Patent application number | Description | Published |
20100079906 | Adaptive Feed Forward Rotational Vibration Compensation During a SEEK Operation - A disk drive assembly includes a disk drive, one or more accelerometers, a control circuit, and an adaptive feed forward circuit. The one or more accelerometers generate acceleration signals that are used to detect rotational vibration (RV) events on the disk drive. The control circuit is configured to: generate one or more control signals, which are based on a control signal from a host system and a compensation signal from the adaptive feed forward circuit, and generate a position error signal (PES) that indicates an error in a position of a disk drive head relative to a center of a track. The adaptive feed forward circuit generates the compensation signal, which compensates for the detected RV events based on the acceleration signals and the PES. The compensation signal accounts for self-induced RV events generated by a SEEK operation that repositions the head to a new track, wherein feed forward adaption is not disturbed by the SEEK operation. | 04-01-2010 |
20100095773 | Host System and Method for Determining an Attitude of a Device Undergoing Dynamic Acceleration - A system and a method for determining an attitude of a device undergoing dynamic acceleration is presented. A first attitude measurement is calculated based on a magnetic field measurement received from a magnetometer of the device and a first acceleration measurement received from a first accelerometer of the device. A second attitude measurement is calculated based on the magnetic field measurement received from the magnetometer of the device and a second acceleration measurement received from a second accelerometer of the device. A correction factor is calculated based at least in part on a difference of the first attitude measurement and the second attitude measurement. The correction factor is then applied to the first attitude measurement to produce a corrected attitude measurement for the device. | 04-22-2010 |
20100097316 | System and Method for Determining an Attitude of a Device Undergoing Dynamic Acceleration - A system and a method for determining an attitude of a device undergoing dynamic acceleration is presented. A first attitude measurement is calculated based on a magnetic field measurement received from a magnetometer of the device and a first acceleration measurement received from a first accelerometer of the device. A second attitude measurement is calculated based on the magnetic field measurement received from the magnetometer of the device and a second acceleration measurement received from a second accelerometer of the device. A correction factor is calculated based at least in part on a difference of the first attitude measurement and the second attitude measurement. The correction factor is then applied to the first attitude measurement to produce a corrected attitude measurement for the device. | 04-22-2010 |
20100174506 | System and Method for Determining an Attitude of a Device Undergoing Dynamic Acceleration Using a Kalman Filter - A system, a computer readable storage medium including instructions, and a method for determining an attitude of a device undergoing dynamic acceleration. A difference between a first accelerometer measurement received from a first multi-dimensional accelerometer of the device and a second accelerometer measurement received from a second multi-dimensional accelerometer of the device is calculated. A Kalman gain is adjusted based on the difference, wherein the Kalman gain is used in a Kalman filter that determines the attitude of the device. An attitude of the device is determined using the Kalman filter based at least in part on the Kalman gain, the first accelerometer measurement, the second accelerometer measurement, and a magnetic field measurement received from a multi-dimensional magnetometer of the device. | 07-08-2010 |
20110093130 | Power management - Communicating a power control feedback signal from a system is disclosed. In some embodiments, upon determining how to control input power which may be based at least in part, for example, on an in situ measurement of an operating condition in an operating environment, an appropriate symbol is constructed based upon the determination and is transmitted on a single line. In some embodiments, the single line corresponds to the reference voltage of an associated power supply. | 04-21-2011 |
20110163947 | Rolling Gesture Detection Using a Multi-Dimensional Pointing Device - A system and a method for performing a rolling gesture using a multi-dimensional pointing device. An initiation of a gesture by a user of the multi-dimensional pointing device is detected. A rolling gesture metric corresponding to performance of a rolling gesture comprising rotation of the multi-dimensional pointing device about a longitudinal axis of the multi-dimensional pointing device is determined. Information corresponding the rolling gesture metric is conveyed to a client computer system, wherein the client computer system is configured to manipulate an object in a user interface of the client computer system in accordance with the rolling gesture metric. | 07-07-2011 |
