| Patent application number | Description | Published |
|---|
| 20080227032 | ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES - Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (i.e., no-PFOS) attached to a variety of functional groups. The PAGs of the invention are useful as photoactive component in the chemically amplified resist compositions used for microfabrication. | 09-18-2008 |
| 20080318156 | Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography - Disclosed are glass photoresists generated from adamantane derivatives containing acetal and/or ester moieties as novel high-performance photoresist materials. Some of the disclosed adamantane-based glass resists have a tripodal structure and other disclosed adamantane-based glass resists include one or more cholic groups. The disclosed adamantane derivatives can be synthesized from starting materials which are commercially available. By way of example only, one of many disclosed amorphous glass photoresists has the following structure: | 12-25-2008 |
| 20090136868 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS - The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications. | 05-28-2009 |
| 20090232764 | TRIBLOCK POLYMERS AND POLYMER COATINGS - The invention provides novel polymers, including triblock polymers, as well as methods of preparing the polymers, and compositions that include such polymers. The polymers can include at least three blocks, the first block that includes poly(styrene), the second block that includes a random arrangement of poly(ethylene) and poly(butylene), and a third block that includes functionalized poly(isoprene). Units of the functionalized poly(isoprene) block can include hydroxyl groups and one or more ether linked side chains comprising R | 09-17-2009 |
| 20090258315 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS - The invention provides various photoacid generator compounds and ionic components thereof. Photoresist compositions that include the ions and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for use in, for example, various microfabrication applications. | 10-15-2009 |
| 20100280201 | POLYMERS CONTAINING QUATERNIZED NITROGEN - The invention provides polymers, methods of preparing polymers, and compositions that include polymers, wherein said polymers include a plurality of two-carbon repeating units in a polymer chain, wherein one or more of the two-carbon repeating units of the polymer chain have tertiary amine or pyridine-containing substituents; and at least about 10% of the nitrogen atoms of the tertiary amine or pyridine-containing substituents are quaternized with alkyl groups or with an alkyl group that contains one or more ethylene glycol groups. The alkyl or ethoxylated alkyl groups can also be at least partially fluorinated. The polymers can be used to provide antimicrobial surfaces and antifouling coatings. | 11-04-2010 |
| 20110008732 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS - The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications. | 01-13-2011 |
| 20110039105 | Non-aggregating nanoparticles and the use thereof - The present invention relates generally to non-aggregating nanoparticles, including ligand capped metal oxide nanoparticles. Methods for their synthesis and methods for their use, for example, for improved immersion lithography processes, are also disclosed. | 02-17-2011 |
| 20110159252 | Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices - An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO | 06-30-2011 |
