Patent application number | Description | Published |
20110085385 | Nonvolatile Memory Devices Having Dummy Cell and Bias Methods Thereof - Provided are nonvolatile memory devices and methods of operating thereof. The nonvolatile memory devices include: dummy cells connected to a dummy bit line; and a dummy bit line bias circuit providing a dummy bit line voltage to the dummy bit line during a program operation, wherein, due to the dummy bit line voltage, at least one of the dummy cells is programmed with a threshold voltage lower than the top programmed state and higher than an erased state during the program operation. | 04-14-2011 |
20110205802 | NONVOLATILE MEMORY DEVICE AND METHOD OF READING THE SAME - Provided are a nonvolatile memory device and a method of reading the same. The nonvolatile memory device includes: a memory cell; a transistor disposed between a common source line and the memory cell; and a control logic for controlling a bias voltage of the transistor to reduce the amount of current flowing into the common source line during a read operation. The method includes: applying a read voltage to the memory cell; and controlling a bias voltage of the transistor to reduce the amount of current flowing into the common source line. | 08-25-2011 |
20110286274 | NONVOLATILE MEMORY DEVICE, PROGRAMMING METHOD THEREOF AND MEMORY SYSTEM INCLUDING THE SAME - A nonvolatile memory device preventing a program disturb, a program method thereof and a memory system including the nonvolatile memory device and the program method. The nonvolatile memory device includes a memory cell array; first and second word lines connected to a NAND string in the memory cell array; a third word line connected to the NAND string, the third word line being disposed between the first and second word lines; a temperature sensor configured to measure the temperature of the nonvolatile memory device; and a voltage generator configured to generate first and second pass voltages and a program voltage, and the voltage level of at least one of the first and second pass voltages is controlled according to the measured temperature. When a program operation is performed, the program voltage is applied to the third word line, the first pass voltage is applied to the first word line, the second pass voltage is applied to the second word line. | 11-24-2011 |
20110305079 | NONVOLATILE MEMORY DEVICE INCLUDING DUMMY MEMORY CELL AND PROGRAM METHOD THEREOF - A nonvolatile memory device including a dummy memory cell and a method of programming the same, wherein the nonvolatile memory device includes a dummy memory cell, and a plurality of memory cells serially connected to the dummy memory cell. The nonvolatile memory device sets a voltage provided to the dummy memory cell according to a distance between a selected memory cell among the plurality of memory cells and the dummy memory cell when a program operation is performed. | 12-15-2011 |
20120003828 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FORMING THE SAME - A method of manufacturing a semiconductor device includes forming a laminated structure including sacrificial layers and a select gate layer on a substrate, forming a penetration region penetrating the laminated structure, forming a select gate insulating layer on a sidewall of the select gate layer exposed by the penetration region, and forming an active pattern in the penetration region. The method also includes exposing a portion of the active pattern by removing the sacrificial layers and forming an information storage layer on the exposed portion of the active pattern. | 01-05-2012 |
20120033503 | CHARGE TRAP FLASH MEMORY DEVICE AND AN ERASING METHOD THEREOF - An erase method of a charge trap flash memory device, the method including receiving a temperature detection result, and performing an erase operation based on the temperature detection result, wherein the erase operation includes an erase execution interval, an erase verify interval and a delay time between the erase execution interval and the erase verify interval, wherein the erase operation changes a level of a word line voltage applied to word lines during the erase execution interval, a length of the delay time, or a level of the word line voltage applied to the word lines during the delay time. | 02-09-2012 |
20120061744 | THREE DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES - Three dimensional semiconductor memory devices are provided. The three dimensional semiconductor memory device includes a first stacked structure and a second stacked structure sequentially stacked on a substrate. The first stacked structure includes first insulating patterns and first gate patterns which are alternately and repeatedly stacked on a substrate, and the second stacked structure includes second insulating patterns and second gate patterns which are alternately and repeatedly stacked on the first stacked structure. A plurality of first vertical active patterns penetrate the first stacked structure, and a plurality of second vertical active patterns penetrate the second stacked structure. The number of the first vertical active patterns is greater than the number of the second vertical active patterns. | 03-15-2012 |
20120230103 | Nonvolatile Memory Device And Operating Method Thereof - According to example embodiments, a nonvolatile memory device includes a substrate, at least one string extending vertically from the substrate, and a bit line current controlling circuit connected to the at least one string via at least one bit line. The at least one string may include a channel containing polycrystalline silicon. The bit line current controlling circuit may be configured to increase the amount of current being supplied to the bit line according to a decrease in a temperature such that a current flowing through the channel of the at least one string is increased when a temperature decreases. | 09-13-2012 |
20150084114 | NON-VOLATILE MEMORY DEVICES INCLUDING BLOCKING INSULATION PATTERNS WITH SUB-LAYERS HAVING DIFFERENT ENERGY BAND GAPS - A non-volatile memory device may include a semiconductor substrate and an isolation layer on the semiconductor substrate wherein the isolation layer defines an active region of the semiconductor substrate. A tunnel insulation layer may be provided on the active region of the semiconductor substrate, and a charge storage pattern may be provided on the tunnel insulation layer. An interface layer pattern may be provided on the charge storage pattern, and a blocking insulation pattern may be provided on the interface layer pattern. Moreover, the block insulation pattern may include a high-k dielectric material, and the interface layer pattern and the blocking insulation pattern may include different materials. A control gate electrode may be provided on the blocking insulating layer so that the blocking insulation pattern is between the interface layer pattern and the control gate electrode. Related methods are also discussed. | 03-26-2015 |