20120086725 | System and Method for Compensating for Drift in a Display of a User Interface State - A system, a computer readable storage medium including instructions, and a method for adjusting a displayed user interface in accordance with a navigational state of a human interface device. For each measurement epoch, a base set of operations are performed, including: determining an unmodified user interface state in accordance with the navigational state, and generating current user interface data. When an error introducing state is detected, additional operations are performed, including: determining a modified user interface state; adjusting the current user interface data in accordance with the modified user interface state; and determining a user interface state error. When an error compensating state is detected, additional operations are performed, including: determining a compensation adjustment and adjusting the current user interface data and user interface state error in accordance with the compensation adjustment. The current user interface data enables a current user interface to be displayed. | 04-12-2012 |
20120169482 | System and Method for Selecting a Device for Remote Control Based on Determined Navigational State of a Remote Control Device - A computer system having one or more processors and memory receives data corresponding to a device-selection command performed at a remote control, where the remote control is configured to provide remote-control commands to a plurality of devices. In response to receiving the data corresponding to the device-selection command, the computer system selects one of the devices as a selected device in accordance with information indicating that the remote control was pointed at a proxy for the selected device at the time that the device-selection command was performed at the remote control, where the proxy for the selected device is at a different location than the selected device. The computer system also generates a respective remote-control command for the selected device, where the respective remote-control command will, when received by the selected device, cause the selected device to perform a predefined operation that corresponds to the respective remote-control command. | 07-05-2012 |
20130179108 | System and Method for Calibrating Sensors for Different Operating Environments - A computer system stores calibration information corresponding to respective sets of sensor measurements associated with respective operating environments. After storing, in a first data structure, calibration information for a first operating environment, the system determines a current operating environment of the device. When the current operating environment of the device is consistent with the first operating environment and that the calibration information for the first operating environment meets predefined measurement diversity criteria, the system calibrates at least one sensor for the first operating environment using the stored calibration information for the first operating environment. When the current operating environment of the device is inconsistent with the first operating environment, the system excludes the stored calibration information for the first operating environment when calibrating one or more sensors for the current operating environment. | 07-11-2013 |
20130253821 | System and Method for Determining a Uniform External Magnetic Field - A processing apparatus, optionally integrated into a device having a plurality of sensors including a magnetometer, generates navigational state estimates for the device. The processing apparatus has a magnetometer-assisted mode of operation in which measurements from the magnetometer are used to estimate the navigational state and an alternate mode of operation in which the navigational state of the device is estimated without measurements from the magnetometer. For a respective time period, the processing apparatus operates in the alternate mode of operation. During the respective time period, the processing apparatus collects a plurality of magnetometer measurements and determines whether they meet measurement-consistency requirements. If the measurements meet the measurement-consistency requirements, the processing apparatus transitions to the magnetometer-assisted mode of operation. If the measurements do not meet the measurement-consistency requirements, the processing apparatus continues to operate in the alternate mode of operation. | 09-26-2013 |
20130253880 | Managing Power Consumption of a Device with a Gyroscope - A processing apparatus having one or more processors and memory generates navigational state estimates for a device having a gyroscope. The processing apparatus has a gyroscope-assisted mode of operation in which measurements from the gyroscope are used to estimate the navigational states and an alternate mode of operation in which measurements from other sensors are used to estimate the navigational state of the device. For a first time period and a subsequent transition time period, the processing apparatus estimates the navigational state of the device without sensor measurements from the gyroscope. At an end of the transition time period, the processing apparatus starts to use measurements from the gyroscope to estimate the navigational state of the device. For a second time period, after the transition time period, the processing apparatus estimates the navigational state of the device using sensor measurements from the gyroscope. | 09-26-2013 |
