| Patent application number | Description | Published |
|---|
| 20080203452 | CMOS IMAGE SENSORS INCLUDING BACKSIDE ILLUMINATION STRUCTURE AND METHOD OF MANUFACTURING IMAGE SENSOR - An image sensor having a backside illumination structure can include a photo diode unit in a first wafer, where the photo diode unit includes photo diodes and transfer gate transistors coupled to respective ones of the photo diodes. A wiring line unit can be included on a second wafer that is bonded to the photo diode unit, where the wiring line unit includes wiring lines and transistors configured to process signals provided by the photo diode unit and configured to control the photo diode unit. A supporting substrate is bonded to the wiring line unit and a filter unit is located under the first wafer. | 08-28-2008 |
| 20080237664 | SEMICONDUCTOR DEVICE AND METHOD OF DRIVING THE SAME - Provided are a semiconductor device and a method of driving the semiconductor device. The semiconductor device includes an optical reaction transistor. The optical reaction transistor includes a semiconductor substrate, a tunnel insulation layer formed on the semiconductor substrate, an optical reaction layer formed on the tunnel insulation layer, a blocking insulation layer formed on the optical reaction layer, and a gate electrode formed on the blocking insulation layer. | 10-02-2008 |
| 20080308852 | IMAGE SENSOR CIRCUITS INCLUDING SHARED FLOATING DIFFUSION REGIONS - An image sensor can include a plurality of photoelectric conversion elements arranged in a matrix. A plurality of floating diffusion regions can be shared by respective corresponding pairs of adjacent photoelectric conversion elements. A plurality of charge-transmission transistors can respectively correspond to the photoelectric conversion elements, where each of the charge-transmission transistors are connected between a corresponding one of the plurality of photoelectric conversion elements and a corresponding one of the plurality of floating diffusion regions. A plurality of charge-transmission lines can be commonly connected to gates of respective corresponding pairs of adjacent rows of charge-transmission transistors, where each of the respective corresponding pairs of adjacent rows of charge-transmission transistors can be connected to respective ones of the plurality of photoelectric conversion elements in different adjacent rows of floating diffusion regions. | 12-18-2008 |
| 20090315137 | SEMICONDUCTOR DEVICES, CMOS IMAGE SENSORS, AND METHODS OF MANUFACTURING SAME - A semiconductor device includes: a trench device isolating region formed in a substrate to define a photodiode active region; a channel stop impurity region formed in the substrate contacting the device isolating region, wherein the channel stop impurity region surrounds a bottom and a sidewall of the device isolating region; and a photodiode formed within the photodiode active region. | 12-24-2009 |
| 20100176474 | BACK-LIT IMAGE SENSOR AND METHOD OF MANUFACTURE - A backside-illuminated image sensor includes photoelectric converters disposed in a front-side of a substrate and arranged to define pixels, back-side interlayer dielectric patterns disposed on the back-side of the substrate over the photoelectric converters, color filters arranged over the back-side interlayer dielectric patterns, and micro-lenses arranged over the color filters, wherein adjacent back-side interlayer dielectric patterns are separated by an intervening gap region having a refractive index less than that of the back-side interlayer dielectric patterns. | 07-15-2010 |
| 20100207226 | IMAGE SENSOR AND METHOD OF FABRICATING THE SAME - The image sensor includes a substrate, an insulating structure formed on a first surface of the substrate and including a first metal wiring layer exposed by a contact hole penetrating the substrate, a conductive spacer formed on sidewalls of the contact hole and electrically connected to the first metal wiring layer, and a pad formed on a second surface of the substrate and electrically connected to the first metal wiring layer. | 08-19-2010 |
| 20100227429 | Fabrication of image sensor with improved signal to noise ratio - For fabricating an image sensor, an isolation structure is formed to define a first active region of a semiconductor substrate. A first transistor and a second transistor of a unit pixel are formed in the first active region. In addition, a threshold voltage lowering region is formed in a portion of the semiconductor substrate near a portion of the isolation structure abutting the second transistor in the first active region. The threshold voltage lowering region causes the second transistor to have a respective threshold voltage magnitude that is lower than for the first transistor. The threshold voltage lowering region is formed simultaneously with a passivation region in a second active region having a photodiode formed therein. | 09-09-2010 |
| 20110096215 | Image Sensors and Methods of Manufacturing Image Sensors - An image sensor includes a first substrate including a driving element, a first insulation layer on the first substrate and on the driving element, a second substrate including a photoelectric conversion element, and a second insulation layer on the second substrate and on the photoelectric conversion element. A surface of the second insulation layer is on an upper surface of the first insulation layer. The image sensor includes a conductive connector penetrating the second insulation layer and a portion of the first insulation layer. Methods of forming image sensors are also disclosed. | 04-28-2011 |
