Christof Metzmacher
Christof Metzmacher, La Calamine BE
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20100194313 | HIGH VOLTAGE ELECTRICAL CONNECTION LINE - The present invention relates to a high voltage electrical connection line ( | 08-05-2010 |
20110096428 | EXTREME UV RADIATION REFLECTING ELEMENT COMPRISING A SPUTTER-RESISTANT MATERIAL - The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ≦5 nm and essentially made out of a material with a sputter resistance of ≦10 nm per 10 | 04-28-2011 |
20110101251 | EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CORROSION-RESISTANT MATERIAL - The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part. | 05-05-2011 |
20110181848 | EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CONTAMINATION CAPTOR - The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath. | 07-28-2011 |
Christof Metzmacher, Eindhoven NL
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20090309045 | METHOD OF CLEANING A SURFACE REGION COVERED WITH CONTAMINANT OR UNDESIRABLE MATERIAL - The present invention relates to a method of cleaning a surface at least partly covered with contaminant or undesired material by applying atomic hydrogen. The invention also proposes an irradiation unit adapted to perform the cleaning method. In the present method the atomic hydrogen is generated by dissociation of molecular hydrogen directed to a surface containing catalytic material, which causes the dissociation of at least a part of the molecular hydrogen to atomic hydrogen. The surface with the catalytic material is arranged close to the surface to be cleaned and is dimensioned such that its total surface area is at least twice the surface area of the to be cleaned surface region. The method allows for the cleaning of the surface region in a constructive simple and efficient manner. | 12-17-2009 |
20100238422 | OPTICAL DEVICE AND METHOD OF IN SITU TREATING AN EUV OPTICAL COMPONENT TO ENHANCE A REDUCED REFLECTIVITY - The present invention relates to an optical device and a method of in situ treating an optical component ( | 09-23-2010 |
Christof Metzmacher, Aachen DE
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20100051064 | METHOD OF CLEANING AND AFTER TREATMENT OF OPTICAL SURFACES IN AN IRRADIATION UNIT - The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source ( | 03-04-2010 |
20100051827 | METHOD OF CLEANING OPTICAL SURFACES OF AN IRRADIATION UNIT IN A TWO-STEP PROCESS - The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture. | 03-04-2010 |
20140097914 | BULK ACOUSTIC WAVE RESONATOR WITH MEANS FOR SUPPRESSION OF PASS-BAND RIPPLE IN BULK ACOUSTIC WAVE FILTERS - A bulk acoustic wave resonator comprising a substrate, a Bragg reflector, a top and a bottom electrode and a piezoelectric layer with means for suppression of the pass-band ripples in a bulk acoustic wave filter. The means for absorbing or scattering the spurious modes are a roughened rear side of the substrate, an absorbing layer disposed on the rear side of the substrate and/or an absorbing layer disposed on the front side of the substrate. | 04-10-2014 |
Christof Metzmacher, Lacalamine DE
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20100001814 | THIN FILM ACOUSTIC REFLECTOR STACK - The invention refers to a method for the fabrication of a thin film acoustic reflector stack with alternating layers of a first and a second material having different acoustic characteristic impedances, wherein the layers are deposited alternately by a reactive pulsed dc magnetron sputtering process. The invention further comprises an acoustic reflector stack fabricated thereby and an arrangement for performing the method. | 01-07-2010 |
Christof Metzmacher, Raeren BE
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20120212158 | ELECTRODE SYSTEM, IN PARTICULAR FOR GAS DISCHARGE LIGHT SOURCES - The present invention relates to an electrode system, in particular of a gas discharge device for generating EUV radiation and/or soft X-rays. The electrode system comprises at least two electrodes ( | 08-23-2012 |
20140173875 | METHOD OF MANUFACTURING MIRROR SHELLS OF A NESTED SHELLS GRAZING INCIDENCE MIRROR - The present invention relates to a method of manufacturing mirror shells of a nested shells grazing incidence mirror, in particular for EUV radiation and/or X-rays. In the method a blank of a bulk material is provided and machined to form a mirror body of the shell. Mechanical structures are integrated and/or attached to the mirror body during and/or after the machining step. The mechanical structures are required for mounting and/or operating the mirror shells. After these steps the optical surface is formed on the mirror body by diamond turning. The proposed method allows the manufacturing of mirror shells of a nested shells grazing incidence mirror at low costs with high optical quality which may also be refurbished one or several times. | 06-26-2014 |
Christof Metzmacher, Rearen DE
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20120216681 | FOIL TRAP DEVICE WITH IMPROVED HEAT RESISTANCE - The present invention relates to a foil trap device for debris mitigation, in particular in an EUV system. The foil trap comprises a plurality of spaced apart foils ( | 08-30-2012 |