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Cheng Yang
Cheng Yang, Shanghai CN
| Patent application number | Description | Published |
|---|---|---|
| 20110042732 | METHOD AND SYSTEM FOR CONTINUOUS LINE-TYPE LANDING POLYSILICON CONTACT (LPC) STRUCTURES - A method for making contact landing pad structures in a semiconductor integrated circuit device. The method includes forming an isolation region and forming active regions in the semiconductor substrate. The active regions are separated by the isolation region, and each of the active regions includes one or more contact regions. The method includes forming a raised structure between a first and second contact regions. The raised structure overlying the isolation region. The method includes depositing a cap layer and forming an interlayer dielectric layer overlying the cap layer. The method uses a mask pattern to selectively remove a portion of the photoresist layer to form a line type opening, which exposes a portion of the interlayer dielectric layer overlying at least the first and second contact regions. The method deposits a conductive fill material and performs a planarization process, whereby a plurality of conductive landing contact pads are formed. | 02-24-2011 |
Cheng Yang, Nanjing CN
| Patent application number | Description | Published |
|---|---|---|
| 20100250135 | Method and Device for Determining Proximity of a Social Network Service Acquaintance - A method and device enables an efficient determination of a proximity of a social network service acquaintance. The method includes transmitting an inquiry message from the electronic device during a device proximity discovery process (step | 09-30-2010 |
Cheng Yang, Longtan Township TW
| Patent application number | Description | Published |
|---|---|---|
| 20100230873 | Apparatus for Continuously Manufacturing Stoichiometric Mg2Ni Hydrogen Storage Compound - The present invention provides an apparatus for manufacturing stoichiometric Mg | 09-16-2010 |
Cheng Yang, Hsinchu TW
| Patent application number | Description | Published |
|---|---|---|
| 20100178610 | Metallocenyl Phthalocyanine Compounds and Use Thereof - This invention relates to a novel metallocenyl phthalocyanine compound represented by the following general formula (I), in which at least one of the four benzene rings of phthalocyanine is connected with the organometallic complex group through a linker having one carbon atom. This invention also relates to the use of the phthalocyanine compounds in optical recording media. | 07-15-2010 |
Cheng Yang, Pittsford, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20090081374 | ORGANOSILOXANE MATERIALS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS - An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organosiloxane compound; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material. | 03-26-2009 |
| 20090081827 | PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS - An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organic compound or polymer; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. An inorganic thin film material is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material. | 03-26-2009 |
| 20090130608 | PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE - An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the deposition inhibitor material comprises an organosiloxane compound; and patterning the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material. | 05-21-2009 |
| 20090130609 | Colored mask combined with selective area deposition - The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material. | 05-21-2009 |
| 20100075247 | METHOD AND PREPARATION OF CHEMICALLY PREPARED TONERS - A method of making polymeric particles having a controlled size and size distribution, and in particular a method for the preparation of chemically prepared toners, via evaporative limited coalescence process, wherein basic silicate salts are employed to remove particulate stabilizer from precipitated polymer particles. The process includes the steps of dispersing polymeric binder materials and optional additives in an organic solvent to form an organic phase. The organic phase is dispersed by high shear agitation in an aqueous phase containing a particulate stabilizer, e.g. colloidal silica, to form a dispersion of small droplets of the organic phase in the aqueous phase. The dispersion is homogenized and the organic solvent is removed from the dispersed particles in the dispersion by evaporation, and polymeric particles are precipitated with particulate stabilizer on the surface thereof, which are then recovered, treated with a basic silicate salt to remove particulate stabilizer, and washed and dried. | 03-25-2010 |
Cheng Yang, Hong Kong CN
| Patent application number | Description | Published |
|---|---|---|
| 20090294153 | Printing using a structure coated with ultraviolet radiation responsive material - Wetting and print transfer from a printing patterned transfer surface is enhanced by applying an ultraviolet radiation responsive material to the patterned transfer surface. Ultraviolet activation of the ultraviolet responsive coating is performed during a transfer of printing material to a substrate. The technique increases precision of the printing process and is useful for transfer of printing material to a substrate in order to establish printed circuit components such as circuit traces and printed circuit elements on the substrate. In a particular configuration the ultraviolet radiation responsive material can be made of azobenzene material or free radical initiators. | 12-03-2009 |
| 20090294734 | Percolation Efficiency of the conductivity of electrically conductive adhesives - An electroconductive bonding material is formed as a Modified Electrically Conductive Adhesive (MECA), and consists of a resin matrix and a modified conductive filler. The resin matrix if formed by providing a thermosetting or thermoplastic resin-based polymer resin. The conductive filler is a metal filler material suitable for use as conductive filler for the resin matrix. The metal filler is modified by applying a material selected from one of halogens, pseudohalogens or their precursors. | 12-03-2009 |
Cheng Yang, Kowloon HK
| Patent application number | Description | Published |
|---|---|---|
| 20080233298 | Methods of fabric treatment - A method is described for treating fabrics, yarns and individual fibers to improve the mechanical properties thereof, for example their wrinkle-resistance, by treating the fabric, yarn, and fibers in a solution containing polymer nanoparticles. The nanoparticles include two sizes of particles and an appropriate selection of the nanoparticles to control the degree and mode of cross-linking in the fabric with corresponding control of the mechanical properties. The nanoparticles can be provided with an electrical charge that can be opposite in sign to any charge carried by the fabric in order to enhance the formation of a polymer film on the fabric. | 09-25-2008 |
Cheng Yang, Carlsbad, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110112587 | INSTRUMENT FOR INSERTION AND DEPLOYMENT OF FEATURES ON AN IMPLANT - A surgical instrument for inserting an implant includes a first shaft having an axial bore and including a distal end configured to actuate a first feature of a spinal implant and a second shaft extending through the axial bore of the first shaft and including a distal end configured to actuate a second feature of the spinal implant. Rotation of the first shaft in a first direction actuates the first feature and causes rotation of the second shaft in a second direction to actuate the second feature. | 05-12-2011 |