| Patent application number | Description | Published |
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| 20110284258 | CASING OF ELECTRONIC DEVICE - A casing of an electronic device includes an opening securely covered and remained unused to prevent the opening from being exposed. The casing includes a casing body and a cover plate, and the casing body has an opening and a thermoplastic pillar installed vertically inside the casing body. The thermoplastic pillar is proximate to the opening and includes a fixed portion formed at an end of the thermoplastic pillar. The cover plate is covered onto the casing body to cover the opening and has a positioning hole for passing the thermoplastic pillar, and the positioning hole is smaller than the fixed portion, such that the opening of the casing can be sealed and remained unused for a long time to achieve the effects of preventing internal electronic components from being exposed, maintaining the aesthetic appearance, preventing external pollutants from entering, and extending the lifespan of the electronic device. | 11-24-2011 |
| 20110285900 | CASING OF WEBCAM - A casing of a webcam improves the hand feel of turning a lens ring. A base of the casing includes a sheath hole having a first connection portion, a first ring-shaped flange formed around an upper side of the lens ring, a second connection portion formed between upper and lower sides of the lens ring, and a second ring-shaped flange formed around the lens ring and abutted against an upper side of the sheath hole and a lower side of the first connection portion, and the first and second ring-shaped flanges of the lens ring are separated from the sheath hole by an interval. A flexible ring is clamped between the first and second connection portions and disposed between the first and second ring-shaped flanges, such that the casing can have a greater manufacturing tolerance to reduce manufacturing costs, and provide a better hand feel of turning the lens ring. | 11-24-2011 |
| Patent application number | Description | Published |
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| 20090151637 | MICROWAVE-EXCITED PLASMA SOURCE USING RIDGED WAVE-GUIDE LINE-TYPE MICROWAVE PLASMA REACTOR - A microwave-excited plasma source using a ridged wave-guide line-type microwave plasma reactor is disclosed. The microwave-excited plasma source comprises a reaction chamber, a ridged wave-guide and a separation plate. The ridged wave-guide is disposed on the reaction chamber, and comprises a frame portion, a ridge portion and a line-shaped slot. The line-shaped slot is disposed on a first side of the frame portion, and the ridge portion facing the line-shaped slot is disposed on a second side of the frame portion. The separation plate is disposed on the line-shaped slot. Moreover, the ridged wave-guide is suitable for concentrating microwave power, which is transmitted to the reaction chamber through the line-shaped slot in order to excite plasma. | 06-18-2009 |
| 20100141147 | CAPACITIVELY COUPLED PLASMA (CCP) GENERATOR WITH TWO INPUT PORTS - A capacitively coupled plasma (CCP) generator with two input ports, which is especially used as a large-area capacitively coupled plasma (CCP) generator. In the inventive CCP generator, only a RF power supply is required to provide the two input ports with RF power. The input impedance at each of the input ports is adjustable so that the standing wave between two rectangular electrodes can be eliminated to achieve plasma uniformity. | 06-10-2010 |
| 20100164381 | LONG LINEAR-TYPE MICROWAVE PLASMA SOURCE USING VARIABLY-REDUCED-HEIGHT RECTANGULAR WAVEGUIDE AS PLASMA REACTOR - A long linear-type microwave plasma source using a variably-reduced-height rectangular waveguide as the plasma reactor has been developed. Microwave power is fed from the both sides of the waveguide and is coupled into plasma through a long slot cut on the broad side of the waveguide. The reduced height of the waveguide is variable in order to control the coupling between microwave and plasma so that the plasma uniformity can remain a high quality when extending the length of the linear-type plasma source. | 07-01-2010 |
| 20110195186 | PLANE-TYPE FILM CONTINUOUS EVAPORATION SOURCE AND THE MANUFACTURING METHOD AND SYSTEM USING THE SAME - A manufacturing method and system using a plane-type film continuous evaporation source are disclosed, in which the manufacturing method comprises the steps of: providing a plane-type film continuous evaporation source, being a substrate having at least one evaporation material coated on a surface thereof while distributing the at least one evaporation material in a specific area of the substrate capable of covering all the plates to be processed by the evaporated evaporation material; arranging a heater inside the specific area to be used for enabling the at least one evaporation material to evaporate and thus spreading toward the processed plates. Thereby, the evaporated evaporation material can be controlled at the molecular/atomic level for enabling the same to form a film according to surface-nucleation, condensation and growth with superior evenness, nano-scale adjustability, specialized structure and function that can not be achieve by the films from conventional spray coating means. | 08-11-2011 |