20140055351 | Rolling Gesture Detection Using an Electronic Device - An electronic device with one or more processors and memory detects a button press of a respective button of a plurality of buttons that include a first button that corresponds to a first type of operation and a second button that corresponds to a second type of operation. The device determines, in conjunction with detecting the button press, a rolling gesture metric corresponding to performance of a rolling gesture comprising rotation about a longitudinal axis of the electronic device. After determining the rolling gesture metric, when the respective button is the first button, the device initiates performance, in a respective user interface, of an operation of the first type in accordance with the rolling gesture metric and when the respective button is the second button, the device initiates performance, in the respective user interface, of an operation of the second type in accordance with the rolling gesture metric. | 02-27-2014 |
20140139432 | System and Method for Determining an Attitude of a Device Undergoing Dynamic Acceleration - A system and a method for determining an attitude of a device undergoing dynamic acceleration is presented. A first attitude measurement is calculated based on a magnetic field measurement received from a magnetometer of the device and a first acceleration measurement received from a first accelerometer of the device. A second attitude measurement is calculated based on the magnetic field measurement received from the magnetometer of the device and a second acceleration measurement received from a second accelerometer of the device. A correction factor is calculated based at least in part on a difference of the first attitude measurement and the second attitude measurement. The correction factor is then applied to the first attitude measurement to produce a corrected attitude measurement for the device. | 05-22-2014 |
20140149060 | Combining Monitoring Sensor Measurements and System Signals to Determine Device Context - A processing apparatus including one or more processors and memory obtains one or more sensor measurements generated by one or more monitoring sensors of one or more devices, including one or more monitoring sensor measurements from a respective monitoring sensor of a respective device and obtains one or more system signals including a respective system signal corresponding to current operation of the respective device. The processing apparatus determines device context information for the respective device based on the one or more sensor measurements and the one or more system signals and adjusts operation of the device in accordance with the device context information. | 05-29-2014 |
Patent application number | Description | Published |
20120208306 | METHOD FOR ENCAPSULATING AN ORGANIC LIGHT EMITTING DIODE - Methods for encapsulating OLED structures disposed on a substrate using a soft/polymer mask technique are provided. The soft/polymer mask technique can efficiently provide a simple and low cost OLED encapsulation method, as compared to convention hard mask patterning techniques. The soft/polymer mask technique can utilize a single polymer mask to complete the entire encapsulation process with low cost and without alignment issues present when using conventional metal masks. Rather than utilizing a soft/polymer mask, the encapsulation layers may be blanked deposited and then laser ablated such that no masks are utilized during the encapsulation process. | 08-16-2012 |
20130005081 | METHOD OF IGZO AND ZNO TFT FABRICATION WITH PECVD SiO2 PASSIVATION - The present invention generally relates to a method of manufacturing a TFT. The TFT has an active channel that comprises IGZO or zinc oxide. After the source and drain electrodes are formed, but before the passivation layers or etch stop layers are deposited thereover, the active channel is exposed to an N | 01-03-2013 |
20130210199 | METHOD FOR DEPOSITING AN ENCAPSULATING FILM - A method and apparatus for depositing a material layer, such as encapsulating film, onto a substrate is described. In one embodiment, an encapsulating film formation method includes delivering a gas mixture into a processing chamber, the gas mixture comprising a silicone-containing gas, a first nitrogen-containing gas, a second nitrogen-containing gas and hydrogen gas; energizing the gas mixture within the processing chamber by applying between about 0.350 watts/cm | 08-15-2013 |
