| Patent application number | Description | Published |
|---|
| 20100006886 | HIGH POWER LIGHT EMITTING DIODE CHIP PACKAGE CARRIER STRUCTURE - A high power LED (light-emitting diode) chip package carrier structure is disclosed and comprises a circuit board, a metal plate and a lid. The circuit board has a perforate groove for positioning a chip, and an electrode contact area formed at two sides or border of the perforate groove. The metal plate is positioned beneath the circuit board. The lid is positioned above the circuit board, and has a through groove with a width larger than the width of the perforate groove of the circuit board such that the electrode contact area can be exposed out in the through groove of the lid. Thus, the manufacturing process can be simplified and helpful to the mass production. | 01-14-2010 |
| 20100096642 | PACKAGING STRUTURE FOR HIGH POWER LIGHT EMITTING DIODE(LED) CHIP - The present invention relates to a packaging structure for high-power light emitting diode (LED) chip, comprising a metal plate, insulators and a cover plate. The metal plate comprises a containing slot and isolating slots formed on the surface by working, and the insulators can be embedded in the isolating slot. After forming a hollow slot and notches on the surface of the cover plate by working, the cover plate is combined with the metal plate and insulators and at the same time, the hollow slot and the notches are corresponding to the containing slot and the isolating slots on the metal plate to form a hollowness state, followed by application of surface treatment to form soldering portions and an anti-soldering layer at the bottom of the metal plate. Then the metal plate is cut on both sides along free ends of the insulators so as to generate electrode contacts with positive and negative electrodes, and the surface mount technology (SMT) can be adopted for assembly of the packaging structure of high-power LED chip so as to simplify manufacturing processes, facilitate mass production and achieve separation of electricity from heat, etc. | 04-22-2010 |
| Patent application number | Description | Published |
|---|
| 20080233765 | Method for enhancing adhesion between layers - A novel method for enhancing interface adhesion between adjacent dielectric layers, particularly between an etch stop layer and an overlying dielectric layer having a low dielectric constant (k) in the formation of metal interconnects during the fabrication of integrated circuits on semiconductor wafer substrates. The method may include providing a substrate, providing an etch stop layer on the substrate, providing an oxygen-rich dielectric pre-layer on the etch stop layer and providing a major dielectric layer on the oxygen-rich dielectric pre-layer. Metal interconnects are then formed in the dielectric layers. The oxygen-rich dielectric pre-layer between the etch stop layer and the upper dielectric layer prevents or minimizes peeling and cracking of the layers induced by stresses that are caused by chemical mechanical planarization of metal layers and/or chip packaging. | 09-25-2008 |
| 20080272493 | Semiconductor device - A semiconductor device is disclosed. The device includes a substrate, a first porous SiCOH dielectric layer, a second porous SiCOH dielectric layer, and an oxide layer. The first porous SiCOH dielectric layer overlies the substrate. The second porous SiCOH dielectric layer overlies the first porous SiCOH dielectric layer. The oxide layer overlies the second porous SiCOH dielectric layer. The atomic percentage of carbon in the second porous SiCOH dielectric layer is between 16% and 22% of that in the first porous SiCOH dielectric layer. | 11-06-2008 |
| 20090258487 | Method for Improving the Reliability of Low-k Dielectric Materials - A method for forming an integrated circuit structure includes providing a semiconductor substrate; forming a low-k dielectric layer over the semiconductor substrate; generating hydrogen radicals using a remote plasma method; performing a first hydrogen radical treatment to the low-k dielectric layer using the hydrogen radicals; forming an opening in the low-k dielectric layer; filling the opening with a conductive material; and performing a planarization to remove excess conductive material on the low-k dielectric layer. | 10-15-2009 |
| 20100120253 | Post Etch Dielectric Film Re-Capping Layer - Methods for improving post etch in via or trench formation in semiconductor devices. A preferred embodiment comprises forming a re-capping layer over a dielectric film following an initial etch to form a feature in the dielectric film, followed by additional etch and etch back processing steps. The re-capping method provides protection for underlying films and prevents film damage post etch. Uniform feature profiles are maintained and critical dimension uniformity is obtained by use of the methods of the invention. The time dependent dielectric breakdown performance is increased. | 05-13-2010 |
| 20100213518 | Impurity Doped UV Protection Layer - An ultra-violet (UV) protection layer is formed over a semiconductor workpiece before depositing a UV curable dielectric layer. The UV protection layer prevents UV light from reaching and damaging underlying material layers and electrical devices. The UV protection layer comprises a layer of silicon doped with an impurity, wherein the impurity comprises O, C, H, N, or combinations thereof. The UV protection layer may comprise SiOC:H, SiON, SiN, SiCO:H, combinations thereof, or multiple layers thereof, as examples. | 08-26-2010 |
| 20110195576 | DOUBLE PATTERNING STRATEGY FOR CONTACT HOLE AND TRENCH IN PHOTOLITHOGRAPHY - A method of lithography patterning includes forming a first etch stop layer, a second etch stop layer, and a hard mask layer on a material layer. The materials of the first etch stop layer and the second etch stop layer are selected by the way that there is a material gradient composition between the second etch stop layer, the first etch stop layer, and the material layer. Hence, gradient etching rates between the second etch stop layer, the first etch stop layer, and the material layer are achieved in an etching process to form etched patterns with smooth and/or vertical sidewalls within the second and the first etch stop layers and the material layer. | 08-11-2011 |
| 20110207329 | DOUBLE PATTERNING STRATEGY FOR CONTACT HOLE AND TRENCH IN PHOTOLITHOGRAPHY - A method of lithography patterning includes forming a mask layer on a material layer and forming a capping layer on the mask layer. The capping layer is a boron-containing layer with a higher resistance to an etching reaction of patterning process of the material layer. By adapting the boron-containing layer as the capping layer, the thickness of the mask layer can be thus reduced. Hence, a better gap filling for forming an interconnect metallization in the material layer could be achieved as well. | 08-25-2011 |
| 20110217840 | Method for Forming Self-Assembled Mono-Layer Liner for Cu/Porous Low-k Interconnections - A method for fabricating an integrated circuit comprises forming a low-k dielectric layer over a semiconductor substrate, etching the low-k dielectric layer to form an opening, and treating the low-k dielectric layer with a gaseous organic chemical to cause a reaction between the low-k dielectric layer and the gaseous organic chemical. The gaseous organic chemical is free from silicon. | 09-08-2011 |
| 20110223759 | Low-k Cu Barriers in Damascene Interconnect Structures - In the formation of an interconnect structure, a metal feature is formed in a dielectric layer. An etch stop layer (ESL) is formed over the metal feature and the dielectric layer using a precursor and a carbon-source gas including carbon as precursors. The carbon-source gas is free from carbon dioxide (CO | 09-15-2011 |
| 20110256715 | BARRIER LAYER FOR COPPER INTERCONNECT - A copper interconnect includes a copper layer formed in a dielectric layer. A liner is formed between the copper layer and the dielectric layer. A barrier layer is formed at the boundary between the liner and the dielectric layer. The barrier layer is a metal oxide. | 10-20-2011 |
