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Charlene Marie Smith, Corning US

Charlene Marie Smith, Corning, NY US

Patent application numberDescriptionPublished
20080198882Active cooling of crystal optics for increased laser lifetime - A laser beam is generated and transmitted within an enclosed pathway through at least one crystal optic at a power density that progressively degrades transmissivity of the crystal optic with accumulating fluence. The crystal optics are cooled below normal operating temperatures to slow the progressive degradation in the transmissivity of the crystal optics with the accumulating fluence or to accommodate a higher power density without correspondingly increasing the progressive degradation in transmissivity.08-21-2008
20080299501Low CTE photomachinable glass - The present invention describes a composition, method and article for a photomachinable glass having a coefficient of thermal expansion from less than 6×1012-04-2008
20090062102Photomachinable glass compositions having tunable photosensitivity - The invention is directed to photomachinable glass compositions having a controllable or tunable photosensitivity, and to a method for making such compositions. The compositions of the invention contain titania (TiO03-05-2009
20090203512HALIDE FREE GLASSES HAVING LOW OH, OD CONCENTRATIONS - A fused silica glass having a refractive index homogeneity of less or equal to about 5 ppm over an aperture area of at least about 50 cm08-13-2009
20100004113SYNTHETIC SILICA HAVING LOW POLARIZATION-INDUCED BIREFRINGENCE, METHOD OF MAKING SAME AND LITHOGRAPHIC DEVICE COMPRISING SAME - Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm01-07-2010
20100055493Phase Change Memory Materials - Phase change memory materials and more particularly GeAs telluride materials useful for phase change memory applications, for example, optical and electronic data storage are described.03-04-2010
20100108890METHODS OF CHARACTERIZING AND MEASURING PARTICULATE FILTER ACCUMULATION - Methods of characterizing and measuring particulate accumulation in a family of particulate filters (05-06-2010
20100215932WIDE-ANGLE HIGHLY REFLECTIVE MIRRORS AT 193NM - The invention is directed to highly reflective optical elements having an amorphous MgAl08-26-2010
20110021339Silica Glass With Saturated Induced Absorption and Method of Making - A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.01-27-2011
20110120555PHOTOVOLTAIC DEVICES AND LIGHT SCATTERING SUPERSTRATES - Photovoltaic devices having light scattering articles having a smooth surface are described herein. Glass frits on glass superstrates can provide planar surfaces for subsequent layer deposition such as TCO layers and yet provide light scattering functions within, for example, silicon tandem photovoltaic devices. Methods of making the light scattering articles with a planar surface include depositing unfilled or filled glass frits on planar or surface-textured superstrates and sintering of the glass frit. The compositions of the glass frits can be tailored to match, for example, the expansion properties and physical properties of the glass superstrates.05-26-2011

Patent applications by Charlene Marie Smith, Corning, NY US