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Christian Wagner
Christian Wagner, Mainz DE
| Patent application number | Description | Published |
|---|---|---|
| 20090162473 | Neck Block Cooling - A neck block of a moulding tool for the production of a hollow body preform by means of injection moulding, wherein the neck block has a main body with a shaping surface which is adapted to the external contour of a neck portion of the hollow body preform to be produced and is provided to come into contact in the injection moulding operation with the neck portion of the hollow body preform, wherein furthermore there is provided at least one cooling passage for a cooling fluid which at least portion-wise extends substantially parallel to the shaping surface. The neck block is further provided with an inlet and an outlet and an inlet passage and an outlet passage which connect the inlet and the outlet respectively to the cooling passage. The cooling passage is arranged closer to the shaping surface than the inlet and the outlet. The cooling passage has at least one portion which extends substantially parallel to the shaping surface and which extends within the main body so that the walls thereof are formed by the main body, and a connecting portion which adjoins said portion and the walls of which are formed in part by the main body and in part by a closure element fitted onto the main body. | 06-25-2009 |
| 20090212459 | Method and System for Post-Treating Preforms - The invention concerns a system for the post-treatment of preforms ( | 08-27-2009 |
| 20100007048 | METHOD FOR THE PRODUCTION OF A MULTI-LAYER PREFORM AND NOZZLE THEREFOR - A melt feed device for an injection molding apparatus having at least one nozzle element connected both to a first hot runner and a second hot runner for feeding both the first melt and the second melt into an injection molding mold. The nozzle has three substantially concentrically arranged feed passages, wherein the innermost and the outermost feed passage are in communication with the first hot runner and the central feed passage is in communication with the second hot runner. A closure element is provided that can be reciprocated between a first position in which the closure element closes all feed passages, a second position in which the closure element opens the outermost feed passage but closes the other two feed passages and a third position in which the closure element opens all feed passages. The invention also includes process and molds using the device. | 01-14-2010 |
| 20100297275 | Positioning device - The present invention concerns a system for the aftertreatment of parisons ( | 11-25-2010 |
Christian Wagner, Martinsried DE
| Patent application number | Description | Published |
|---|---|---|
| 20090232936 | Novel lipases and uses thereof - The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel lipolytic enzyme from | 09-17-2009 |
| 20090275079 | Novel genes encoding novel proteolytic enzymes - The invention relates to newly identified gene sequences that encode novel proteases obtainable from | 11-05-2009 |
| 20100047877 | Novel phospholipases and uses thereof - The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel phospholipase isolated from | 02-25-2010 |
Christian Wagner, Ks Eersel NL
Christian Wagner, Eersel NL
| Patent application number | Description | Published |
|---|---|---|
| 20080212052 | OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH PASSIVE THERMAL COMPENSATION - An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element. | 09-04-2008 |
| 20090161089 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. | 06-25-2009 |
Christian Wagner, Gemuenden DE
| Patent application number | Description | Published |
|---|---|---|
| 20090022780 | HYDROGEL - The invention is related to gel preparations capable of absorbing as well as releasing liquid, and the use of such gel preparations in the treatment of wounds. | 01-22-2009 |
Christian Wagner, Duizel NL
| Patent application number | Description | Published |
|---|---|---|
| 20110149276 | Method of Detecting a Particle and a Lithographic Apparatus - A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field. | 06-23-2011 |