optical path to exit at the common aperture. | 08-28-2008 |
20090052480 | Laser pulse conditioning - A light pulse conditioning apparatus has at least first and second curved reflective surfaces that share a common focus and a light-redirecting element disposed between the first and second curved reflective surfaces to redirect at least a portion of an incident light beam toward the second curved reflective surface as a delayed beam portion. A beam-shifting compensating element is disposed between the first curved reflective surface and the light-redirecting element and in the path of the delayed beam portion, for shifting the optical path of the delayed beam portion as it returns toward the light-redirecting element. | 02-26-2009 |
20090296064 | ILLUMINATION SYSTEM FOR SIZING FOCUSED SPOTS OF A PATTERNING SYSTEM FOR MASKLESS LITHOGRAPHY - An optical system for producing a pattern of focused spots, such as a maskless lithographic projection system, includes an illuminator, a pattern generator, and an imager. The illuminator includes a light source for generating a light beam, a homogenizer for evenly dispersing light within the light beam, and a condenser for coupling the light source to the homogenizer. The pattern generator has individually addressable elements illuminated by the light beam from the illuminator. The imager images the addressable elements of the pattern generator onto corresponding focusing elements for forming focused spots that are conjugate to aperture stops in both the imager and the illuminator. The illuminator underfills the imager aperture stop for reducing the size of the focused spots. The condenser underfills the illuminator aperture stop for further controlling the size and shape of the focused spots. | 12-03-2009 |
20100188723 | OPTICAL MODULATOR WITH BEAM-POINTING CORRECTION - An apparatus for providing a modulated pulsed radiation beam ( | 07-29-2010 |
20110181840 | MULTI-PROJECTOR SYSTEM USING MULTIPLEXED ILLUMINATION - An apparatus for forming a color image has at least a first, a second, and a third illumination source, each illumination source energizable to provide continuous illumination of a first, a second, or a third wavelength band, respectively, to an optical multiplexer. The optical multiplexer is actuable to cyclically switch received light from each one of the illumination sources, in turn, to each one of at least a first, a second, and a third projector channel in a repeated sequence. The first projector channel connects to a first projector apparatus, the second projector channel connects to a second projector apparatus, and the third projector channel connects to a third projector apparatus. Each projector apparatus has a light modulator that is energizable to form an image from the light of the first, second, or third wavelength band that is cyclically switched onto its projector channel from the optical multiplexer. | 07-28-2011 |
20120154819 | INTERFEROMETER WITH PARABOLOIDAL ILLUMINATION AND IMAGING OPTIC AND TILTED IMAGING PLANE - A Fizeau interferometer incorporates an off-axis paraboloidal reflector that forms virtual images of reference and test surfaces and a camera lens that converts the virtual images into real images on a camera detector surface. The camera detector surface is arranged together with the camera lens to accommodate tilting of the virtual images by the off-axis paraboloidal reflector. | 06-21-2012 |
20120300277 | LASER SPECKLE REDUCTION FOR IMAGING SYSTEMS - A speckle reduction system includes an optical system and one or more beam steerers for directing light to successive off-axis areas around a diffuser and for reorienting and recentering distributions of the light from each of the successive off-axis areas of the diffuser along a common axis. | 11-29-2012 |
20120307370 | Method and Apparatus for Combining Light Sources in a Pump Laser Array - An apparatus for providing pump light of a first wavelength λ | 12-06-2012 |
20130215923 | METHOD AND APPARATUS FOR COMBINING LASER ARRAY LIGHT SOURCES - An apparatus for providing a light beam has a solid-state laser to emit a polarized input laser light beam that has a first aspect ratio of etendue R | 08-22-2013 |
20130314922 | SINGLE-EMITTER ETENDUE ASPECT RATIO SCALER - An apparatus emits a laser light beam with a first aspect ratio of etendue R | 11-28-2013 |
20140117254 | APPARATUS FOR SUBSTANCE DETECTION - A sensing apparatus for detecting light of first and second fluorescent wavelength bands has a light source to generate an excitation wavelength to a first collimator element. A dichroic multiplexer has a first coated surface oblique to the optical axis and treated to transmit the excitation wavelength and to reflect the second fluorescent wavelength band and a second coated surface treated to transmit the excitation wavelength and the second fluorescent wavelength band and to reflect the first fluorescent wavelength band. A focusing element focuses the excitation light toward a light guide and directs collimated light of the first and second fluorescent wavelength bands from the light guide to the dichroic multiplexer. A first detector element is in the path of reflected light of the first fluorescent wavelength band and a second detector element is in the path of reflected light of the second fluorescent wavelength band. | 05-01-2014 |
