| Patent application number | Description | Published |
|---|
| 20090165713 | CHEMICAL VAPOR DEPOSITION APPARATUS - Provided is a chemical vapor deposition apparatus. The apparatus includes a reaction chamber, a gas introduction unit, and a gas exhaust unit. The reaction chamber includes a susceptor on which a wafer is loaded and a reaction furnace in which the wafer is processed by chemical vapor deposition. The gas introduction unit is disposed at an outer wall of the reaction chamber to supply reaction gas from an outside of the reaction furnace to a center portion of the reaction furnace. The gas exhaust unit is disposed at a center portion of the reaction chamber to discharge the reaction gas to an upper or lower outside of the reaction chamber after the reaction gas is used for a reaction in the reaction furnace. Therefore, the gas density inside the chamber can be kept at a substantially uniform state even when process pressure is increased for growing a high-temperature deposition layer. | 07-02-2009 |
| 20090178615 | SHOWERHEAD AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME - There is provided a showerhead including: a first head having at least one gas conduit provided therein to allow a first reaction gas to be supplied into a reaction chamber; a second head having a hole of a predetermined size formed to have the gas conduit extending therethrough; and a gas flow path formed between the gas conduit extending through the hole and the hole to allow a second reaction gas to be supplied into the reaction chamber. | 07-16-2009 |
| 20090260572 | CHEMICAL VAPOR DEPOSITION APPARATUS - There is provided a chemical vapor deposition apparatus including: a chamber including a reactor where a deposition object is deposited; a first supplier including a plurality of gas pipes allowing a first gas to be jetted into the reactor in a substantially horizontal direction; a second supplier including a plurality of holes of a predetermined size having the gas pipes inserted therein, respectively; a supply flow path formed between each of the gas pipes and each of the holes, the supply flow path allowing a second gas to be supplied into the reactor in a substantially horizontal direction. | 10-22-2009 |
| 20090266911 | SHOWERHEAD FOR CHEMICAL VAPOR DEPOSITION AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME - A showerhead for chemical vapor deposition (CVD) includes a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber, and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head. | 10-29-2009 |
| 20100024727 | SHOWERHEAD AND CHEMICAL VAPOR DEPOSITION APPARATUS INCLUDING THE SAME - Provided is a showerhead that can inject a reaction gas into a reaction chamber in a manner such that the injected reaction gas form a spiral vortex flow field. Therefore, the injected reaction gas can be mixed within a shorter distance, and thus the effective deposition radius of a wafer can be increased so that uniform-density deposition can be performed on the entire surface of the wafer using the mixed reaction gas. | 02-04-2010 |
| 20100178690 | BIOMOLECULE DETECTION APPARATUS AND BIOMOLECULE MEASUREMENT SYSTEM - The present invention relates to a biomolecule detection apparatus and a biomolecule measurement system. A biomolecule detection apparatus according to an aspect of the invention may include: an upper disc having a fluid inlet in a thickness direction through which a fluid is introduced to the inside; a lower disc laminated to the upper disc and having a fluid outlet in a thickness direction through which the fluid exits to the outside; detection units provided on each of the upper disc and the lower disc and including spherical microbeads having surfaces coated with materials used to capture biomolecules; and via holes provided along the edge of each of the upper disc and the lower disc so that the fluid flows between the upper disc and the lower disc. | 07-15-2010 |
| 20110102508 | Laminate substrate having bypass valve structure, inkjet print head and micro pump using the same - There is provided a laminate substrate having a bypass valve structure. The bypass valve structure formed in the laminate substrate includes a sloped path connecting a first straight path with a second straight path, and a bypass path connected with at least one of the first and second straight paths and configured as a curved path. | 05-05-2011 |
| 20110102520 | Inkjet print head - There is provided an inkjet print head. The inkjet print head includes a pressure chamber storing ink drawn from a reservoir in order to be ejected through a nozzle, a restrictor provided as a path between the reservoir and the pressure chamber, and a stepped part provided inside the pressure chamber and creating variations in ink flow inside the pressure chamber. | 05-05-2011 |
