| Patent application number | Description | Published |
|---|
| 20090213389 | WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result. | 08-27-2009 |
| 20090268188 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member. | 10-29-2009 |
| 20090290136 | MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD - A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, wherein Lg=m·Pg | 11-26-2009 |
| 20100177323 | WAVEFRONT-ABERRATION-MEASURING DEVICE AND EXPOSURE APPARATUS - A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than λ/2NA, where λ denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the image plane. | 07-15-2010 |
| 20100190115 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS HAVING THE SAME, AND DEVICE MANUFACTURING METHOD - A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg | 07-29-2010 |
| 20100235137 | ABSOLUTE POSITION MEASUREMENT APPARATUS AND METHOD - An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured. | 09-16-2010 |
| 20100271636 | TALBOT INTERFEROMETER, ITS ADJUSTMENT METHOD, AND MEASUREMENT METHOD - A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit. | 10-28-2010 |
| 20100290590 | X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM - An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image. | 11-18-2010 |
