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Carmi, IL

Nir Carmi, Ramat Efal IL

Patent application numberDescriptionPublished
20090217400Enzymes, cells and methods for site specific recombination at asymmetric sites - The present invention relates to enzymes, compositions and methods for catalyzing asymmetric recombination of non-palindromic recombination sites in a cell free system, in isolated cells or in living organisms. The enzymes and methods of the invention are suitable for mediating specific recombinations between DNA sequences comprising specific recombination sites without being limited to strict palindromic symmetry within each recombination site.08-27-2009
20100285464A CONSERVED REGION OF THE HIV-1 GENOME AND USES THEREOF - The present invention discloses sequences having a structure and sequence homology to lox-P recombinase target site corresponding to a highly conserved region within the Long Terminal Repeats (LTR) of HIV and to the use thereof for the identification of recombinase enzymes useful in treating HIV-1.11-11-2010

Pnina Carmi, Rehovot IL

Patent application numberDescriptionPublished
20090238864DNA VACCINES ENCODING HEAT SHOCK PROTEINS - The present invention is related to a method of treating a T cell-mediated inflammatory autoimmune disease by administering to an individual in need thereof an immunogenic composition comprising a recombinant construct of a nucleic acid sequence encoding heat shock protein 60 (HSP60), or an active fragment thereof, wherein the nucleic acid sequence is operatively linked to one or more transcription control sequences, and wherein the disease is other than insulin dependent diabetes mellitus (IDDM), thereby treating the disease.09-24-2009

Patent applications by Pnina Carmi, Rehovot IL

Raz Carmi, Haifa IL

Patent application numberDescriptionPublished
20080226017Data Handling and Analysis in Computed Tomography With Multiple Energy Windows - An apparatus includes a computed tomography (CT) scanner (09-18-2008
20080260094Method and Apparatus for Spectral Computed Tomography - An apparatus receives signals generated by a detector (10-23-2008
20100020922APPARATUS AND METHOD FOR SPECTRAL COMPUTED TOMOGRAPHY - A computed tomography system includes a radiation sensitive detector element (01-28-2010
20100027738SPECTRAL COMPUTED TOMOGRAPHY USING CORRELATED PHOTON NUMBER AND ENERGY MEASUREMENTS - A computed tomography system includes a plurality of radiation sensitive detector elements (02-04-2010
20100282972INDIRECT RADIATION DETECTOR - The present invention relates to an indirect radiation detector for detecting radiation (X), e.g. for medical imaging systems. The detector has an array of pixels (P11-11-2010
20110116595Method and Apparatus for Detecting Low and High X-Ray Flux - A method and apparatus for detecting low and high x-ray densities is provided for use in CT imaging. Two photodetectors, one having a relatively low dynamic range and the other having a relatively high dynamic range, are coupled to the same transducer. The first photodetector may be, for example, a SiPM which is passively quenched.05-19-2011
20110208040MOLECULAR IMAGING - An imaging system includes a radiation source (08-25-2011

Patent applications by Raz Carmi, Haifa IL

Saar Carmi, Ramat Gan IL

Patent application numberDescriptionPublished
20080208579Session recording and playback with selective information masking - A computer-implemented method for session processing includes identifying a type of data item that is presented to a user by a computerized system. A session in which the user interacts with the computerized system is recorded. A data item of the identified type is automatically detected in the recorded session. The recorded session is replayed, while refraining from presenting the detected data item in the replayed session.08-28-2008

Shachar Carmi, Tel-Aviv IL

Patent application numberDescriptionPublished
20110206279APPARATUS AND METHOD FOR CHROMA-KEY PROCESSING - Apparatus for interpolating or dispersing effects over a video frame, useful for chroma keying of an image comprising a foreground including a part to remove, such as a background or spill from the background. The apparatus handles pixels of the image one by one and includes an interpolation unit for applying an interpolation of attributes at a respective pixel and then applies a function based on the attributes. For example in chroma keying an opaqueness assigner may compare the local color with a color of the part to remove using the interpolation. Based on the comparison, keying is used to set at the respective pixel a level of opaqueness for the pixel.08-25-2011

Yoash Carmi, Eilon IL

Patent application numberDescriptionPublished
20090293268PATTERNS OF CONDUCTIVE OBJECTS ON A SUBSTRATE AND METHOD OF PRODUCING THEREOF - According to embodiments of the present invention, a method for manufacturing a pattern of conductive elements on a substrate is provided. The method includes applying a coating layer of electrically conductive transparent compounds onto a substrate; depositing in a vacuum deposition chamber an electrically conductive material onto the coating layer to form an electrically conductive layer; applying an etch-resist material on selective areas of the electrically conductive layer, wherein the selective areas are substantially areas pre-designed to carry the conductive objects; and chemically etching the electrically conductive material from exposed areas of the electrically conductive layer that are not covered by the etch-resist material.12-03-2009

Yoash Carmi, Kibbutz Eilon IL

Patent application numberDescriptionPublished
20090165296PATTERNS OF CONDUCTIVE OBJECTS ON A SUBSTRATE AND METHOD OF PRODUCING THEREOF - According to embodiments of the present invention, a method for manufacturing a pattern of conductive elements on a substrate is provided. The method includes coating an aluminum foil laminated onto the substrate with an electrically conductive material, applying an etch-resist material on selective areas pre-designed to carry the conductive objects, chemically etching to remove the aluminum and the electrically conductive material from areas not covered by the etch-resist material that are complementary to the selective areas and removing the etch-resist material.07-02-2009