Patent application number | Description | Published |
20090001019 | Fluid Treating Apparatus - Embodiments of the present invention are directed to an apparatus that can be used to treat fluids. The apparatus can include a housing with an inlet for receiving a process fluid to be treated, a surface within the housing for treating the process fluid that can be wet by the process fluid, and an outlet for removing treated process fluid. The housing includes a vent that aids in the removal of fluid components that separate from the process fluid. Removal of these separated fluids improves the efficiency and contact of the process fluid with the surfaces in the housing for treating the process fluid. | 01-01-2009 |
20090044830 | Molded Rotatable Base for a Porous Pad - A rotatable base ( | 02-19-2009 |
20090113985 | FLUID FLOW MEASURING AND PROPORTIONAL FLUID FLOW CONTROL DEVICE - Embodiments disclosed herein provide restrictive-flow flow measurement devices, valve improvements and signal control devices and processes that control the flow of liquids, including control processes for single-liquid calibration. In some embodiments, a fluid flow device can be calibrated using a single standard calibration fluid. The fluid flow of a first fluid through a flow meter is measured by calculating a first pressure difference between pressures sensed by two pressure sensors of the flow meter. The fluid flow of a second fluid through the flow meter is measured by calculating a second pressure difference between pressures sensed by the same two pressure sensors. A calibration coefficient is determined based upon the relationship between the flow rate, the fluid density and the calculated pressure difference for the first and second fluids. A relationship between the calibration coefficient and the kinematic viscosity of each fluid is then determined and stored. | 05-07-2009 |
20110248043 | Fluid Flow Measuring and Proportional Fluid Flow Control Device - Embodiments disclosed herein provide restrictive-flow flow measurement devices, valve improvements and signal control devices and processes that control the flow of liquids, including control processes for single-liquid calibration. In some embodiments, a fluid flow device can be calibrated using a single standard calibration fluid. The fluid flow of a first fluid through a flow meter is measured by calculating a first pressure difference between pressures sensed by two pressure sensors of the flow meter. The fluid flow of a second fluid through the flow meter is measured by calculating a second pressure difference between pressures sensed by the same two pressure sensors. A calibration coefficient is determined based upon the relationship between the flow rate, the fluid density and the calculated pressure difference for the first and second fluids. A relationship between the calibration coefficient and the kinematic viscosity of each fluid is then determined and stored. | 10-13-2011 |
20120076945 | MOLDED ROTATABLE BASE FOR A POROUS PAD - A rotatable base for a porous pad has openings that provide for improved flow distribution of a liquid in the base across a substrate. The rotatable base can be molded form a two piece mold and the openings can have draft angles to facilitate the molding process. | 03-29-2012 |
20130048018 | POST-CMP CLEANING BRUSH - Embodiments of the invention include a CMP brush that has a combination of central nodules at an inner region of the brush and one or more edge nodules at an end region of the brush where the central nodules and edge nodules are in a staggered or matched arrangement with each other and an upper surface of each edge nodule on the brush has the same or a greater contact area than an upper surface of a central nodule. The area of contact of the upper surface of each edge nodule with the substrate edge region is the same or greater than the area of contact of the upper surface of a central nodule with the substrate center region. | 02-28-2013 |
20140113532 | CHEMICAL MECHANICAL PLANARIZATION CONDITIONER - A pad conditioner for a CMP polishing pad is disclosed that includes a substrate that has a matrixical arrangement of protrusions that have a layer of poly crystalline diamond on at least their top surfaces. The protrusions may have varying shapes and elevations and may comprise a first set of protrusions and a second set of protrusions, the first set of protrusions have a first average height and the second set of protrusions have a second average height, the first average height different from the second average height, a top of each protrusion in the first set of protrusions has a non-flat surface and a top of each protrusion in the second set of protrusions has a non-flat surface. | 04-24-2014 |
20140158156 | MOLDED ROTATABLE BASE FOR A POROUS PAD - A rotatable base for a porous pad has openings that provide for improved flow distribution of a liquid in the base across a substrate. The rotatable base can be molded from a two piece mold and the openings can have draft angles to facilitate the molding process. | 06-12-2014 |