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Chad D.

Chad D. Eiring, Delaware, OH US

Patent application numberDescriptionPublished
20100109545Automatic Compensation For Degradation Of Optocoupler Light Emitting Diode - A system and method for compensating for degradation of a light emitting diode includes accumulating time that the light emitting has been lit. An additional amount of drive current to be provided to the light emitting diode is determined based on the accumulated time that the light emitting diode has been lit. The system includes a controller that accumulates the time that the light emitting diode has been lit and determines the amount of addition drive current to be provided to the light emitting diode.05-06-2010

Chad D. Overvaag, Watertown, SD US

Patent application numberDescriptionPublished
20090126146VACUUM CLEANER WITH HEAT SINK IN AIR PATH - A floor care appliance includes a nozzle assembly having a suction inlet, a canister assembly, a dirt collection vessel carried on the canister assembly, a suction generator carried on the canister assembly and a wand assembly connecting the nozzle assembly with the canister assembly. The wand assembly includes an inlet connected to the nozzle assembly, an outlet connected to the canister assembly and a conduit defining an air path between the inlet and the outlet. A heat sink carried on the wand assembly is provided in communication with the air path in the conduit. An electronic control is connected to the heat sink.05-21-2009

Chad D. Torrice, Chapel Hill, NC US

Patent application numberDescriptionPublished
20110224221HEMATOPOIETIC PROTECTION AGAINST IONIZING RADIATION USING SELECTIVE CYCLIN-DEPENDENT KINASE 4/6 INHIBITORS - Methods for reducing or preventing the effects of ionizing radiation in healthy cells arc provided. The methods relate to the use of selective cyclin-dependent kinase (CDK) 4/6 inhibitors to induce transient quiescence in CDK4/6 dependent cells, such as hematopoietic stem cells and/or hematopoietic progenitor cells. Radioprotection can be effected in mammals by treatment with selective CDK4/6 inhibitor compounds either before, at the same time as, or after exposure to the ionizing radiation.09-15-2011

Chad D. Vecitis, New Haven, CT US

Patent application numberDescriptionPublished
20100089841ULTRASONICALLY INDUCED CAVITATION OF FLUOROCHEMICALS - A process is described for the treatment of fluorochemicals in an aqueous environment, the process including the steps of (1) ultrasonically inducing cavitation in an aqueous system at a frequency within the range from about 15 kHz to about 1100 kHz, the aqueous system comprising fluorochemicals; and (2) breaking down the fluorochemicals into constituent components by the application of the cavitation. The ultrasonically induced cavitation is performed at a frequency within the range from greater than 200 kHz to about 1100 kHz. The process can be used to facilitate the degradation of any of a variety of fluorochemicals having a carbon chain length of C04-15-2010
20100096337ULTRASONICALLY INDUCED CAVITATION OF FLUOROCHEMICALS - A system for the treatment of groundwater is described, the system including: a first component for placement into a groundwater table, the first component having a first end and a second end and an interior space defined by an inner wall and extending between the first end and the second end; at least one ultrasonic transducer positioned with the interior space of the first component to provide ultrasonically induced cavitation to a volume of water within the interior space; a pump associated with the first end of the first component to draw water from the groundwater table into the interior space of the first component; an outlet associated with the second end of the first component, the outlet positioned to direct a volume of water away from the first component after the water has passed therethrough; a power supply; and a radio frequency generator capable of providing a radio frequency within the range from about 15 kHz to about 1100 kHz. A process for the treatment of fluorochemicals in an aqueous environment is also described, the process utilizing the foregoing system.04-22-2010