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Chakravorty, CA
Jaijeet Chakravorty, Union City, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080319959 | GENERATING INFORMATION ON DATABASE QUERIES IN SOURCE CODE INTO OBJECT CODE COMPILED FROM THE SOURCE CODE - Provided are a method, system, and article of manufacture for generating information on database queries in source code into object code compiled from the source code. Source code including query statements to perform operations with respect to a database is translated into executable object code. A statement descriptor for at least one query statement is generated into the object code, wherein the statement descriptor for the at least one query statement includes information on the query statement including the query statement in the source code. The statement descriptors in the object code are processed to output information on the query statements indicated in the statement descriptors. | 12-25-2008 |
| 20090007138 | STATIC EXECUTION OF STATEMENTS IN A PROGRAM - Provided are techniques for static execution of statements. Information from an execution file that describes statements that have been bound to a database during a previous execution of those statements dynamically and describes metadata about the statements is loaded. While executing a program that includes statements, for each of the statements, it is determined whether that statement is bound to the database. In response to determining that the statement is bound to the database, the statement is executed statically using the loaded information. In response to determining that the statement is not bound to the database, the statement is executed dynamically. | 01-01-2009 |
| 20100107139 | Cooperative Unwrapping Across Intervening Wrappers - A method of accessing layers in a multi-layer software architecture including a first layer, a second layer, and a third layer. The method includes: at the third layer, publishing an interface; and at the first layer, before execution of a first function, registering a callback routine with the third layer using the interface. | 04-29-2010 |
Kishore Chakravorty, Santa Clara, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100328641 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm | 12-30-2010 |
| 20100330466 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section are parallel to each other and each of side edges of the basic quadrilateral has one quadrilateral recess. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face. | 12-30-2010 |
| 20100330467 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and an area of no greater than 20 mm | 12-30-2010 |
Kishore K. Chakravorty, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090098469 | Process for fabrication of alternating phase shift masks - Design rules are described for a phase alternating shift mask for minimum chrome width and maximum segment length, where an embodiment employs during a cleaning process of the mask a megasonic power of 50 Watts at 1 MHz, and 30 Watts at 3 MHz. Some embodiments utilize an dry etch Carbon Tetrafluoride and Dioxygen based process. Other embodiments are described and claimed. | 04-16-2009 |
| 20090246644 | Low stress pellicle frames and reticle pellicle assemblies - Low stress reticle pellicle assemblies. In accordance with certain embodiments of the present invention, a pellicle frame of reduced stiffness is employed to reduce the stress a pellicle frame induces in a reticle plate. In other embodiments, a pellicle frame of reduced adhesive surface is employed to reduce the stress a pellicle frame induces in a reticle plate. In accordance with still other embodiments, a stress compensating frame is employed to reduce the cumulative stresses in an assembly comprising the reticle plate, pellicle and stress compensating frame. | 10-01-2009 |