20140024180 | INTERFACE ADHESION IMPROVEMENT METHOD - Embodiments of the invention provide methods of an interface adhesion improvement methods used on a transparent substrate for OLED or thin film transistor applications. In one embodiment, a method of forming a buffer layer on a surface of a substrate includes providing a substrate having an planarization material disposed thereon in a processing chamber, supplying a buffer layer gas mixture including a silicon containing gas into the processing chamber, controlling a substrate temperature less than about 100 degrees Celsius, forming a buffer layer on the planarization material, supplying an encapsulating barrier layer deposition gas mixture including a silicon containing gas and a nitrogen containing gas into the processing chamber, and forming an encapsulating barrier layer on the buffer layer. | 01-23-2014 |
20140065739 | METHOD FOR HYBRID ENCAPSULATION OF AN ORGANIC LIGHT EMITTING DIODE - Methods and apparatus for encapsulating organic light emitting diode (OLED) structures disposed on a substrate using a hybrid layer of material are provided. The encapsulation methods may be performed as single or multiple chamber processes. The processing parameters used during deposition of the hybrid layer of material allow control of the characteristics of the deposited hybrid layer. The hybrid layer may be deposited such that the layer has characteristics of an inorganic material in some sublayers of the hybrid layer and characteristics of an organic material in other sublayers of the hybrid layer. Use of the hybrid material allows OLED encapsulation using a single hard mask for the complete encapsulating process with low cost and without alignment issues present in conventional processes. | 03-06-2014 |
20140174361 | HEATED BACKING PLATE - The present invention generally relates to a heated backing plate coupled to a gas distribution showerhead in a PECVD chamber. The backing plate is heated by circulating a heating fluid either through channels formed within the backing plate or a tube coupled to the backing plate. A heated backing plate heats up the gas distribution showerhead, which improves the cleaning rate of the PECVD chamber that performs low temperature processes. | 06-26-2014 |
20140246521 | SHOWERHEAD SUPPORT STRUCTURE FOR IMPROVED GAS FLOW - Embodiments of the present invention generally provide apparatus and methods for supporting a gas distribution showerhead in a processing chamber. In one embodiment, a gas distribution showerhead for a vacuum chamber is provided. The gas distribution showerhead comprises a body having a first side and a second side opposite the first side, and a plurality of gas passages formed through the body, the gas passages comprising a first bore formed in the first side that is fluidly coupled to a second bore formed in the second side by a restricting orifice, and a suspension feature formed in the first bore of at least one of the gas passages. | 09-04-2014 |
20140246655 | FLUORINE-CONTAINING PLASMA POLYMERIZED HMDSO FOR OLED THIN FILM ENCAPSULATION - Methods for forming an OLED device are described. An encapsulation structure having organic buffer layer sandwiched between barrier layers is deposited over an OLED structure. The buffer layer is formed with a fluorine-containing plasma. The second barrier layer is then deposited over the buffer layer. Additionally, to ensure good adhesion, a buffer adhesion layer is formed between the buffer layer and the first barrier layer. Finally, to ensure good transmittance, a stress reduction layer is deposited between the buffer layer and the second barrier layer. | 09-04-2014 |
20140256070 | PLASMA CURING OF PECVD HMDSO FILM FOR OLED APPLICATIONS - Methods for forming an OLED device are described. An encapsulation layer having a buffer layer sandwiched between barrier layers is deposited over an OLED structure. The buffer layer is deposited on the first barrier layer and is cured with a fluorine-containing plasma at a temperature less than 100 degrees Celsius. The second barrier layer is then deposited on the buffer layer. | 09-11-2014 |
20140299859 | METHOD FOR HYBRID ENCAPSULATION OF AN ORGANIC LIGHT EMITTING DIODE - Methods and apparatus for encapsulating organic light emitting diode (OLED) structures disposed on a substrate using a hybrid layer of material are provided. The processing parameters used during deposition of the hybrid layer of material allow control of the characteristics of the deposited hybrid layer. The hybrid layer may be deposited such that the layer has characteristics of an inorganic material in some sublayers of the hybrid layer and characteristics of an organic material in other sublayers of the hybrid layer. Use of the hybrid material allows OLED encapsulation using a single hard mask for the complete encapsulating process with low cost and without alignment issues present in conventional processes. | 10-09-2014 |
20140349422 | METHOD FOR HYBRID ENCAPSULATION OF AN ORGANIC LIGHT EMITTING DIODE - Methods and apparatus for encapsulating organic light emitting diode (OLED) structures disposed on a substrate using a hybrid layer of material are provided. The processing parameters used during deposition of the hybrid layer of material allow control of the characteristics of the deposited hybrid layer. The hybrid layer may be deposited such that the layer has characteristics of an inorganic material in some sublayers of the hybrid layer and characteristics of an organic material in other sublayers of the hybrid layer. Use of the hybrid material allows OLED encapsulation using a single hard mask for the complete encapsulating process with low cost and without alignment issues present in conventional processes. | 11-27-2014 |
