Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Cheng-Hung Yu

Cheng-Hung Yu, Taoyuan County TW

Patent application numberDescriptionPublished
20090250247CIRCUIT BOARD AND MANUFACTURING METHOD THEREOF - A circuit board including a first dielectric layer having a first surface and a second surface, a first circuit layer, a second dielectric layer, and a second circuit layer is provided. At least one trench is formed on the first surface, and the first circuit layer is formed on an inside wall of the trench. In addition, the second dielectric layer is disposed in the trench, and covers the first circuit layer. The second circuit layer is disposed in the trench, and the second dielectric layer is located between the first circuit layer and the second circuit layer. A manufacturing method of the circuit board is further provided.10-08-2009
20090294888METHOD FOR FABRICATING AN IMAGE SENSOR - A method for fabricating an image sensor is disclosed. First, a semiconductor substrate is provided, in which a photosensitive region is defined on the semiconductor substrate. At least one photosensitive material is then formed on the semiconductor substrate, and a first exposure process is performed to form a tapered pattern in the photosensitive material. A second exposure process is performed to form a straight foot pattern in the photosensitive material, and a developing process is performed to remove the tapered pattern and straight foot pattern to form the photosensitive material into a plurality of photosensitive blocks. A reflow process is conducted thereafter to form the photosensitive blocks into a plurality of microlenses.12-03-2009
20090321862IMAGE SENSOR AND FABRICATING METHOD THEREOF - A method for fabricating an image sensor, which includes the following steps, is provided. A semiconductor substrate including a sensor array, a pad and a passivation layer is provided, and the passivation layer covers the sensor array and the pad. An opening, which comprises tapered sidewalls not perpendicular to a bared surface of the pad, is formed in the semiconductor substrate to expose the pad. An under layer is formed on the semiconductor substrate, and covers the pad and the passivation layer. A color filter array is formed on the under layer and over the corresponding sensor array. A planar layer is formed on the color filter array. A portion of the under layer is removed to expose the pad. A plurality of U-lenses is formed on the planar layer.12-31-2009
20100000086METHOD OF MAKING A MOLDED INTERCONNECT DEVICE - The present invention provides a method of making a molded interconnect device. The method includes the steps of: injection molding a plastic body having thereon at least one patterned circuit trench structure; and filling a conductive material into the patterned circuit trench structure thereby forming a circuit trace on the plastic body.01-07-2010
20100089627MULTILAYER THREE-DIMENSIONAL CIRCUIT STRUCTURE AND MANUFACTURING METHOD THEREOF - A multilayer three-dimensional circuit structure and a manufacturing method thereof are provided in the present invention. The manufacturing method includes following steps. First, a three-dimensional insulating structure is provided. A first three-dimensional circuit structure is then formed on a surface of the three-dimensional insulating structure. Next, an insulating layer covering the first three-dimensional circuit structure is formed. Thereafter, a second three-dimensional circuit structure is formed on the insulating layer. Subsequently, at least a conductive via penetrating the insulating layer is formed for electrically connecting the second three-dimensional circuit structure and the first three-dimensional circuit structure.04-15-2010
20110057277Image sensor structure and fabricating method therefor - An image sensor structure and a method for making the image sensor structure, for avoiding or mitigating lens shading effect. The image sensor structure includes a substrate, a sensor array disposed at the surface of the substrate, a dielectric layer covering the sensor array, wherein the dielectric layer includes a top surface having a dishing structure, an under layer filled into the dishing structure and having a refraction index greater than that of the dielectric layer, a filter array disposed on the under layer corresponding to the sensor array, and a microlens array disposed above the filter array. A top layer may be additionally disposed to cover the filter array and the microlens array is disposed on the top layer.03-10-2011
20110139188WAFER CLEANING DEVCIE AND METHOD THEREOF - A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.06-16-2011
20110253435MULTILAYER THREE-DIMENSIONAL CIRCUIT STRUCTURE - A multilayer three-dimensional circuit structure and a manufacturing method thereof are provided in the present invention. The manufacturing method includes following steps. First, a three-dimensional insulating structure is provided. A first three-dimensional circuit structure is then formed on a surface of the three-dimensional insulating structure. Next, an insulating layer covering the first three-dimensional circuit structure is formed. Thereafter, a second three-dimensional circuit structure is formed on the insulating layer. Subsequently, at least a conductive via penetrating the insulating layer is formed for electrically connecting the second three-dimensional circuit structure and the first three-dimensional circuit structure.10-20-2011
20120261731IMAGE SENSOR - An image sensor is disclosed. The image sensor includes a substrate, at least a color filter, and a microlens disposed on the color filter. The substrate includes a passivation layer thereon, and the color filter is disposed on the passivation layer, in which the color filter is truncated.10-18-2012

