Chih-Fu

Chih-Fu Chang, Neipu Township TW

Patent application number	Description	Published
20100009506	DOPANT IMPLANTATION METHOD AND INTEGRATED CIRCUITS FORMED THEREBY - A method of forming a dopant implant region in a MOS transistor device having a dopant profile having a target dopant concentration includes implanting a first concentration of dopants into a region of a substrate, where the first concentration of dopants is less than the target dopant concentration, and without annealing the substrate after the implanting step, performing at least one second implanting step to implant at least one second concentration of dopants into the region of the substrate to bring the dopant concentration in the region to the target dopant concentration.	01-14-2010

Patent application number	Description	Published
20100039587	Color liquid crystal display with backlight - A color liquid-crystal display panel has a red filter segment in each red sub-pixel and a blue filter segment in each blue sub-pixel, but no green filter segment in green sub-pixels. The liquid-crystal display panel has a backlight source for illuminating, and the backlight source has green light producing components alternately switched on and off in consecutive frames. The backlight source also has white or red/blue, or purple light emitting components alternately switched on and off in consecutive frames in complementary phase to the green light producing components. When the liquid crystal layer segments associated with all the three color sub-pixels are operated in a light non-blocking state, only the white or red/blue light producing components are turned on, and when the liquid crystal layer segments associated with the red sub-pixels are operated in a light blocking state, only the green light producing components are turned on.	02-18-2010

Patent application number	Description	Published
20090239010	PHOTOMASK STORAGE APPARATUS - A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component.	09-24-2009