20150049337 | GRAZING-INCIDENCE INTERFEROMETER WITH DUAL-SIDE MEASUREMENT CAPABILITY - A grazing-incidence interferometer includes first and second spaced-apart diffractive optical elements with a generally planar object disposed therebetween. The first diffractive optical element forms sheared first-diffracted-order light beams that reflect from opposite first and second surfaces of the object at grazing-incidence angles, while a zero-diffracted-order light beam goes unreflected. The second diffractive optical element combines the unreflected zero-diffracted-order light beam and the sheared reflected beams to form a collimated, combined beam. A 1X double-telecentric relay system relays the combined beam to a folding optical system that forms first and second interference images on a diffusing screen located at an image plane. Digital images of the first and second interference images are obtained and processed to characterize the thickness variation of the object. | 02-19-2015 |
Patent application number | Description | Published |
20080274611 | METHOD AND PROCESS FOR FORMING A SELF-ALIGNED SILICIDE CONTACT - The present invention provides a method for forming a self-aligned Ni alloy silicide contact. The method of the present invention begins by first depositing a conductive Ni alloy with Pt and optionally at least one of the following metals Pd, Rh, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W or Re over an entire semiconductor structure which includes at least one gate stack region. An oxygen diffusion barrier comprising, for example, Ti, TiN or W is deposited over the structure to prevent oxidation of the metals. An annealing step is then employed to cause formation of a NiSi, PtSi contact in regions in which the metals are in contact with silicon. The metal that is in direct contact with insulating material such as SiO | 11-06-2008 |
20090004831 | METHOD OF CREATING DEFECT FREE HIGH Ge CONTENT (> 25%) SiGe-ON-INSULATOR (SGOI) SUBSTRATES USING WAFER BONDING TECHNIQUES - A method for achieving a substantially defect free SGOI substrate which includes a SiGe layer that has a high Ge content of greater than about 25 atomic % using a low temperature wafer bonding technique is described. The wafer bonding process described in the present application includes an initial prebonding annealing step that is capable of forming a bonding interface comprising elements of Si, Ge and O, i.e., interfacial SiGeO layer, between a SiGe layer and a low temperature oxide layer. The present invention also provides the SGOI substrate and structure that contains the same. | 01-01-2009 |
20090305616 | GLASS MOLD POLISHING METHOD AND STRUCTURE - A glass mold polishing structure and method. The method includes providing a polishing tool comprising mounting plate, a chuck plate over and mechanically attached to the mounting plate, and a pad structure over and mechanically attached to the chuck plate. A retaining structure is attached the chuck plate. A glass mold comprising a plurality of cavities is placed on the pad structure and within a perimeter formed by the retaining structure. A vacuum device is attached to the chuck plate. The vacuum device is activated such that a vacuum is formed and mechanically attaches the glass mold to the pad structure. The polishing tool comprising the glass mold mechanically attached to the pad structure is placed over and in contact with the polishing pad. The polishing tool comprising the glass mold is rotated. The glass mold is polished as a result of the rotation. | 12-10-2009 |
20130072089 | MULTI-SPINDLE CHEMICAL MECHANICAL PLANARIZATION TOOL - An apparatus for chemical mechanical planarization includes a spindle assembly structure and at least one substrate carrier, which make a linear lateral movement relative to each other while abrasive surfaces of a plurality of cylindrical spindles in the spindle assembly structure contact, and rotate against, at least one substrate mounted on the at least one substrate carrier. The direction of the linear lateral movement is within the plane that tangentially contacts the plurality of cylindrical spindles, and can be orthogonal to the axes of rotation of the plurality of cylindrical spindles. | 03-21-2013 |
20130072092 | MULTI-SPINDLE CHEMICAL MECHANICAL PLANARIZATION TOOL - An apparatus for chemical mechanical planarization includes a spindle assembly structure and at least one substrate carrier, which make a linear lateral movement relative to each other while abrasive surfaces of a plurality of cylindrical spindles in the spindle assembly structure contact, and rotate against, at least one substrate mounted on the at least one substrate carrier. The direction of the linear lateral movement is within the plane that tangentially contacts the plurality of cylindrical spindles, and can be orthogonal to the axes of rotation of the plurality of cylindrical spindles. | 03-21-2013 |
20130316623 | MULTI-SPINDLE CHEMICAL MECHANICAL PLANARIZATION TOOL - An apparatus for chemical mechanical planarization includes a spindle assembly structure and at least one substrate carrier, which make a linear lateral movement relative to each other while abrasive surfaces of a plurality of cylindrical spindles in the spindle assembly structure contact, and rotate against, at least one substrate mounted on the at least one substrate carrier. The direction of the linear lateral movement is within the plane that tangentially contacts the plurality of cylindrical spindles, and can be orthogonal to the axes of rotation of the plurality of cylindrical spindles. | 11-28-2013 |