Patent applications by Cheng-Hung Yu, Taoyuan County TW

Cheng-Hung Yu, Taoyuan TW

Patent application numberDescriptionPublished
20110212567METHOD OF FABRICATING IMAGE SENSOR AND REWORKING METHOD THEREOF - A method of fabricating an image sensor device is provided. First, a substrate comprising a pixel array region and a pad region is provided. A patterned metal layer and a first planarization layer having an opening exposing the patterned metal layer in the pad region are sequentially formed on the substrate. A color filter array is formed on the first planarization layer in the pixel array region. A second planarization layer is formed to cover the color filter array and filled into the opening. A plurality of microlens is formed above the color filter array on the second planarization layer. A capping layer is conformally formed on the microlens and the second planarization layer. An etching step is performed to remove the capping layer and the second planarization layer in the opening so as to expose the patterned metal layer in the pad region.09-01-2011

Cheng-Hung Yu, Kaohsiung City TW

Patent application numberDescriptionPublished
20090124037METHOD OF PREVENTING COLOR STRIATION IN FABRICATING PROCESS OF IMAGE SENSOR AND FABRICATING PROCESS OF IMAGE SENSOR - A fabricating process of an image sensor is provided. A substrate having thereon a circuit of the image sensor and an insulating layer is provided, wherein the insulating layer has therein a pad opening exposing a metal pad of the circuit. A filling layer is formed in the pad opening, and a color filter array is formed over the insulating layer. A planarization layer is formed over the substrate covering the color filter array, and a microlens array is formed on the planarization layer. The filling layer is then removed.05-14-2009

Cheng-Hung Yu, Kao-Hsiung City TW

Patent application numberDescriptionPublished
20080299498METHOD FOR MANUFACTURING MICRO-LENSES OF IMAGE SENSORS - A method for manufacturing micro-lenses of image sensors includes providing a semiconductor substrate having at least a planarization layer, performing a first photolithography process to form a first set of micro-lens blocks on the planarization layer, performing a first baking process to form a first set of micro-lenses, performing a first surface treatment to harden surfaces of the first set of micro-lenses, performing a second photolithography to form a second set of micro-lens blocks on the planarization layer, and performing a second baking process to form a second set of micro-lenses.12-04-2008

Cheng-Hung Yu, Taipei County TW

Patent application numberDescriptionPublished
20120038261HEAT-DISSIPATING STRUCTURE AND LIGHTING MODULE HAVING THE SAME - A heat-dissipating structure of lighting includes a main body having a plurality of side surfaces; at least one heat pipe connecting to the main body, wherein each heat pipe has a hot end embedded in the main body and a cold end having a contacting surface; and at least one external heat sink mating to the contacting surface. The instant disclosure also provides a lighting module having said heat-dissipating structure.02-16-2012

Cheng-Hung Yu, Longtan Township TW

Patent application numberDescriptionPublished
20130010165OPTICAL MICRO STRUCTURE, METHOD FOR FABRICATING THE SAME AND APPLICATIONS THEREOF - An image sensor comprises a plurality of color filtering elements, a plurality of lenses and an image sensing device, wherein the lenses are correspondingly formed over the color filtering elements, and the image sensing device having a sensing area engaged with the color filtering elements.01-10-2013