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Christof Metzmacher
Christof Metzmacher, La Calamine BE
| Patent application number | Description | Published |
|---|---|---|
| 20100194313 | HIGH VOLTAGE ELECTRICAL CONNECTION LINE - The present invention relates to a high voltage electrical connection line ( | 08-05-2010 |
| 20110096428 | EXTREME UV RADIATION REFLECTING ELEMENT COMPRISING A SPUTTER-RESISTANT MATERIAL - The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ≦5 nm and essentially made out of a material with a sputter resistance of ≦10 nm per 10 | 04-28-2011 |
| 20110101251 | EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CORROSION-RESISTANT MATERIAL - The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part. | 05-05-2011 |
Christof Metzmacher, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20090309045 | METHOD OF CLEANING A SURFACE REGION COVERED WITH CONTAMINANT OR UNDESIRABLE MATERIAL - The present invention relates to a method of cleaning a surface at least partly covered with contaminant or undesired material by applying atomic hydrogen. The invention also proposes an irradiation unit adapted to perform the cleaning method. In the present method the atomic hydrogen is generated by dissociation of molecular hydrogen directed to a surface containing catalytic material, which causes the dissociation of at least a part of the molecular hydrogen to atomic hydrogen. The surface with the catalytic material is arranged close to the surface to be cleaned and is dimensioned such that its total surface area is at least twice the surface area of the to be cleaned surface region. The method allows for the cleaning of the surface region in a constructive simple and efficient manner. | 12-17-2009 |
| 20100238422 | OPTICAL DEVICE AND METHOD OF IN SITU TREATING AN EUV OPTICAL COMPONENT TO ENHANCE A REDUCED REFLECTIVITY - The present invention relates to an optical device and a method of in situ treating an optical component ( | 09-23-2010 |
Christof Metzmacher, Aachen DE
| Patent application number | Description | Published |
|---|---|---|
| 20100051064 | METHOD OF CLEANING AND AFTER TREATMENT OF OPTICAL SURFACES IN AN IRRADIATION UNIT - The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source ( | 03-04-2010 |
| 20100051827 | METHOD OF CLEANING OPTICAL SURFACES OF AN IRRADIATION UNIT IN A TWO-STEP PROCESS - The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture. | 03-04-2010 |
Christof Metzmacher, Lacalamine DE
| Patent application number | Description | Published |
|---|---|---|
| 20100001814 | THIN FILM ACOUSTIC REFLECTOR STACK - The invention refers to a method for the fabrication of a thin film acoustic reflector stack with alternating layers of a first and a second material having different acoustic characteristic impedances, wherein the layers are deposited alternately by a reactive pulsed dc magnetron sputtering process. The invention further comprises an acoustic reflector stack fabricated thereby and an arrangement for performing the method. | 01-07-2010 |