| Patent application number | Description | Published |
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| 20090213291 | LIQUID CRYSTAL DISPLAY - The present invention relates to a liquid crystal display (LCD), comprising: a backlight unit; a plurality of optical films disposed above the backlight unit; and a liquid crystal panel disposed above the optical films, wherein a protection layer is disposed between the liquid crystal panel and the optical films in order to support the liquid crystal panel when the liquid crystal panel is bended. | 08-27-2009 |
| 20090225259 | ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME - A liquid crystal display comprising a liquid crystal panel that is formed by attaching a color filter substrate to an array substrate with a liquid crystal layer therebetween. The array substrate comprising a base substrate and a pixel electrode, a signal line, and a light-blocking strip, provided on the base substrate. The light-blocking strip is disposed below and at a side of the signal line and is separated from the signal line by the base substrate, a refractive strip is disposed at the side of the signal line over a gap between the light-blocking strip and the signal line, and the refractive strip is disposed on the same layer as the pixel electrode. The refractive strip deflects light transmitting therethrough from the base substrate side into the liquid crystal layer towards the signal line. | 09-10-2009 |
| 20110050672 | TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A TFT-LCD array substrate comprising a transparent substrate and a gate line, a data line, a thin film transistor, a pixel electrode and a passivation layer that are formed on the transparent substrate. The passivation layer includes a first region corresponding to the pixel electrode, a second region corresponding to the gate line and a third region corresponding to the data line, the first region has a first thickness, the second region has the second thickness, and the third region has the third region. The first thickness is smaller than the second thickness, the second thickness is smaller or equal to the third thickness. | 03-03-2011 |
| Patent application number | Description | Published |
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| 20090068572 | GRAY SCALE MASK - A scale mask comprises a U-shaped source mask region, a drain mask region with an end extending into the source mask region, and a U-shaped light-blocking bar arranged between the source mask region and the drain mask region. Slits are formed between the source mask region and the light-blocking bar and between the light-blocking bar and the drain mask region, respectively, and first compensating regions are provided at inner sides of ends of the source mask region. | 03-12-2009 |
| 20090085034 | THIN FILM TRANSISTOR ARRAY SUBSTRATE - The present invention relates to a thin film transistor array substrate comprising a gate line and a data line that are separated by an insulting layer and intersecting each other to define a pixel, wherein a data auxiliary line is disposed adjacent to an intersection portion between the data line and the gate line, and both ends of the data auxiliary line are on two sides of the intersection portion and connected with the data lines, respectively. | 04-02-2009 |
| 20100075450 | METHOD FOR MANUFACTURING ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY - A method for manufacturing an array substrate of liquid crystal display comprising the following steps: providing a substrate having gate lines, a gate insulating layer and an active layer pattern formed thereon in this order; depositing a first transparent conductive layer and a source/drain metal layer in this order on the substrate; forming a photoresist pattern layer on the source/drain metal layer through a triple-tone mask; performing a wet-etching process on the source/drain metal layer and the first transparent conductive layer exposed from the photoresist pattern layer; performing a first ashing process on the photoresist pattern layer and performing a dry-etching process on the source/drain metal layer, the first transparent conductive layer and the active layer pattern exposed by the first ashing process; performing a second ashing process on the photoresist pattern layer and performing a wet-etching process on the source/drain metal layer exposed by the second ashing process; and removing the remaining photoresist pattern layer. According to the invention, the over-etching on the TFT channel region can be reduced and the display quality of the liquid crystal display can be ensured. | 03-25-2010 |
| 20100075451 | METHOD FOR MANUFACTURING A THIN FILM STRUCTURE - The present invention discloses a method for manufacturing thin film structure, which comprises the following steps: providing a substrate having a first recess and a second recess formed therein with the first recess being deeper than the second recess; depositing a first material layer and a second material layer of different thicknesses successively on the substrate; and grinding the substrate so that a flat upper surface is formed and the first material layer and the second material layer are remained in the first recess while only the first material layer is remained in the second recess. The present invention also discloses a method for manufacturing fringe field switching type liquid crystal display array substrate. With the present invention, it is possible to make the upper surface flat while forming patterns on two layers of thin films respectively by using a single mask. | 03-25-2010 |
| 20100230682 | ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - The present invention provides an array substrate comprising: a substrate, having a thin film transistor (TFT) formed thereupon, the TFT having a gate electrode, a source electrode and a drain electrode; a first metal layer, formed on the substrate, and comprising a gate line and the gate electrode of the TFT; a first insulating layer, covering the first metal layer and the substrate; a semiconductor layer, an ohmic contact layer, and a second metal layer, which are sequentially formed on the first insulating layer; a second insulating layer, covering the semiconductor layer, the ohmic contact layer, and the second metal layer; a pixel electrode, provided on the second insulating layer and is connected to the drain electrode. The second metal layer further comprises an etch-blocking pattern in the peripheral area of the pixel electrode within the overlapping region between the pixel electrode and the first metal layer. | 09-16-2010 |
| 20100295049 | TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - The embodiment of the invention provides a manufacturing method for a thin film transistor liquid crystal display (TFT-LCD) array substrate, the manufacturing method comprises: step | 11-25-2010 |
| 20110013130 | FFS TYPE TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A manufacturing method for an FFS type TFT-LCD array substrate comprises: depositing a first metal film on a transparent substrate, and form a gate line, a gate electrode and a common electrode line by a first patterning process; depositing a gate insulating layer, an active layer film and a second metal film sequentially and patterning the second metal film and the active layer film by a second patterning process; Step | 01-20-2011 |