Patent application number | Description | Published |
20090031896 | Air filtration in computer systems - In one embodiment an electronic device comprises a housing defining a chamber, a circuit board positioned in the chamber and comprising at least one integrated circuit, an air inlet port and an air outlet port formed in the housing, a fluid flow generator to generate an air flow across the circuit board in the chamber, and an electrostatic air filtration system to filter air entering the chamber from the air inlet port. | 02-05-2009 |
20090035608 | INTERSECTING BATTERY CAVITIES - A system comprising a first battery cavity and a second battery cavity adjacent to the first battery cavity. Both of the first and second battery cavities are oriented in a common direction. The system also comprises a third battery cavity which comprises at least part of the first battery cavity and at least part of the second battery cavity. The third battery cavity is oriented in a different direction than the common direction. | 02-05-2009 |
20090172422 | KEYBOARD WITH DETACHABLE RECHARGEABLE MOUSE - In one embodiment an electronic device comprising a keyboard coupled to a power supply and a mouse coupled to the keyboard. In one embodiment the keyboard further has a docking station into which the rechargeable mouse or other input device can be mounted. Furthermore, in one embodiment, the mouse can be used while in the keyboard or when separated from the keyboard through a wired or wireless connection. | 07-02-2009 |
20100287322 | Computer System With Peripheral Modules Attached To A Display/cpu Assembly - A modular computer includes a display with a docking station on its back side. A CPU module connects to the docking station. Peripheral modules connect with the resulting display/CPU assembly so that the peripheral modules contact the back side of the display screen. | 11-11-2010 |
20110080340 | System And Method For Remote Control Of A Computer - A remote control system for a computer, and a corresponding method include a Web camera having an image capture unit, the image capture unit including one or more devices capable of receiving imagery from multiple, distinct sections of the electromagnetic spectrum; a detection and separation module capable of detecting and separating the imagery into at least one signal capable of cursor control, wherein the signal capable of cursor control is generated by a remote control device; and a processing unit that receives the signal capable of cursor control and generates one or more cursor control signals, wherein the one or more cursor control signals include signals indicative of movement of the remote control device, the movement capable of translation to movement of a cursor displayed on a display of the computer. | 04-07-2011 |
20120038175 | GENERATING AND USING ELECTRICITY DERIVED FROM WASTE HEAT OF AN ELECTRICAL APPLIANCE | 02-16-2012 |
Patent application number | Description | Published |
20110094683 | RF FEED STRUCTURE FOR PLASMA PROCESSING - Apparatus for plasma processing are provided. In some embodiments, an RF feed structure includes a first RF feed to couple RF power to a plurality of symmetrically arranged stacked first RF coil elements; a second RF feed coaxially disposed about the first RF feed and electrically insulated therefrom, the second RF feed to couple RF power to a plurality of symmetrically arranged stacked second RF coil elements coaxially disposed with respect to the first RF coil elements. In some embodiments, a plasma processing apparatus includes a first RF coil; a second RF coil coaxially disposed with respect to the first RF coil; a first RF feed coupled to the first RF coil to provide RF power thereto; and a second RF feed coaxially disposed with respect to the first RF feed and electrically insulated therefrom, the second RF feed coupled to the second RF coil to provide RF power thereto. | 04-28-2011 |
20120018402 | PLASMA PROCESSING APPARATUS AND LINER ASSEMBLY FOR TUNING ELECTRICAL SKEWS - The invention discloses a plasma processing apparatus comprising a chamber lid, a chamber body and a support assembly. The chamber body, defining a processing volume for containing a plasma, for supporting the chamber lid. The chamber body is comprised of a chamber sidewall, a bottom wall and a liner assembly. The chamber sidewall and the bottom wall define a processing volume for containing a plasma. The liner assembly, disposed inside the processing volume, comprises of two or more slots formed thereon for providing an axial symmetric RF current path. The support assembly supports a substrate for processing within the chamber body. With the liner assembly with several symmetric slots, the present invention can prevent electromagnetic fields thereof from being azimuthal asymmetry. | 01-26-2012 |
