| Patent application number | Description | Published |
|---|
| 20090022981 | LAMINATED FILM HAVING GAS BARRIER CHARACTERISTICS - Provided is a laminated film which exhibits high gas barrier performance immediately after the production and has excellent adhesive strength between constitutional layers, while maintaining the excellent gas barrier performance. The laminated film has at least one constitutional unit layer on an inorganic thin film formed at least on one surface of a base film. The constitutional unit layer is composed of an anchor coat layer having a thickness of 0.1 to 10 nm and an inorganic thin film formed on the anchor coat layer. A method for producing the laminated film is also provided. | 01-22-2009 |
| 20090214854 | GAS BARRIER MULTILAYER FILM - Provided is a film which can be industrially coated easily and exhibits excellent gas barrier performance without being subjected to a high-temperature heat treatment. The film exhibits good gas barrier performance immediately after the production, and maintains the excellent gas barrier performance while exhibiting excellent hot water resistance and printing resistance. More specifically, provided are: a gas barrier laminated film including a resin layer on an inorganic thin film formed on at least one surface of a support film, the resin layer being formed by applying: (1) an aqueous dispersion containing polyvinyl alcohol (a), an ethylene-unsaturated carboxylic acid copolymer (b), and inorganic particles (c); (2) an aqueous dispersion containing an ethylene-unsaturated carboxylic acid copolymer (b), inorganic particles (c), and/or a cross-linking agent (d); or (3) an aqueous dispersion containing polyvinyl alcohol (a), an ethylene-unsaturated carboxylic acid copolymer (b), inorganic particles (c), and a cross-linking agent (d), to the inorganic thin film surface; and a method of producing the gas barrier laminated film. | 08-27-2009 |
| 20090274894 | GAS BARRIER LAMINATE - There is provided a gas-barrier laminate composed of a base film and an inorganic thin film layer formed on the base film which considerably enhanced in gas-barrier property and gelbo flex resistance. The present invention relates to a gas-barrier laminate comprising a base film containing at least one compound selected from the group consisting of polyvinyl alcohol and an ethylene-vinyl alcohol copolymer, and an anchor coat layer and an inorganic thin film layer successively formed on one surface of the base film in this order, wherein the base film is in the form of a biaxially stretched film having a variation in thickness of 3.5 μm or less and a crystallinity of 30% or more. | 11-05-2009 |
| 20110045301 | GAS BARRIER FILM HAVING EXCELLENT WEATHER RESISTANCE - Provided is a weather-resistant gas barrier film capable of keeping a high delamination strength and an excellent gas barrier property in a high-temperature high-humidity environment and in a UV radiation environment. | 02-24-2011 |
| 20110086220 | GAS BARRIER LAMINATED FILM FOR ORGANIC DEVICES | 04-14-2011 |
| 20110220169 | SOLAR CELL BACKSHEET - Provided is a back sheet for a solar battery which holds an excellent gas barriering property and which is excellent in a weatherability and a light shielding property. | 09-15-2011 |
| 20110223419 | SOLAR CELL BACKSHEET - Provided is a back sheet for a solar battery which holds an excellent gas barriering property and which is excellent in a weatherability and a light shielding property. | 09-15-2011 |
| 20120003500 | PROCESS FOR PRODUCING MULTILAYERED GAS-BARRIER FILM - Provided are a method for producing a film, which is satisfactory in productivity, exhibits high gas-barrier property immediately after production, and has excellent adhesive strength between constituent layers while maintaining the excellent gas-barrier property, and a gas-barrier film, which is obtained by the method. The method for producing a gas-barrier film includes the steps of; (1) forming an inorganic thin film by a vacuum deposition method on at least one surface of a base film; (2) forming a thin film by a plasma CVD method on the inorganic thin film formed in the step (1); and (3) forming an inorganic thin film by the vacuum deposition method on the thin film formed in the step (2), in which each of the steps (1) and (3), and the step (2) are sequentially carried out at a pressure of 1×10 | 01-05-2012 |