20120034136 | SYMMETRIC VHF PLASMA POWER COUPLER WITH ACTIVE UNIFORMITY STEERING - A coaxial VHF power coupler includes conductive element inside a hollow cylindrical outer conductor of the power coupler and surrounding an axial section of a hollow cylindrical inner conductor of the power coupler. Respective plural motor drives contacting the hollow cylindrical outer conductor are connected to respective locations of the movable conductive element. | 02-09-2012 |
20120043023 | SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR - The disclosure pertains to a capactively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a folded structure and symmetrical power distribution. | 02-23-2012 |
20130087286 | SYMMETRIC PLASMA PROCESS CHAMBER - Embodiments of the present invention provide a plasma chamber design that allows extremely symmetrical electrical, thermal, and gas flow conductance through the chamber. By providing such symmetry, plasma formed within the chamber naturally has improved uniformity across the surface of a substrate disposed in a processing region of the chamber. Further, other chamber additions, such as providing the ability to manipulate the gap between upper and lower electrodes as well as between a gas inlet and a substrate being processed, allows better control of plasma processing and uniformity as compared to conventional systems. | 04-11-2013 |
20130106286 | INDUCTIVELY COUPLED PLASMA SOURE WITH PHASE CONTROL | 05-02-2013 |
20130134129 | INDUCTIVELY COUPLED PLASMA APPARATUS - Methods and apparatus for plasma processing are provided herein. In some embodiments, a plasma processing apparatus includes a process chamber having an interior processing volume; a first RF coil disposed proximate the process chamber to couple RF energy into the processing volume; and a second RF coil disposed proximate the process chamber to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil, wherein the first and second RF coils are configured such that RF current flowing through the first RF coil is out of phase with RF current flowing through the RF second coil. | 05-30-2013 |
20140054268 | Electronic Knob for Tuning Radial Etch Non-Uniformity at VHF Frequencies - System and methods for plasma processing of a wafer include a chamber with an electrode having a support surface and an outer edge region defined thereon. A radio frequency power is communicated to the electrode via a conductive delivery connection and returned through a conductive return connection. A capacitance is applied to a first end that causes appropriate capacitive adjustment and opposite impedance adjustment at a second end of the conductive delivery connection that is coupled to a dielectric surround structure that surrounds the electrode. The dielectric surround structure presents the opposite impedance adjustment near an outer edge of the electrode, such that increasing the capacitance at the first end causes a corresponding increase of impedance at the second end and a corresponding increase in voltage distribution near the outer edge region of the electrode that decreases toward a center of the support surface of the electrode. | 02-27-2014 |
20140195033 | Control of Etch Rate Using Modeling, Feedback and Impedance Match - A method for achieving an etch rate is described. The method includes receiving a calculated variable associated with processing a work piece in a plasma chamber. The method further includes propagating the calculated variable through a model to generate a value of the calculated variable at an output of the model, identifying a calculated processing rate associated with the value, and identifying based on the calculated processing rate a pre-determined processing rate. The method also includes identifying a pre-determined variable to be achieved at the output based on the pre-determined processing rate and identifying a characteristics associated with a real and imaginary portions of the pre-determined variable. The method includes controlling variable circuit components to achieve the characteristics to further achieve the pre-determined variable. | 07-10-2014 |
20150075719 | SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR - The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution. | 03-19-2015 |
20150083690 | Electronic Knob for Tuning Radial Etch Non-Uniformity at VHF Frequencies - System and methods for plasma processing of a wafer include a chamber with an electrode having a support surface and an outer edge region defined thereon. A radio frequency power is communicated to the electrode via a conductive delivery connection and returned through a conductive return connection. A capacitance is applied to a first end that causes appropriate capacitive adjustment and opposite impedance adjustment at a second end of the conductive delivery connection that is coupled to a dielectric surround structure that surrounds the electrode. The dielectric surround structure presents the opposite impedance adjustment near an outer edge of the electrode, such that increasing the capacitance at the first end causes a corresponding increase of impedance at the second end and a corresponding increase in voltage distribution near the outer edge region of the electrode that decreases toward a center of the support surface of the electrode. | 03-26-2015 |